METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY PIXEL ARRAY
    3.
    发明申请
    METHOD FOR MANUFACTURING LIQUID CRYSTAL DISPLAY PIXEL ARRAY 审中-公开
    制造液晶显示像素阵列的方法

    公开(公告)号:US20120129284A1

    公开(公告)日:2012-05-24

    申请号:US13217633

    申请日:2011-08-25

    IPC分类号: H01L33/08

    摘要: This invention discloses a method for manufacturing liquid crystal display pixel array, which is capable of promoting an aperture ratio. The method of this invention includes forming a gate metal layer on a glass substrate; forming a gate insulation layer; forming a semiconductor layer; forming a second metal layer on the semiconductor layer; forming a switch region photoresist layer and a data line region photoresist layer on the second metal layer; etching the second metal layer; etching the semiconductor layer; etching the switch region photoresist layer and the data line region photoresist layer; and etching edge portions of the semiconductor in the switch region and the data line region by using fluoride-bearing gas. To etch off more edge portions of the semiconductor in the data line region, according to this invention, the thickness of the data line region photoresist layer is made thinner when forming the photoresist layer.

    摘要翻译: 本发明公开了一种能够提高开口率的液晶显示像素阵列的制造方法。 本发明的方法包括在玻璃基板上形成栅极金属层; 形成栅绝缘层; 形成半导体层; 在所述半导体层上形成第二金属层; 在所述第二金属层上形成开关区域光致抗蚀剂层和数据线区域光致抗蚀剂层; 蚀刻第二金属层; 蚀刻半导体层; 蚀刻开关区光致抗蚀剂层和数据线区域光致抗蚀剂层; 以及通过使用含氟气体来蚀刻开关区域和数据线区域中的半导体的边缘部分。 为了蚀刻数据线区域中半导体的更多边缘部分,根据本发明,当形成光致抗蚀剂层时,数据线区域光致抗蚀剂层的厚度变薄。