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公开(公告)号：US10418230B2
公开(公告)日：2019-09-17
申请号：US11870119
申请日：2007-10-10
摘要： Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.
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2.发明申请METHOD AND APPARATUS FOR MANUFACTURING CLEANED SUBSTRATES OR CLEAN SUBSTRATES WHICH ARE FURTHER PROCESSED 有权用于制造清洁基板或进一步处理的清洁基板的方法和装置公开(公告)号：US20080099039A1
公开(公告)日：2008-05-01
申请号：US11870119
申请日：2007-10-10
IPC分类号： B08B6/00
CPC分类号： B08B7/0035 , H01J37/32568 , H01J37/32623 , H01J37/32633 , H01J37/34 , H01J37/3438 , H01J37/3447 , H01J2237/335 , H01L21/67028 , H01L21/67069
摘要： Plasma etch-cleaning of substrates is performed by means of a plasma discharge arrangement comprising an electron source cathode (5) and an anode arrangement (7). The anode arrangement (7) comprises on one hand an anode electrode (9) and on the other hand and electrically isolated therefrom a confinement (11). The confinement (11) has an opening (13) directed towards an area (S) of a substrate (21) to be cleaned. The electron source cathode (5) and the anode electrode (9) are electrically supplied by a supply circuit with a supply source (19). The circuit is operated electrically floating.
摘要翻译： 通过包括电子源阴极（5）和阳极装置（7）的等离子体放电装置进行衬底的等离子体蚀刻清洁。 阳极装置（7）一方面包括阳极电极（9），另一方面包括阳极电极（9），并与其隔离。 限制件（11）具有朝向待清洁的基板（21）的区域（S）的开口（13）。 电子源阴极（5）和阳极电极（9）由供电电路（19）供电。 电路电浮动。
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