公开(公告)号：US5374153A

公开(公告)日：1994-12-20

申请号：US140985

申请日：1993-10-25

申请人： Mitsuo Nishi

发明人： Mitsuo Nishi

IPC分类号： B08B11/02 ,  H01L21/304 ,  H01L21/64 ,  H01L21/677 ,  H01L21/68 ,  B65G65/00

CPC分类号： H01L21/67781 ,  Y10S414/135 ,  Y10S414/138

摘要： There is provided a transfer apparatus which is capable of transferring objects on a plurality of carriers at a time to a desired point. This apparatus comprises a carrier table for linearly arranging a plurality of the carriers, a plurality of push-up members for pushing up the objects supported on the carriers, drive devices for moving the push-up members towards or away from each other, and a rotary transfer arm mechanism having a pair of support arms for receiving the objects lifted on the push-up members, and transferring the objects to a desired point.

摘要翻译： 提供了能够一次将多个载体上的物体转移到期望点的传送装置。 该装置包括用于直线布置多个托架的承载台，用于向上推动支撑在托架上的物体的多个上推构件，用于将上推构件朝向或远离彼此移动的驱动装置，以及 旋转传递臂机构具有一对支撑臂，用于接收在上推构件上提起的物体，并将物体传送到所需点。

公开(公告)号：US5301700A

公开(公告)日：1994-04-12

申请号：US26771

申请日：1993-03-05

申请人： Yuuji Kamikawa ,  Kouki Kuroda ,  Yoshiyuki Honda ,  Eiichi Mukai ,  Mitsuo Nishi

发明人： Yuuji Kamikawa ,  Kouki Kuroda ,  Yoshiyuki Honda ,  Eiichi Mukai ,  Mitsuo Nishi

IPC分类号： B08B3/02 ,  H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67057 ,  B08B3/022 ,  H01L21/67051 ,  H01L21/67766 ,  H01L21/67781 ,  Y10S134/902 ,  Y10S414/138 ,  Y10S414/14

摘要： A washing system comprising a wafer washing section having plural chemical washing vessels, plural water washing vessels and a drier, a cassette washing section having a water washing device and a drier, a loader section for taking out the wafers from the cassettes and loading the wafers into the wafer washing section, an unloader section for returning the washed wafers in the washed cassette and unloading the wafers from the wafer washing section, a wafer transfer device the wafers in the wafer washing section, a cassette lifter for carrying the cassettes from the loader section to the cassette washing section, and a wire drive unit for carrying the cassettes in the cassette washing section.

摘要翻译： 一种洗涤系统，包括具有多个化学洗涤容器，多个水洗涤容器和干燥器的晶片洗涤部分，具有水洗装置和干燥器的盒式洗涤部分，用于从盒中取出晶片并装载晶片的装载部分 进入晶片洗涤部分，用于将洗涤过的晶片返回洗涤后的盒子并从晶片洗涤部分卸载晶片的卸载器部分，晶片转移装置，晶片洗涤部分中的晶片，用于从装载器运送盒的盒式升降器 以及用于将盒带携带在盒式洗涤部中的线驱动单元。

公开(公告)号：US5226437A

公开(公告)日：1993-07-13

申请号：US795762

申请日：1991-11-21

申请人： Yuji Kamikawa ,  Masafumi Inoue ,  Mitsuo Nishi

发明人： Yuji Kamikawa ,  Masafumi Inoue ,  Mitsuo Nishi

IPC分类号： H01L21/00 ,  H01L21/677

CPC分类号： H01L21/67017 ,  H01L21/67051 ,  H01L21/67766 ,  H01L21/67781 ,  Y10S134/902

摘要： A washing apparatus for performing a batch treatment of a plurality of wafers has a vessel and a wafer boat dedicated to the vessel and movable in the vertical direction. The boat has a fork, which supports the wafers in the vessel in a manner such that the wafers are spaced from one another at predetermined intervals. The wafers are received in a carrier, and are transferred to the boat by a rotary transfer arm. This arm has a fork for supporting the wafers during transfer thereof in a manner such that the wafers are spaced from one another at the predetermined intervals. Transfer of the rotary transfer arm is performed above the washing vessel by moving the boat up and down. At this time, the forks of the boat and arm engage with each other.

摘要翻译： 用于执行多个晶片的批量处理的洗涤装置具有专用于容器并可在垂直方向上移动的容器和晶片舟。 该船具有叉子，该叉子以使得晶片以预定间隔彼此间隔的方式支撑在容器中的晶片。 晶片被接收在载体中，并通过旋转传递臂传送到船上。 该臂具有用于在其转移期间支撑晶片的叉，使得晶片以预定间隔彼此间隔开。 通过上下移动舟皿，在洗涤容器上方进行旋转传送臂的传送。 在这时候，船和手臂的叉子相互啮合。

公开(公告)号：US5370142A

公开(公告)日：1994-12-06

申请号：US149635

申请日：1993-11-09

申请人： Mitsuo Nishi ,  Takanori Miyazaki ,  Eiichi Mukai ,  Yuuji Kamikawa ,  Hiroshi Tanaka

发明人： Mitsuo Nishi ,  Takanori Miyazaki ,  Eiichi Mukai ,  Yuuji Kamikawa ,  Hiroshi Tanaka

IPC分类号： B08B11/02 ,  H01L21/00 ,  H01L21/304 ,  H01L21/673 ,  B08B3/04

CPC分类号： H01L21/67057 ,  Y10S134/902 ,  Y10S206/832

摘要： A substrates-cleaning apparatus comprising process vessels in which washing solutions are contained, a chuck mechanism having a first substrate holder section for carrying silicon wafers to the process vessels while holding them in it, and a boat mechanism having a second substrate holder section for receiving the wafers from the chuck mechanism and for supporting the wafers in the washing solutions, wherein said second substrate holder section comprises base members made of erosion and heat resistant material, and receiver members attached to the base members, having a plurality of substrate holding grooves thereon, and made of erosion and heat resistant synthetic resin substantially same in softness as or softer than the wafers.

摘要翻译： 一种基板清洁装置，包括其中容纳有洗涤液的处理容器，具有用于在将硅晶片保持在其中的同时将硅晶片运送到处理容器的第一基板保持部分的卡盘机构，以及具有第二基板保持部分 来自卡盘机构的晶片并且用于将晶片支撑在洗涤溶液中，其中所述第二基板保持器部分包括由耐腐蚀和耐热材料制成的基部构件，以及附接到基部构件的接收构件，其上具有多个基板保持槽 由耐腐蚀和耐热合成树脂制成，其柔软度比晶片柔软或柔软。

公开(公告)号：US5319216A

公开(公告)日：1994-06-07

申请号：US105166

申请日：1993-08-12

申请人： Shori Mokuo ,  Yoichi Deguchi ,  Mitsuo Nishi ,  Shinji Tadakuma

发明人： Shori Mokuo ,  Yoichi Deguchi ,  Mitsuo Nishi ,  Shinji Tadakuma

IPC分类号： G01V8/20 ,  G01V9/04

CPC分类号： G01V8/20 ,  Y10S414/138

摘要： A substrate detector device comprises a boat or chuck for holding substrates, a light emitting section having a plurality of light emitting elements, arranged side by side, for respectively applying light beams to the substrates, a light receiving section, facing the light emitting section and having a plurality of light receiving elements, for receiving light beams passed through the substrates, the light receiving elements arranged side by side so as not face the light emitting elements, a polarization filter provided on optical axes of the respective optical beams incident on the light receiving elements, a memory for storing, as reference data, an amount of light received by a receiving element which has been measured in advance when a light beam is applied to a substrate in a state where no other substrate is present on either side of the substrate, and controller for discriminating the presence, the number, and the state of arrangement of the substrates on the holding means based on the reference data and measured data based on the amount of light received by the light receiving elements after a light beam scattered by the substrate to be detected and a light beam wraparound substrates adjacent thereto are removed by the polarization filter.

摘要翻译： 基板检测器装置包括用于保持基板的船或卡盘，具有并排布置的用于分别向基板施加光束的多个发光元件的发光部分，面向发光部分的光接收部分，以及 具有多个光接收元件，用于接收通过基板的光束，并排设置为不面对发光元件的光接收元件，设置在入射到光的各个光束的光轴上的偏振滤光器 接收元件，用于存储作为参考数据的存储器，由接收元件接收的光量，该接收元件在将光束施加到基板上时已经预先测量到，在不存在其它基板的状态下 基板和控制器，用于基于保持装置识别基板的布置的存在，数量和状态 基于由被检测基板散射的光束和与其相邻的光束环绕基板之后的光接收元件所接收的光量的基准数据和测量数据被偏振滤光器去除。

公开(公告)号：US5248022A

公开(公告)日：1993-09-28

申请号：US935460

申请日：1992-08-26

申请人： Yuji Kamikawa ,  Mitsuo Nishi

发明人： Yuji Kamikawa ,  Mitsuo Nishi

IPC分类号： B66F7/14

CPC分类号： B66F7/14 ,  Y10S277/913 ,  Y10S277/927

摘要： A driving device comprises a first cover, a second cover telescopically engaging with the first cover, and a third cover surrounding the first and second covers. Part of a driving member for moving the second cover in relation to the first cover is arranged in a first space defined in the first cover. The first space is supplied with nitrogen, and pressure in the space is kept at a positive value. Gas is fed into and exhausted from a second space defined between the first and second covers, in accordance with a change in the volume thereof, whereby pressure in the second space is kept at a substantially constant value. Gas contained in a third space defined between the third cover and the first and second covers is exhausted, and pressure in the third space is kept at a negative value. Thus, the first space is completely isolated from a space around the driving device.

摘要翻译： 驱动装置包括第一盖，与第一盖可伸缩地接合的第二盖和围绕第一盖和第二盖的第三盖。 用于相对于第一盖移动第二盖的驱动构件的一部分布置在限定在第一盖中的第一空间中。 第一个空间供给氮气，空间中的压力保持在正值。 根据其体积的变化，将气体从限定在第一和第二盖之间的第二空间送入并排出，由此将第二空间中的压力保持在基本恒定的值。 包含在第三盖和第一盖和第二盖之间的第三空间中的气体被排出，并且第三空间中的压力保持在负值。 因此，第一空间与驱动装置周围的空间完全隔离。

公开(公告)号：US5505577A

公开(公告)日：1996-04-09

申请号：US312080

申请日：1994-09-26

申请人： Mitsuo Nishi

发明人： Mitsuo Nishi

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65G65/00

CPC分类号： H01L21/67781 ,  Y10S414/138

摘要： A transfer apparatus comprising a carrier table for arranging a plurality of the carriers arranged in a serial array so as to hold the substrates mutually parallel to each other, a plurality of push-up members being adapted to be moved below each of the carriers for pushing up the substrates supported on the carriers through a lower opening portion of each of the carriers and having an upper surface with a plurality of equidistantly spaced grooves for receiving and lifting all of the substrates supported in one carrier as a whole, devices for bringing at least one of the plurality of push-up members into proximity to a corresponding remaining push-up member to allow the at least one push-up member to face the corresponding push-up member so that their mutually adjacent, directly-facing endmost substrates held in an endmost grooves of the mutually adjacent, directly-facing push-up members have their mutual distance adjusted to a distance equal to a pitch distance of those substrates supported by the push-up member to transfer the substrates to a support member.

摘要翻译： 一种传送装置，包括：载体台，用于布置以串联排列的多个载体，以便彼此平行地保持基板;多个上推构件，适于在每个载体下移动以推动 通过每个载体的下开口部分支撑在载体上的基板，并且具有上表面，该上表面具有多个等距隔开的凹槽，用于接收和提升支撑在一个载体中的所有基板作为整体，用于使至少 多个上推构件中的一个靠近相应的剩余上推构件，以允许至少一个上推构件面对相应的上推构件，使得它们相互相邻的直接面对的最基底保持在 相互相邻的直接面向的上推构件的最前面的凹槽的相互距离被调整到等于那些基底的俯仰距离的距离 由上推构件移动以将基板转移到支撑构件。

公开(公告)号：US5311893A

公开(公告)日：1994-05-17

申请号：US111473

申请日：1993-08-25

申请人： Mitsuo Nishi

发明人： Mitsuo Nishi

IPC分类号： H01L21/00 ,  H01L21/677 ,  B08B3/02

CPC分类号： H01L21/67051 ,  H01L21/67017 ,  H01L21/67766 ,  H01L21/67781 ,  Y10S134/902

摘要： A cleaning apparatus includes a cleaning unit provided with cleaning tubs in which cleaning liquid is contained, and a carrying mechanism for carrying matters to be processed into and out of the cleaning unit. The carrying mechanism has holding members for holding the matters thereon. The cleaning apparatus further includes a chamber in which the carrying mechanism is housed, and a cleaning/drying system arranged in an upper portion of the chamber to clean and dry the matters-holding members of the carrying mechanism. The cleaning/drying system has cleaning and drying nozzles through which cleaning liquid and drying air are jetted against the matters-holding members of the carrying mechanism.

摘要翻译： 清洁装置包括：清洁单元，设置有清洁桶，其中容纳有清洁液体;以及承载机构，用于将待加工和进出清洁单元的物品运送。 携带机构具有用于保持物品的保持构件。 清洁装置还包括容纳运送机构的室和布置在室的上部中的清洁/干燥系统，以清洁和干燥承载机构的物品保持构件。 清洁/干燥系统具有清洁和干燥喷嘴，通过该喷嘴将清洁液体和干燥空气喷射到承载机构的物品保持构件上。

公开(公告)号：US5253663A

公开(公告)日：1993-10-19

申请号：US935400

申请日：1992-08-26

申请人： Hiroshi Tanaka ,  Mitsuo Nishi ,  Ryuichi Mizoguchi ,  Yuuji Kamikawa

发明人： Hiroshi Tanaka ,  Mitsuo Nishi ,  Ryuichi Mizoguchi ,  Yuuji Kamikawa

IPC分类号： H01L21/00 ,  H01L21/677 ,  B08B3/02

CPC分类号： H01L21/67161 ,  H01L21/67028 ,  H01L21/67126 ,  H01L21/67173 ,  H01L21/67766 ,  H01L21/67772 ,  Y10S134/902

摘要： A rotary transfer arm for transferring semiconductor wafers is disposed in a closed housing. A closable opening portion is formed in the housing, through which the transfer arm can extend out from the housing. A fork is disposed at the distal end of the transfer arm. A plurality of holding grooves are formed in the fork to set a plurality of wafers with predetermined intervals between them. A cleaner for the fork is disposed in the upper portion of the housing. The cleaner has cleaning and drying nozzles mounted at the distal end of a switch arm. The switch arm can pivot between an operation position and a standby position. The switch arm can also move the cleaning and drying nozzles along the fork. During cleaning and drying, pure water is sprayed from the cleaning nozzles against the fork, and a drying gas is sprayed from the drying nozzles against it.

摘要翻译： 用于转移半导体晶片的旋转传送臂设置在封闭的壳体中。 在壳体中形成可闭合的开口部分，传送臂可以从壳体延伸出来。 叉子设置在传送臂的远端。 在叉中形成有多个保持槽，以在它们之间以预定间隔设置多个晶片。 用于叉子的清洁器设置在壳体的上部。 清洁器具有安装在开关臂远端的清洁和干燥喷嘴。 开关臂可以在操作位置和待机位置之间枢转。 开关臂还可以沿着叉子移动清洁和干燥喷嘴。 在清洁和干燥期间，从清洁喷嘴将纯水喷射到叉子上，并且干燥气体从干燥喷嘴喷射抵靠它。

公开(公告)号：US5620295A

公开(公告)日：1997-04-15

申请号：US580430

申请日：1995-12-27

申请人： Mitsuo Nishi

发明人： Mitsuo Nishi

IPC分类号： B65G49/07 ,  H01L21/677 ,  B65G65/30

CPC分类号： H01L21/67781 ,  Y10S414/138

摘要： A transfer apparatus for transferring a plurality of substrates between carriers holding these equidistantly arranged substrates thereon and a support member, comprising a carrier table for arranging a plurality of the carriers arranged in a serial array so as to hold the substrates mutually parallel to each other, a plurality of push-up members, each of the push-up members being adapted to be moved below each of the carriers for pushing up the substrates supported on the carriers through a lower opening portion of each of the carriers, each of the push-up members having an upper surface with a plurality of equidistantly spaced grooves for receiving and lifting all of the substrates supported in one carrier as a whole, devices for bringing at least one of the plurality of push-up members into proximity to a corresponding remaining push-up member to allow the at least one push-up member to face the corresponding push-up member so that their mutually adjacent, directly-facing endmost substrates held in an endmost grooves of the mutually adjacent, directly-facing push-up members have their mutual distance adjusted to a distance equal to a pitch distance of those wafers supported by the push-up member, wherein all the substrates lifted by the plurality of the push-up members and mutually equidistantly arranged are transferred at a time from the push-up members to the support member.

摘要翻译： 一种用于在保持这些等距布置的基板的载体之间传送多个基板的传送装置和支撑构件，包括用于布置串联布置的多个载体的载体台，以便彼此平行地保持基板， 多个上推构件，每个上推构件适于在每个支架的下方移动，用于将支撑在支架上的基板通过每个支架的下开口部分推压， 上部构件具有多个等间隔开的凹槽的上表面，用于接收和提升支撑在一个载体中的所有基板作为整体，用于使多个上推构件中的至少一个靠近相应的剩余推动的装置 的构件，以允许所述至少一个上推构件面对相应的上推构件，使得它们相互相邻的直接面向的最上面的子 保持在相互相邻的直接面向的上推构件的最末端的槽中的板条的相互距离被调整到等于由上推构件支撑的那些晶片的间距距离的距离，其中由多个 相互等距布置的上推构件一次从上推构件转移到支撑构件。