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    MONOLAYER DEPOSITION OF NANOPARTICLES
    1.
    发明申请
    MONOLAYER DEPOSITION OF NANOPARTICLES 有权

    公开(公告)号：US20230095274A1

    公开(公告)日：2023-03-30

    申请号：US17794429

    申请日：2021-01-21

    Applicant: NanoClear Technologies, Inc.

    Inventor： Harold Frank GREER ,  Rehan KAPADIA ,  Angelica SAENZ ,  David WEBBER

    IPC: B05D1/18 ,  C09D7/40 ,  B05D3/12 ,  B05D7/00

    Abstract: Methods of forming a monolayer of nanoparticles are described. The method may include forming an activated surface on a substrate. Methods may also include contacting the activated surface with a fluid including nanoparticles. Methods may further include forming a plurality of monolayers in the liquid on the activated surface. The plurality of nanoparticles may include a first monolayer of nanoparticles bonded to the activated surface. The plurality of nanoparticles may include a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles. The bond strengths between a nanoparticle and the underlying substrate, between adjacent nanoparticles, and between nanoparticles of adjacent monolayers may be related by a specific relationship. The method may also include removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer. Systems for performing the methods and substrates resulting from the methods are also described.

    MONOLAYER DEPOSITION OF NANOPARTICLES
    3.
    发明申请
    MONOLAYER DEPOSITION OF NANOPARTICLES 有权

    公开(公告)号：US20250050376A1

    公开(公告)日：2025-02-13

    申请号：US18432993

    申请日：2024-02-05

    Applicant: NanoClear Technologies, Inc.

    Inventor： Harold Franklin GREER ,  Rehan KAPADIA ,  Angelica SAENZ ,  David WEBBER

    IPC: B05D1/18 ,  B05D3/12 ,  B05D7/00 ,  C09D7/40

    Abstract: Methods of forming a monolayer of nanoparticles are described. The method may include forming an activated surface on a substrate. Methods may also include contacting the activated surface with a fluid including nanoparticles. Methods may further include forming a plurality of monolayers in the liquid on the activated surface. The plurality of nanoparticles may include a first monolayer of nanoparticles bonded to the activated surface. The plurality of nanoparticles may include a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles. The bond strengths between a nanoparticle and the underlying substrate, between adjacent nanoparticles, and between nanoparticles of adjacent monolayers may be related by a specific relationship. The method may also include removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer. Systems for performing the methods and substrates resulting from the methods are also described.

    ATOMIC LAYER ROUGHNESS REDUCING METHODS AND DEVICES
    4.
    发明公开
    ATOMIC LAYER ROUGHNESS REDUCING METHODS AND DEVICES 审中-公开

    公开(公告)号：US20230151495A1

    公开(公告)日：2023-05-18

    申请号：US17988734

    申请日：2022-11-16

    Applicant: NanoClear Technologies, Inc.

    Inventor： Harold Frank Greer ,  Rehan Kapadia

    IPC: C23F1/12

    CPC classification number: C23F1/12

    Abstract: Methods described herein allow for a smoothing of a particular material on a substrate independently of smoothing a different material on the substrate. Both materials may be exposed to the same reactant but form different skins (e.g., reactive layers). One skin may allow for smoothing of one material, while the other skin may protect or preserve the underlying material. Removing one of the skins may result in a smoother underlying material. The skins may be formed by a dry process and removed by a wet process, or the skins may be formed by a wet process and removed by a dry process. The change of the reaction medium between wet and dry for reaction and removal may allow for highly selective chemistries to result in smoothing one material while not affecting the underlying substrate or other materials at the surface. Substrates produced by these methods are described herein.

    Monolayer deposition of nanoparticles
    9.
    发明授权
    Monolayer deposition of nanoparticles 有权

    公开(公告)号：US11890640B2

    公开(公告)日：2024-02-06

    申请号：US17794429

    申请日：2021-01-21

    Applicant: NanoClear Technologies, Inc.

    Inventor： Harold Frank Greer ,  Rehan Kapadia ,  Angelica Saenz ,  David Webber

    IPC: B05D1/18 ,  C09D7/40 ,  B05D3/12 ,  B05D7/00

    CPC classification number: B05D1/185 ,  B05D3/12 ,  B05D7/54 ,  C09D7/66

    Abstract: Methods of forming a monolayer of nanoparticles are described. The method may include forming an activated surface on a substrate. Methods may also include contacting the activated surface with a fluid including nanoparticles. Methods may further include forming a plurality of monolayers in the liquid on the activated surface. The plurality of nanoparticles may include a first monolayer of nanoparticles bonded to the activated surface. The plurality of nanoparticles may include a second monolayer of nanoparticles bonded to the first monolayer of nanoparticles. The bond strengths between a nanoparticle and the underlying substrate, between adjacent nanoparticles, and between nanoparticles of adjacent monolayers may be related by a specific relationship. The method may also include removing monolayers of the plurality of monolayers while retaining the first monolayer to form the substrate with the first monolayer. Systems for performing the methods and substrates resulting from the methods are also described.

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