Electron beam exciter for use in chemical analysis in processing systems
    1.
    发明申请
    Electron beam exciter for use in chemical analysis in processing systems 有权
    用于处理系统化学分析的电子束激发器

    公开(公告)号:US20100032587A1

    公开(公告)日:2010-02-11

    申请号:US12460462

    申请日:2009-07-16

    IPC分类号: H01J31/00 H01J29/00

    摘要: The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

    摘要翻译: 本发明涉及一种气体线电子束激发器,气体线电子束激发系统和使用电子束激发器激发气体的方法。 电子束激励器通常包括用于在电子室中产生电子云的可变密度电子源和用于将来自电子室的电子作为电子束加速的可变能量电子提取器,并且用于在流出物中荧光物质的流出物流中。 通过调节施加到可变密度电子源的激发功率可变地控制电子束的电子密度。 电子室中的电子驻留在室的参考电位,通常接近地电位。 通过调节跨越可变能量电子提取器的电位来可变地控制电子束的电子能,该能量通过腔室的提取孔并朝向提取器激发电子。 电子提取器和电子源之间的电位差越大,电子束中赋予电子的能量越高。 施加到电子源的激发功率可以独立于电子束的电子能量来调节,从而改变电子束的电子密度而不改变电子束的电子的能级。

    Power supply
    2.
    发明授权
    Power supply 失效
    电源

    公开(公告)号:US5595330A

    公开(公告)日:1997-01-21

    申请号:US295992

    申请日:1994-08-24

    IPC分类号: B23K20/00 B23K20/10

    摘要: The power supply includes a voltage controlled oscillator, two potentiometers and a by-pass circuit coupled to the output of the voltage controlled oscillator. The two potentiometers form two channels, channel 1 and channel 2, one of which will be selected during the bonding cycle to be coupled to a power amplifier. The output of the power amplifier is adapted to be coupled to an ultrasonic transducer for operating the transducer. Selectable channel 1 and channel 2 reference voltage devices are provided. The voltage and current applied to the amplifier are converted to power. During a bonding cycle, a comparator compares the power applied to the transducer with that of a selected reference voltage and varies the output of the potentiometer of the selected channel to maintain the output of the power amplifier constant during bonding. Also provided is a switching arrangement for coupling the by-pass circuit to the power amplifier at the initial part of a bonding cycle and for coupling the potentiometers the selected channel 1 or channel 2 to the power amplifier such that a maximum burst of energy is applied to the transducer initially during the bonding cycle and then the desired voltage level from the selected channel 1 or channel 2 is applied to the transducer.

    摘要翻译: 电源包括压控振荡器,两个电位器和耦合到压控振荡器的输出的旁路电路。 两个电位器形成通道1和通道2的两个通道,其中一个通道将在焊接周期期间被选择以耦合到功率放大器。 功率放大器的输出适于耦合到用于操作换能器的超声换能器。 提供可选择的通道1和通道2参考电压设备。 施加到放大器的电压和电流转换为电源。 在键合周期期间,比较器将施加到换能器的功率与所选择的参考电压的功率进行比较,并且改变所选通道的电位器的输出,以保持功率放大器的输出在接合期间恒定。 还提供了一种用于在接合周期的初始部分将旁路电路耦合到功率放大器并用于将所选择的通道1或通道2的电位器耦合到功率放大器以使得施加最大的能量爆发的开关装置 首先在接合周期期间到换能器,然后将来自所选通道1或通道2的所需电压电平施加到换能器。

    Workpiece Characterization System
    3.
    发明申请
    Workpiece Characterization System 审中-公开
    工件表征系统

    公开(公告)号:US20120120387A1

    公开(公告)日:2012-05-17

    申请号:US13286050

    申请日:2011-10-31

    IPC分类号: G01N21/64 G01B11/06

    摘要: A workpiece characterization system for obtaining simultaneous measurement of layer and photoluminescence properties of a workpiece. The workpiece characterization system includes an excitation light and an illumination light each impinging upon a surface of a workpiece whereby the workpiece emits photoluminescent light and encodes light from said illumination source with layer information. The excitation light and the illumination light are generated from a single light source. The light from the single light source is filtered to remove wavelengths of light that correlate to light wavelengths emitted from the workpiece as a result of excitation. Wavelengths that correlate to light reflected from the workpiece that may contain encoded information are not filtered.

    摘要翻译: 用于获得工件的层和光致发光性质的同时测量的工件表征系统。 工件表征系统包括激发光和照射光,每个照射光照射在工件的表面上,由此工件发射光致发光光并用层信息对来自所述照明源的光进行编码。 激发光和照明光从单个光源产生。 对来自单个光源的光进行滤波以去除与作为激发的结果从工件发射的光波相关的光的波长。 与可能包含编码信息的工件反射的光相关的波长不被过滤。

    Calibration of a radiometric optical monitoring system used for fault detection and process monitoring
    4.
    发明授权
    Calibration of a radiometric optical monitoring system used for fault detection and process monitoring 有权
    用于故障检测和过程监控的辐射光学监测系统的校准

    公开(公告)号:US08125633B2

    公开(公告)日:2012-02-28

    申请号:US12151449

    申请日:2008-05-06

    IPC分类号: G01J3/00

    摘要: The present invention is directed to a system and method for radiometric calibration of spectroscopy equipment utilized in fault detection and process monitoring. Initially, a reference spectrograph is calibrated to a local primary standard (a calibrated light source with known spectral intensities and traceable to a reference standard). Other spectrographs are then calibrated from the reference spectrograph rather than the local primary calibration standard. This is accomplished by viewing a light source with both the reference spectrograph and the spectrograph to be calibrated. The output from the spectrograph to be calibrated is compared to the output of the reference spectrograph and then adjusted to match that output. The present calibration process can be performed in two stages, the first with the spectrographs calibrated to the reference spectrograph and then are fine tuned to a narrow band light source at the plasma chamber. Alternatively, the reference spectrograph can be calibrated to the local primary standard while optically coupled to the plasma chamber. There, the local primary standard calibration light source is temporarily positioned within the plasma chamber, or in a light chamber disposed along the interior of the chamber for calibrating the reference spectrograph. Other spectrographs can be calibrated to the reference spectrograph while coupled to the plasma chamber with the local primary standard calibration light source, thereby calibrating every component in the entire optical path to the reference spectrograph.

    摘要翻译: 本发明涉及用于故障检测和过程监测中的光谱设备的辐射校准的系统和方法。 最初,将参考光谱仪校准为局部主要标准(具有已知光谱强度且可追溯到参考标准的校准光源)。 然后从参考光谱仪而不是本地主要校准标准校准其他光谱仪。 这是通过用参考光谱仪和要校准的光谱仪来观察光源来实现的。 将要校准的光谱仪的输出与参考光谱仪的输出进行比较,然后进行调整以匹配该输出。 本校准过程可以分两个阶段执行,第一阶段是用参考光谱仪校准的光谱仪,然后在等离子体腔室内对窄带光源进行微调。 或者,参考光谱仪可以被校准为局部初级标准,同时光学耦合到等离子体室。 在那里,局部主标准校准光源临时定位在等离子体室内,或者沿着室内设置的光室中,用于校准参考光谱仪。 当使用本地主要标准校准光源耦合到等离子体室时,可以将其他光谱仪校准为参考光谱仪,从而将整个光学路径中的每个分量校准到参考光谱仪。

    Electron beam exciter for use in chemical analysis in processing systems

    公开(公告)号:US09997325B2

    公开(公告)日:2018-06-12

    申请号:US12460462

    申请日:2009-07-16

    IPC分类号: H01J37/06 H01J37/32

    摘要: The present invention is directed to a gas line electron beam exciter, gas line electron beam excitation system and method for exciting a gas using an electron beam exciter. The electron beam exciter generally comprises a variable density electron source for generating a cloud of electrons in an electron chamber and a variable energy electron extractor for accelerating electrons from the electron chamber as an electron beam and into an effluent stream for fluorescing species in the effluent. The electron density of the electron beam is variably controlled by adjusting the excitation power applied to the variable density electron source. The electrons in the electron chamber reside at a reference electrical potential of the chamber, typically near ground electrical potential. The electron energy of the electron beam is variably controlled by adjusting an electrical potential across the variable energy electron extractor, which energizes the electrons through an extraction hole of the chamber and toward the extractor. The greater the difference in the electrical potential between the electron extractor and the electron source, the higher the energy imparted to the electrons in the electron beam. The excitation power applied to the electron source can be adjusted independently from the electron energy of the electron beam, thereby altering the electron density of the electron beam without changing the energy level of the electrons of the electron beam.

    Apparatus for characterization of microelectronic feature quality
    7.
    发明授权
    Apparatus for characterization of microelectronic feature quality 有权
    用于表征微电子特征质量的装置

    公开(公告)号:US06642063B2

    公开(公告)日:2003-11-04

    申请号:US10183059

    申请日:2002-06-26

    IPC分类号: H01L2166

    摘要: Apparatus characterizes the quality of microelectronic features using broadband white light. A highly collimated light source illuminates an area of a first wafer using broadband multi-spectral light. The angular distribution of the light scattered from the first wafer is then measured. Generally, the angle of the light source, detector, or both is altered and an angular distribution measurement taken at each angle, producing a scatter signature for the first wafer. Finally, the scatter signature of the first wafer is compared with a known scatter signature of a second wafer of good quality to determine the quality of the first wafer.

    摘要翻译: 仪器采用宽带白光表征微电子特性的质量。 高度准直的光源使用宽带多光谱照亮第一晶片的区域。 然后测量从第一晶片散射的光的角度分布。 通常,改变光源,检测器或两者的角度,并且在每个角度进行角度分布测量,产生第一晶片的散射特征。 最后,将第一晶片的散射特征与具有良好质量的第二晶片的已知散射特征进行比较,以确定第一晶片的质量。

    Ultrasonic transducer and mount
    8.
    发明授权
    Ultrasonic transducer and mount 失效
    超声波换能器和安装座

    公开(公告)号:US5364005A

    公开(公告)日:1994-11-15

    申请号:US148285

    申请日:1993-11-08

    IPC分类号: B23K20/10 H01L21/60

    CPC分类号: B23K20/106

    摘要: The transducer has a metal body with a welding end, an opposite end for supporting a source for causing the body and the welding end to vibrate at ultrasonic frequency for welding purposes and an intermediate mounting structure for supporting the body for welding purpose. The mounting structure may be a cylinder or flange spaced from and surrounding the body with at least two spaced apart spokes connected between the body and the mounting structure.

    摘要翻译: 换能器具有带焊接端的金属体,用于支撑用于引起主体和焊接端以超声频率振动的焊接端的相对端以及用于支撑用于焊接目的的主体的中间安装结构。 安装结构可以是与主体间隔开并围绕主体的圆柱体或凸缘,其具有连接在主体和安装结构之间的至少两个间隔开的辐条。

    Workpiece characterization system
    10.
    发明授权
    Workpiece characterization system 有权
    工件表征系统

    公开(公告)号:US09383323B2

    公开(公告)日:2016-07-05

    申请号:US13166571

    申请日:2011-06-22

    IPC分类号: G01N21/64 G01N21/896

    摘要: A workpiece characterization system for obtaining simultaneous measurement of layer and photoluminescence properties of a workpiece. The workpiece characterization system includes an excitation light and an illumination light each impinging upon a surface of a workpiece whereby the workpiece emits photoluminescent light and encodes light from said illumination source with layer information. The excitation light and the illumination light are generated from a single light source. The light from the single light source is filtered to remove wavelengths of light that correlate to light wavelengths emitted from the workpiece as a result of excitation. Wavelengths that correlate to light reflected from the workpiece that may contain encoded information are not filtered.

    摘要翻译: 用于获得工件的层和光致发光性质的同时测量的工件表征系统。 工件表征系统包括激发光和照射光,每个照射光照射在工件的表面上,由此工件发射光致发光光并用层信息对来自所述照明源的光进行编码。 激发光和照明光从单个光源产生。 对来自单个光源的光进行滤波以去除与作为激发的结果从工件发射的光波相关的光的波长。 与可能包含编码信息的工件反射的光相关的波长不被过滤。