公开(公告)号：US20050206018A1

公开(公告)日：2005-09-22

申请号：US11129710

申请日：2005-05-13

申请人： Tadahiro Ohmi ,  Takashi Imaoka ,  Hisayuki Shimada ,  Nobuhiro Konishi ,  Mizuho Morita ,  Takeo Yamashita ,  Tadashi Shibata ,  Hidetoshi Wakamatsu ,  Jinzo Watanabe ,  Shintaro Aoyama ,  Masakazu Nakamura

发明人： Tadahiro Ohmi ,  Takashi Imaoka ,  Hisayuki Shimada ,  Nobuhiro Konishi ,  Mizuho Morita ,  Takeo Yamashita ,  Tadashi Shibata ,  Hidetoshi Wakamatsu ,  Jinzo Watanabe ,  Shintaro Aoyama ,  Masakazu Nakamura

IPC分类号： B01J19/08 ,  C23C8/10 ,  C23C8/36 ,  C23C14/02 ,  C23C14/48 ,  C23C16/02 ,  C23C16/44 ,  C30B23/02 ,  C30B25/02 ,  G01N23/00 ,  H01L21/66

CPC分类号： C30B23/02 ,  C23C8/10 ,  C23C8/36 ,  C23C14/022 ,  C23C14/48 ,  C23C16/02 ,  C23C16/4401 ,  C30B25/02 ,  C30B29/16 ,  Y10S438/903

摘要： Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressure in the vessels are reducible respectively. The vessels are so configured that objects to be processed are moveable among them and there is provided light projection means for projecting ultra rays on gases introduced to at least of the vessels.

摘要翻译： 真空处理设备能够防止颗粒粘附在真空容器中被处理物体。 真空设备包括一系列由门隔开的真空容器，容器中的压力分别可减少。 容器被配置成使待处理的物体在它们之间是可移动的，并且设置有用于将超光线投射到至少导入到容器中的气体的光投射装置。

公开(公告)号：US20140234198A1

公开(公告)日：2014-08-21

申请号：US14237948

申请日：2012-08-10

申请人： Mizuho Morita ,  Junichi Uchikoshi ,  Kentaro Tsukamoto ,  Takabumi Nagai ,  Kenji Adachi

发明人： Mizuho Morita ,  Junichi Uchikoshi ,  Kentaro Tsukamoto ,  Takabumi Nagai ,  Kenji Adachi

IPC分类号： H01L31/0236 ,  H01L31/18

CPC分类号： H01L31/02366 ,  H01L31/02363 ,  H01L31/18 ,  Y02E10/50

摘要： Provided is an etching method including: (1) bringing a material containing at least one organic compound having an N—F bond into contact with the surface of a solid material; and (2) a step of heating the solid material; whereby etching can be performed safely and in a simple manner, at a higher etching rate, without the use of a high-environmental-load gas that causes global warming or highly reactive and toxic fluorine gas or hydrofluoric acid. The etching method may further include: (3) a step of exposing the solid material to light from the side of the material containing at least one organic compound having an N—F bond; and (4) a step of removing the material containing at least one organic compound having an N—F bond together with the residue remained between said material and the solid material. In particular, performing heating at a high temperature and applying light irradiation make it possible to form inverted pyramid-shaped recesses that are suitable for applying light-trapping and/or anti-reflection processing to the surface of the solid material for a solar cell.

摘要翻译： 提供一种蚀刻方法，包括：（1）使含有至少一种具有N-F键的有机化合物的材料与固体材料的表面接触; 和（2）加热固体材料的步骤; 从而能够以更高的蚀刻速度安全地且以简单的方式执行蚀刻，而不使用引起全球变暖的高环境负荷气体或高反应性和有毒的氟气或氢氟酸。 蚀刻方法可以进一步包括：（3）将固体材料从含有至少一种具有N-F键的有机化合物的材料侧暴露于光的步骤; 和（4）除去含有至少一种具有N-F键的有机化合物的材料与残留物在所述材料和固体材料之间的步骤。 特别是，在高温下进行加热并施加光照射使得可以形成适于对太阳能电池的固体材料的表面进行光捕获和/或抗反射处理的倒棱锥形凹部。

公开(公告)号：US08421485B2

公开(公告)日：2013-04-16

申请号：US12665431

申请日：2007-12-13

申请人： Mizuho Morita ,  Takaaki Hirokane

发明人： Mizuho Morita ,  Takaaki Hirokane

IPC分类号： G01R27/08

CPC分类号： G01N27/07 ,  G01N15/1031 ,  G01N15/1056 ,  G01N2015/0065 ,  G01N2015/0088

摘要： A particle detection device (10) included substrates (1, 4), insulating members (2, 3), supporting member (5), and electrodes (6, 7). The insulating member (2) is provided on a principal surface of the substrate (1) and has a recess. The insulating member (3) is provided so as to make contact with the insulating member (3) and the substrate (4). The substrate (4) is formed on a principal surface of the supporting member (5). The electrode (6) is formed on a surface, which is opposite to the surface where the insulating member (2) is formed, of the substrate (1). The electrode (7) is formed on the surface (5A), the side surface (5B), and the rear surface (5C) of the supporting member (5) so as to be connected to the substrate (4). Accordingly, the detection device 10 includes a gap (8) surrounded by the insulating members (2, 3). The substrate (1) is connected to the substrate (4) with the insulating members (2, 3) and the supporting member (5) (quartz). In one embodiment, the insulating member (3) consist of quantum dots. Detection of the particles is either optically or electrically.

摘要翻译： 颗粒检测装置（10）包括基板（1,4），绝缘构件（2,3），支撑构件（5）和电极（6,7）。 绝缘构件（2）设置在基板（1）的主表面上并具有凹部。 绝缘构件（3）设置成与绝缘构件（3）和基板（4）接触。 基板（4）形成在支撑部件（5）的主表面上。 电极（6）形成在与基板（1）的形成有绝缘部件（2）的表面相反的表面上。 电极（7）形成在支撑部件（5）的表面（5A），侧面（5B）和后表面（5C）上，以与基板（4）连接。 因此，检测装置10包括由绝缘构件（2,3）包围的间隙（8）。 基板（1）通过绝缘构件（2,3）和支撑构件（5）（石英）与基板（4）连接。 在一个实施例中，绝缘构件（3）由量子点组成。 颗粒的光学或电学检测。

公开(公告)号：US20100201383A1

公开(公告)日：2010-08-12

申请号：US12665431

申请日：2007-12-13

申请人： Mizuho Morita ,  Takaaki Hirokane

发明人： Mizuho Morita ,  Takaaki Hirokane

IPC分类号： H01L29/66 ,  H01J40/14 ,  G01R27/08

CPC分类号： G01N27/07 ,  G01N15/1031 ,  G01N15/1056 ,  G01N2015/0065 ,  G01N2015/0088

摘要： A particle detection device (10) included substrates (1, 4), insulating members (2, 3), supporting member (5), and electrodes (6, 7). The insulating member (2) is provided on a principal surface of the substrate (1) and has a recess. The insulating member (3) is provided so as to make contact with the insulating member (3) and the substrate (4). The substrate (4) is formed on a principal surface of the supporting member (5). The electrode (6) is formed on a surface, which is opposite to the surface where the insulating member (2) is formed, of the substrate (1). The electrode (7) is formed on the surface (5A), the side surface (5B), and the rear surface (5C) of the supporting member (5) so as to be connected to the substrate (4). Accordingly, the detection device 10 includes a gap (8) surrounded by the insulating members (2, 3). The substrate (1) is connected to the substrate (4) with the insulating members (2, 3) and the supporting member (5) (quartz). In one embodiment, the insulating member (3) consist of quantum dots. Detection of the particles is either optically or electrically.

摘要翻译： 颗粒检测装置（10）包括基板（1,4），绝缘构件（2,3），支撑构件（5）和电极（6,7）。 绝缘构件（2）设置在基板（1）的主表面上并具有凹部。 绝缘构件（3）设置成与绝缘构件（3）和基板（4）接触。 基板（4）形成在支撑部件（5）的主表面上。 电极（6）形成在与基板（1）的形成有绝缘部件（2）的表面相反的表面上。 电极（7）形成在支撑部件（5）的表面（5A），侧面（5B）和后表面（5C）上，以与基板（4）连接。 因此，检测装置10包括由绝缘构件（2,3）包围的间隙（8）。 基板（1）通过绝缘构件（2,3）和支撑构件（5）（石英）与基板（4）连接。 在一个实施例中，绝缘构件（3）由量子点组成。 颗粒的光学或电学检测。

公开(公告)号：US6146135A

公开(公告)日：2000-11-14

申请号：US680519

申请日：1996-07-09

申请人： Jinzo Watanabe ,  Takeo Yamashita ,  Masakazu Nakamura ,  Shintaro Aoyama ,  Hidetoshi Wakamatsu ,  Tadashi Shibata ,  Tadahiro Ohmi ,  Nobuhiro Konishi ,  Mizuho Morita ,  Hisayuki Shimada ,  Takashi Imaoka

发明人： Jinzo Watanabe ,  Takeo Yamashita ,  Masakazu Nakamura ,  Shintaro Aoyama ,  Hidetoshi Wakamatsu ,  Tadashi Shibata ,  Tadahiro Ohmi ,  Nobuhiro Konishi ,  Mizuho Morita ,  Hisayuki Shimada ,  Takashi Imaoka

IPC分类号： B01J19/08 ,  C23C8/10 ,  C23C8/36 ,  C23C14/02 ,  C23C14/48 ,  C23C16/02 ,  C23C16/44 ,  C30B23/02 ,  C30B25/02 ,  G01N23/00 ,  H01L21/66 ,  F26B21/00 ,  F26B3/00 ,  F26B19/00

CPC分类号： C30B23/02 ,  C23C14/022 ,  C23C14/48 ,  C23C16/02 ,  C23C16/4401 ,  C23C8/10 ,  C23C8/36 ,  C30B25/02 ,  C30B29/16 ,  Y10S438/903

摘要： Vacuum processing equipment capable of preventing particles from sticking to objects to be processed in vacuum vessels. The vacuum equipment comprises a series of vacuum vessels separated by doors, and the pressure in the vessels are reducible respectively. The vessels are so configured that objects to be processed are movable among them, and there is provided light projection means for projecting ultra rays on gases introduced to at least of the vessels.

公开(公告)号：US06949478B2

公开(公告)日：2005-09-27

申请号：US10120628

申请日：2002-04-11

申请人： Tadahiro Ohmi ,  Takashi Imaoka ,  Hisayuki Shimada ,  Nobuhiro Konishi ,  Mizuho Morita ,  Takeo Yamashita ,  Tadashi Shibata ,  Hidetoshi Wakamatsu ,  Jinzo Watanabe ,  Shintaro Aoyama ,  Masakazu Nakamura

发明人： Tadahiro Ohmi ,  Takashi Imaoka ,  Hisayuki Shimada ,  Nobuhiro Konishi ,  Mizuho Morita ,  Takeo Yamashita ,  Tadashi Shibata ,  Hidetoshi Wakamatsu ,  Jinzo Watanabe ,  Shintaro Aoyama ,  Masakazu Nakamura

IPC分类号： B01J19/08 ,  C23C8/10 ,  C23C8/36 ,  C23C14/02 ,  C23C14/48 ,  C23C16/02 ,  C23C16/44 ,  C30B23/02 ,  C30B25/02 ,  G01N23/00 ,  H01L21/66 ,  H01L21/31

CPC分类号： C30B23/02 ,  C23C8/10 ,  C23C8/36 ,  C23C14/022 ,  C23C14/48 ,  C23C16/02 ,  C23C16/4401 ,  C30B25/02 ,  C30B29/16 ,  Y10S438/903

摘要： A method of forming an oxide film having high insularity capability is performed within an ultra clean environment, using charged particles.

摘要翻译： 使用带电粒子在超清洁环境下进行形成具有高绝缘性的氧化膜的方法。

公开(公告)号：US5360768A

公开(公告)日：1994-11-01

申请号：US784434

申请日：1991-11-06

申请人： Tadahiro Ohmi ,  Mizuho Morita

发明人： Tadahiro Ohmi ,  Mizuho Morita

IPC分类号： H01L21/316 ,  H01G21/316

CPC分类号： H01L21/31683 ,  H01L21/31654 ,  Y10S438/903

摘要： The present invention relates to a method of forming an oxide film comprising;a first step to form an oxide film on the surface of a substrate by bringing a solution containing oxygen and/or oxygen-containing molecule in contact with the surface of said substrate, and a second step to strengthen bond between oxygen and atoms constituting the surface of said substrate in said oxide film by the thermal treatment of said oxide film at a temperature higher than 20.degree. C. in vapor phase of oxygen, oxygen-containing molecule, inert gas alone, or a mixture of two or more of them.

摘要翻译： PCT No.PCT / JP90 / 00581 Sec。 371日期1991年11月6日 102（e）日期1991年11月6日PCT提交1990年5月7日PCT公布。 出版物WO90 / 13911 日期：1990年11月15日。本发明涉及形成氧化膜的方法。 通过使含有氧和/或含氧分子的溶液与所述衬底的表面接触而在衬底的表面上形成氧化膜的第一步骤，以及加强构成表面的氧和原子之间的键的第二步骤 通过在氧气，含氧分子，单独的惰性气体或其两种或更多种的混合物的气相中在高于20℃的温度下热处理所述氧化物膜，在所述氧化物膜中的所述衬底。