公开(公告)号：US08354141B2

公开(公告)日：2013-01-15

申请号：US13114346

申请日：2011-05-24

申请人： Tsunenaga Nakashima ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

发明人： Tsunenaga Nakashima ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

IPC分类号： B05D3/12

CPC分类号： G03F7/162 ,  Y10T137/0402

摘要： A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

摘要翻译： 一种液体处理装置，通过从供给喷嘴向所述表面供给处理液，处理基本上水平地保持在壳体的台架上的基板的表面。 液体处理装置包括：杯体，其设置成围绕保持在基板保持部的基板侧面，杯体从其上方可拆卸地安装在壳体内的基座上; 可拆卸地保持杯体的杯体保持部; 以及升降机构，其在所述杯体安装在所述基体上的第一位置与位于所述第一位置上方的第二位置之间上下移动所述杯体保持部。

公开(公告)号：US20120260946A1

公开(公告)日：2012-10-18

申请号：US13448491

申请日：2012-04-17

申请人： Nobuhiro OGATA ,  Terufumi Wakiyama

发明人： Nobuhiro OGATA ,  Terufumi Wakiyama

IPC分类号： B08B3/04

CPC分类号： B08B3/10 ,  B08B3/02 ,  B08B3/022 ,  B08B3/024 ,  B08B3/04 ,  B08B3/041 ,  B08B3/048 ,  H01L21/67017 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/6715 ,  Y10S134/902

摘要： Disclosed is a liquid processing apparatus including first and second cups installed so as to surround a rotation holding unit of a substrate and guide a processing liquid scattered from the rotating substrate downwards. A first driving unit and a second driving unit elevate the first cup and the second cup between a position receiving the processing liquid and the lower position thereof. A controller controls that the first cup and the second cup are ascended at the same time by transferring the driving force of the first driving unit while the first cup or a first elevating member thereof is overlapped with the second cup or a second elevating member thereof from the lower side by setting the ascending speed of the first cup to be higher than the ascending speed of the second cup when the first and second cups are ascended at the same time.

摘要翻译： 公开了一种液体处理装置，包括安装成围绕基板的旋转保持单元安装的第一和第二杯，并将从旋转底板散射的处理液向下引导。 第一驱动单元和第二驱动单元使第一杯和第二杯在接收处理液的位置和其下部位置之间升高。 控制器通过转移第一驱动单元的驱动力同时将第一杯和第二杯同时上升，同时第一杯或第一升降构件与第二杯或其第二升降构件重叠， 当第一杯和第二杯同时上升时，将第一杯的上升速度设定为高于第二杯的上升速度的下侧。

公开(公告)号：US08225737B2

公开(公告)日：2012-07-24

申请号：US12394690

申请日：2009-02-27

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05C5/02

CPC分类号： G03F7/162 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： A coating apparatus includes a driving unit configured to rotate a substrate holding member about a vertical axis to spread a coating liquid supplied on a front side central portion of a substrate toward a front side peripheral portion of the substrate by a centrifugal force. The apparatus is provided with a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate and configured to damp a wobble of the substrate being rotated by delivering a gas from the delivery port and sucking the gas into the suction port.

摘要翻译： 涂布装置包括驱动单元，其构造成使基板保持构件绕垂直轴线旋转，从而通过离心力向基板的前侧中央部分供给的涂布液向基板的前侧周边部分扩散。 该装置设置有摆动阻尼机构，该摆动阻尼机构包括气体输送口和吸入口，两者设置为面对基板的背面，并且构造成通过从输送口输送气体来吸收正在旋转的基板的摆动并吸入 气体进入吸入口。

公开(公告)号：US20120153044A1

公开(公告)日：2012-06-21

申请号：US13151665

申请日：2011-06-02

申请人： Nobuhiro Ogata ,  Shuichi Nagamine

发明人： Nobuhiro Ogata ,  Shuichi Nagamine

IPC分类号： B05B3/02

CPC分类号： H01L21/67051 ,  H01L21/6708

摘要： A substrate liquid processing apparatus of the present invention includes a guide rotary cup configured to guide a process-liquid scattering from a substrate rotating and being held by a substrate holding table and a guide cup configured to guide downward the process-liquid guided by the guide rotary cup. The guide cup includes a downward extension portion extending downward from an inner peripheral end portion of a guide cup body and an inner peripheral extension portion extending inward from the inner peripheral end portion more than the downward extension portion. The inner peripheral extension portion is configured to form a gas guide space together with the guide rotary cup and the downward extension portion so that a gas turning by the rotation of the guide rotary cup can be guided downward.

摘要翻译： 本发明的基板液体处理装置包括：引导旋转杯，其构造成引导来自旋转并由基板保持台保持的基板的处理液体散射;以及引导杯，其构造成向下引导由引导件引导的处理液 旋转杯 引导杯包括从引导杯体的内周端部向下延伸的向下延伸部分和从内周端部向内延伸的内延伸部分，而不是向下延伸部分。 内周延伸部构造成与导向旋转杯和向下延伸部一起形成气体导向空间，从而可以将导向旋转杯的旋转转动的气体向下引导。

公开(公告)号：US07984690B2

公开(公告)日：2011-07-26

申请号：US11907291

申请日：2007-10-10

申请人： Tsunenaga Nakashima ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

发明人： Tsunenaga Nakashima ,  Gouichi Iwao ,  Naofumi Kishita ,  Nobuhiro Ogata

IPC分类号： B05B15/04 ,  B05C11/02

CPC分类号： G03F7/162 ,  Y10T137/0402

摘要： A liquid treatment apparatus treating a surface of a substrate held generally horizontally on a stage in a housing by supplying a treating liquid to said surface from a supply nozzle. The liquid treatment apparatus includes a cup body provided so as to surround the substrate held in the substrate holding part laterally, the cup body being mounted detachably to a base inside the housing from an upward direction thereof; a cup body holding part holding the cup body detachably; and an elevating mechanism moving the cup body holding part up and down between a first position at which the cup body is mounted upon the base body and a second position located above the first position.

摘要翻译： 一种液体处理装置，通过从供给喷嘴向所述表面供给处理液，处理基本上水平地保持在壳体的台架上的基板的表面。 液体处理装置包括：杯体，其设置成围绕保持在基板保持部的基板侧面，杯体从其上方可拆卸地安装在壳体内的基座上; 可拆卸地保持杯体的杯体保持部; 以及升降机构，其在所述杯体安装在所述基体上的第一位置与位于所述第一位置上方的第二位置之间上下移动所述杯体保持部。

公开(公告)号：US20070082134A1

公开(公告)日：2007-04-12

申请号：US11540629

申请日：2006-10-02

申请人： Yoshiteru Fukuda ,  Nobuhiro Ogata ,  Takayuki Ishii ,  Keiji Tanouchi

发明人： Yoshiteru Fukuda ,  Nobuhiro Ogata ,  Takayuki Ishii ,  Keiji Tanouchi

IPC分类号： B05D3/10 ,  B05D3/04 ,  B05C13/02 ,  B08B3/00

CPC分类号： H01L21/6715 ,  G03F7/162 ,  G03F7/168 ,  H01L21/67051

摘要： A spin chuck rotatably holds a semiconductor wafer, while resist is dropped on a surface of the semiconductor wafer through a resist application nozzle and thus applied thereon, and before the resist applied on the wafer dries, a cleaning liquid is supplied through a bevel cleaning nozzle to a portion of the wafer located at a peripheral portion thereof in a vicinity of a beveled portion to remove the resist adhering to the beveled portion. Thereafter, a film of the resist that is formed on the surface of the wafer is dried.

摘要翻译： 旋转卡盘可旋转地保持半导体晶片，同时抗蚀剂通过抗蚀剂施加喷嘴落在半导体晶片的表面上并因此施加在其上，并且在施加在晶片上的抗蚀剂干燥之前，通过斜面清洁喷嘴 到位于其周边部分的晶片的位于斜面部分附近的部分以去除附着在斜面部分上的抗蚀剂。 此后，将形成在晶片表面上的抗蚀剂膜干燥。

公开(公告)号：US08881751B2

公开(公告)日：2014-11-11

申请号：US13151577

申请日：2011-06-02

申请人： Nobuhiro Ogata ,  Shuichi Nagamine

发明人： Nobuhiro Ogata ,  Shuichi Nagamine

IPC分类号： H01L21/67

CPC分类号： H01L21/67051 ,  Y10T137/8593

摘要： A substrate liquid processing apparatus includes a placement table configured to hold a substrate, a rotary driving unit configured to rotate the placement table, a liquid supply unit configured to supply a liquid to the substrate placed on the placement table, and an upper liquid guide cup, a central liquid guide cup, and a lower liquid guide cup which are disposed in this order from the top and are configured to guide downward the liquid scattering from the rotating substrate being placed on the placement table. A driving mechanism is configured to move up and down the upper liquid guide cup, the central liquid guide cup, and the lower liquid guide cup. The driving mechanism is connected to the central liquid guide cup.

摘要翻译： 基板液体处理装置包括：被配置为保持基板的放置台，构造成旋转放置台的旋转驱动单元，配置成将液体供给到放置在放置台上的基板的液体供给单元，以及上部液体引导杯 ，中央液体引导杯和下部液体引导杯，其从顶部起依次设置并且被配置为向下引导从放置在放置台上的旋转基板的液体散射。 驱动机构被构造成上下液体引导杯，中央液引导杯和下液体引导杯上下移动。 驱动机构连接到中央液体引导杯。

公开(公告)号：US08869811B2

公开(公告)日：2014-10-28

申请号：US12861196

申请日：2010-08-23

申请人： Nobuhiro Ogata ,  Shuichi Nagamine

发明人： Nobuhiro Ogata ,  Shuichi Nagamine

IPC分类号： B08B3/02 ,  B08B3/04 ,  B08B13/00 ,  H01L21/687 ,  B08B11/02 ,  H01L21/67

CPC分类号： B08B3/04 ,  B08B11/02 ,  H01L21/67051 ,  H01L21/68728 ,  H01L21/68742 ,  H01L21/68792

摘要： Disclosed is a liquid processing apparatus and a liquid processing method that can prevent a processing liquid from being left on a lift pin after a drying-out process of a substrate, thereby preventing the processing liquid from being attached to the back surface of the substrate after the liquid processing. The liquid processing apparatus of the present disclosure includes a holding plate that supports a substrate, a lift pin plate provided above the holding plate having a lift pin that supports the wafer from a lower side, and a processing liquid supply unit that supplies the processing liquid to the back surface of the wafer. The processing liquid supply unit is provided with a head part configured to close a penetrating hole of the lift pin plate. The processing liquid supply unit and the lift pin plate are configured to be elevated with respect to the holding plate.

摘要翻译： 公开了一种液体处理装置和液体处理方法，其可以防止在基板的干燥处理之后将处理液体留在升降销上，从而防止处理液附着到基板的背面，之后 液体处理。 本公开的液体处理装置包括支撑基板的保持板，设置在保持板上方的提升销板，其具有从下侧支撑晶片的升降销;以及处理液供给单元，其将处理液 到晶片的背面。 处理液供给单元设置有头部，该头部被构造成封闭提升销板的贯通孔。 处理液供给单元和升降销板被构造成相对于保持板升高。

公开(公告)号：US08840752B2

公开(公告)日：2014-09-23

申请号：US13161275

申请日：2011-06-15

申请人： Nobuhiro Ogata ,  Shuichi Nagamine ,  Kenji Kiyota

发明人： Nobuhiro Ogata ,  Shuichi Nagamine ,  Kenji Kiyota

IPC分类号： F16K11/22 ,  H01L21/67

CPC分类号： H01L21/67028 ,  H01L21/67173 ,  Y10T137/0324 ,  Y10T137/87684 ,  Y10T137/87877

摘要： Disclosed are a flow path switching apparatus and a fluid processing apparatus having a liquid processing unit that performs a processing by supplying different kinds of processing fluid to wafer W at different timings. The atmosphere of the liquid processing unit is discharged fluid to a plurality of exclusive exhaust paths through exhaust paths and flow path switching units. A flow path switching unit includes an outer tube having a plurality of connection holes and a rotary tube inserted into the outer tube having a plurality of openings. In particular, one of the plurality of openings of the rotary tube is aligned with one of the plurality of connection holes of the outer tube in such a way that only an aligned set of an opening of the rotary tube and a connection hole of the outer tube is sequentially communicated during the rotation of the rotary tube.

摘要翻译： 公开了一种具有液体处理单元的流路切换装置和流体处理装置，其通过在不同的时刻向晶片W供给不同种类的处理流体来进行处理。 液体处理单元的气氛通过排气路径和流路切换单元排出到多个排气通路。 流路切换单元包括具有多个连接孔的外管和插入到具有多个开口的外管中的旋转管。 特别地，旋转管的多个开口中的一个开口与外管的多个连接孔中的一个开口对准，使得只有对准的旋转管的开口的一组和外部的连接孔 在旋转管的旋转期间，管顺序地连通。

公开(公告)号：US08551563B2

公开(公告)日：2013-10-08

申请号：US13462880

申请日：2012-05-03

申请人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

发明人： Takahiro Kitano ,  Koichi Obata ,  Hiroichi Inada ,  Nobuhiro Ogata

IPC分类号： B05D3/12

CPC分类号： G03F7/162 ,  H01L21/6715 ,  H01L21/68742 ,  H01L21/68785

摘要： A coating method includes holding a substrate in a horizontal state on a substrate holding member; supplying a coating liquid onto a front side central portion of the substrate held on the substrate holding member; rotating the substrate holding member about a vertical axis to spread the coating liquid supplied on the front side central portion of the substrate toward a front side peripheral portion of the substrate by a centrifugal force; and damping a wobble of the substrate being rotated, by a wobble damping mechanism including a gas delivery port and a suction port both disposed to face a back side of the substrate, while delivering a gas from the delivery port and sucking the gas into the suction port.

摘要翻译： 一种涂布方法，包括：在基板保持部件上将基板保持为水平状态; 将涂布液供给到保持在所述基板保持部件上的所述基板的前侧中央部; 使基板保持部件绕垂直轴旋转，通过离心力向基板的前侧中央部供给的涂布液扩散; 通过包括气体输送口和吸入口的摆动阻尼机构来抑制基板的摆动，所述气体输送口和吸入口均设置成面对基板的背面，同时从输送口输送气体并将气体吸入吸入口 港口。