摘要:
Disclosed is a method for producing a rubber-modified styrenic resin. The method includes the steps of (a) producing a rubber solution by dissolving a rubber polymer in a vinyl monomer; (b) producing a rubber composition by continuously supplying the above rubber solution in a first reactor to polymerize the rubber polymer with the vinyl monomer at a reaction temperature of 120°-145° C. to perform phase inversion of the rubber polymer, thereby producing the polymer of conversion ratio of 10-40 wt %, and realized through 50-99% of rubber particles having an average particle diameter of 0.1-0.5 &mgr;m, and 1-50% of rubber particles having an average particle diameter of 1-5 &mgr;m; (c) performing polymerization until conversion ratio reaches 70-90% by continuously supplying a reactant solution produced in the first reactor in a second, third and fourth reactor; and (d) separating the polymer containing a rubber component from unreacted monomer by continuously supplying a reaction solution resulting from the fourth reactor to a devolatilizer.
摘要:
Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes a housing having an entrance in a side thereof and providing a space for performing a process, a door for opening and closing the entrance, and a support member disposed on the door to receive a substrate thereon.
摘要:
A structure for mounting a horizontal hood latch to an automobile includes an upper panel of a front-end module and a bracket over-molded onto the upper panel of the front-end module. A pair of through-openings are provided on opposite side portions of the bracket that allow both surfaces of the bracket to be coated by plastic material and the bracket to be mounted onto the upper panel, as the plastic material is poured thereon.
摘要:
The present invention relates to a method of preparing rubber-modified styrene copolymer resin with excellent transparency and impact resistance, specifically to a method of preparing transparent resin of rubber-modified styrene copolymer comprising graft-copolymerizing styrene monomer and (meth)acrylate monomer in the presence of block or random styrene-butadiene copolymer which has 30-50% of styrene skeleton content and 20-40 cp of 5% toluene solution viscosity at 25 iÉ. According to the method of the present invention, the transparent resin containing the rubber particles of a double structure comprising onion and core-shell structure can provide transparent resin of rubber-modified styrene copolymer resin with excellent transparency and impact resistance as well as good gloss.
摘要:
Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes: a housing having an entrance in a predetermined surface thereof and providing a space for performing a high pressure process; a support member disposed in the housing to support a substrate; a door for opening and closing the entrance; and a pressing member configured to apply a force to the door so as to close the housing during the high pressure process.
摘要:
Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.
摘要:
Provided is a substrate polishing apparatus that includes a polishing unit and a pad supporting member. The polishing unit includes a polishing pad polishing a substrate seated on a substrate supporting member, and a pad driving member moving the polishing pad. The pad supporting member is disposed at a side of the substrate supporting member to support a portion of a polishing surface the polishing pad without contacting the substrate when an edge of the substrate seated on the substrate supporting member is polished. Accordingly, the substrate polishing apparatus prevents the polishing pad from being inclined to the outer side of a substrate while an edge of the substrate is polished, thereby improving polishing efficiency and preventing the breakage of a substrate during a polishing process.
摘要:
The present invention relates to an information analysis system comprising: a summary table creation unit for analyzing an input file if the file is inputted, extracting a field list corresponding to the field list information stored in a provided database, and creating a summary table including the extracted field list; a preprocessing module for performing a preprocess including at least one of field refinement, group creation, and sub-data set creation, for fields of the summary table created by the summary table creation unit; a matrix creation unit for creating a matrix based on matrix setting information inputted by a user, for the fields created by the summary table creation unit or the preprocessing module; a cluster analysis unit for analyzing a cluster of corresponding fields according to a cluster analysis method inputted by the user, for fields selected by the user among the fields created by the summary table creation unit or the preprocessing module; and a visualization data creation unit for creating visualization data according to a visualization method selected by the user, for data created by at least one of the matrix creation unit, the preprocessing module, and the cluster analysis unit, in which methods such as a matrix, preprocessing, cluster analysis, and the like are allowed to be used in analyzing files so that accuracy and efficiency of information analysis can be enhanced.
摘要:
Provided are an apparatus and method for treating a substrate. Specifically, provided are an apparatus and method for treating a substrate through a supercritical process. The apparatus includes: a housing providing a space for performing a process; a support member disposed in the housing to support a substrate; a supply port configured to supply a process fluid to the housing; a shield member disposed between the supply port and the support member to prevent the process fluid from being directly injected to the substrate; and an exhaust port configured to discharge the process fluid from the housing.
摘要:
Provided are an apparatus and method for treating a substrate. More particularly, an apparatus and method for treating a substrate through a supercritical process are provided. The apparatus includes: a housing having an entrance in a predetermined surface thereof and providing a space for performing a high pressure process; a support member disposed in the housing to support a substrate; a door for opening and closing the entrance; and a pressing member configured to apply a force to the door so as to close the housing during the high pressure process.