Self-Aligned Bipolar Junction Transistors
    1.
    发明申请
    Self-Aligned Bipolar Junction Transistors 审中-公开
    自对准双极结晶体管

    公开(公告)号:US20110084247A1

    公开(公告)日:2011-04-14

    申请号:US12969652

    申请日:2010-12-16

    IPC分类号: H01L45/00 H01L27/082

    摘要: A plurality of bipolar transistors are formed by forming a common conduction region, a plurality of control regions extending each in an own active areas on the common conduction region, a plurality of silicide protection strips, and at least one control contact region. Silicide regions are formed on the second conduction regions and the control contact region. The second conduction regions may be formed by selectively implanting a first conductivity type dopant areas on a first side of selected silicide protection strips. The control contact region is formed by selectively implanting an opposite conductivity type dopant on a second side of the selected silicide protection strips.

    摘要翻译: 通过形成公共导电区域,在公共导电区域上的自身有效区域中延伸的多个控制区域,多个硅化物保护带和至少一个控制接触区域来形成多个双极晶体管。 在第二导电区域和控制接触区域上形成硅化物区域。 可以通过在所选择的硅化物保护条的第一侧选择性地注入第一导电类型的掺杂剂区域来形成第二导电区域。 通过在所选择的硅化物保护带的第二侧选择性地注入相反的导电型掺杂剂来形成控制接触区域。

    Reading voltage generator for a non-volatile EEPROM memory cell matrix of a semiconductor device and corresponding manufacturing process
    2.
    发明授权
    Reading voltage generator for a non-volatile EEPROM memory cell matrix of a semiconductor device and corresponding manufacturing process 有权
    读取电压发生器用于半导体器件的非易失性EEPROM存储单元阵列和相应的制造工艺

    公开(公告)号:US07663927B2

    公开(公告)日:2010-02-16

    申请号:US11941650

    申请日:2007-11-16

    IPC分类号: G11C16/06

    摘要: A reference voltage generator for a matrix of non-volatile memory cells of the EEPROM type, comprises at least one array enabled by an access transistor. The array comprises at least one reference cell associated with a relative select transistor, the transistors and the cell being realized on a semiconductor substrate and having active regions delimited by suitable field oxide regions and covered by a tunnel oxide layer and comprising at least one floating gate realized by a first polysilicon layer and covered by a dielectric layer and by a second polysilicon layer. Advantageously, the floating gate of the reference cells is contacted by a first contact terminal connected to a discharge transistor for the periodical discharge of possibly present charges. A process manufactures such a voltage generator.

    摘要翻译: 用于EEPROM类型的非易失性存储器单元的矩阵的参考电压发生器包括由存取晶体管使能的至少一个阵列。 该阵列包括与相对选择晶体管相关联的至少一个参考单元,晶体管和单元被实现在半导体衬底上,并且具有由合适的场氧化物区域限定并被隧道氧化物层覆盖并且包括至少一个浮置栅极 由第一多晶硅层实现并被介电层和第二多晶硅层覆盖。 有利地,参考单元的浮置栅极与连接到放电晶体管的第一接触端子接触,用于可能存在的电荷的周期性放电。 一个工艺制造这样的电压发生器。

    Non-volatile memory architecture and method, in particular of the EEPROM type
    3.
    发明申请
    Non-volatile memory architecture and method, in particular of the EEPROM type 有权
    非易失性存储器架构和方法,特别是EEPROM类型

    公开(公告)号:US20070247919A1

    公开(公告)日:2007-10-25

    申请号:US11701165

    申请日:2007-01-31

    IPC分类号: G11C16/06

    CPC分类号: G11C16/0433

    摘要: A memory architecture includes at least one matrix of memory cells of the EEPROM type organized in rows or word lines and columns or bit lines. Each memory cell includes a floating gate cell transistor and a selection transistor and is connected to a source line shared by the matrix. The memory cells are organized in words, all the memory cells belonging to a same word being driven by a byte switch, which is, in turn, connected to at least one control gate line. The memory cells further have accessible substrate terminals connected to a first additional line.

    摘要翻译: 存储器架构包括以行或字线和列或位线组织的EEPROM类型的至少一个存储器单元矩阵。 每个存储单元包括浮栅单元晶体管和选择晶体管,并连接到由矩阵共享的源极线。 存储器单元以字为单位,属于相同字的所有存储单元由字节开关驱动,该字节开关依次连接至至少一个控制栅极线。 存储单元还具有连接到第一附加线路的可访问基板端子。

    Process for manufacturing a byte selection transistor for a matrix of non volatile memory cells and corresponding structure
    4.
    发明申请
    Process for manufacturing a byte selection transistor for a matrix of non volatile memory cells and corresponding structure 有权
    用于制造用于非易失性存储器单元矩阵的字节选择晶体管和相应结构的工艺

    公开(公告)号:US20060043461A1

    公开(公告)日:2006-03-02

    申请号:US11258675

    申请日:2005-10-25

    IPC分类号: H01L29/788 H01L29/76

    摘要: A process for manufacturing a byte selection transistor for a matrix of non volatile memory cells organised in rows and columns integrated on a semiconductor substrate, each memory cell comprising a floating gate transistor and a selection transistor, the process providing the following steps: defining on a same semiconductor substrate respective active areas for the byte selection transistor, for the floating gate transistor and for the selection transistor split by portions of insulating layer; depositing a multilayer structure comprising at least a gate oxide layer, a first polysilicon layer, a dielectric layer on the whole substrate and a second polysilicon layer, characterised in that it comprises the following steps: removing through a traditional photolithographic technique the multilayer structure to form at least a couple of two bands developing substantially in a parallel way to the columns of the matrix of memory cells, the first band being effective to define the gate regions of the byte selection transistor and of the selection transistor, the second band being effective to define the gate region of the floating gate transistor, a portion of the first band further extending on the portion of insulating layer which is adjacent to the byte selection transistor, forming an opening in the portion up to expose the first polysilicon layer, forming a conductive layer in the opening to put said first polysilicon layer in electric contact with said second polysilicon layer.

    摘要翻译: 一种用于制造用于集成在半导体衬底上的行和列组织的非易失性存储器单元的矩阵的字节选择晶体管的处理,每个存储单元包括浮置栅晶体管和选择晶体管,该过程提供以下步骤: 相同的半导体衬底用于字节选择晶体管的相应有效区域,用于浮置栅极晶体管和用于分离绝缘层的选择晶体管; 沉积包括至少栅极氧化物层,第一多晶硅层,整个衬底上的电介质层和第二多晶硅层的多层结构,其特征在于其包括以下步骤:通过传统的光刻技术去除形成的多层结构 至少两个条带基本上以并行方式发展到存储器单元矩阵的列,第一条带有效地限定字节选择晶体管和选择晶体管的栅极区域,第二条带有效地 限定浮栅晶体管的栅极区,第一带的一部分在绝缘层的与字节选择晶体管相邻的部分上进一步延伸,在该部分中形成开口以暴露第一多晶硅层,形成导电 以使所述第一多晶硅层与所述第二多晶硅层电接触。

    Memory device with unipolar and bipolar selectors
    5.
    发明授权
    Memory device with unipolar and bipolar selectors 有权
    具有单极和双极选择器的存储器件

    公开(公告)号:US07483296B2

    公开(公告)日:2009-01-27

    申请号:US11233464

    申请日:2005-09-22

    IPC分类号: G11C11/36

    摘要: A memory device is proposed. The memory device includes a plurality of memory cells, wherein each memory cell includes a storage element and a selector for selecting the corresponding storage element during a reading operation or a programming operation. The selector includes a unipolar element and a bipolar element. The memory device further includes control means for prevalently enabling the unipolar element during the reading operation or the bipolar element during the programming operation.

    摘要翻译: 提出了一种存储器件。 存储器件包括多个存储器单元,其中每个存储器单元包括存储元件和用于在读取操作或编程操作期间选择相应的存储元件的选择器。 选择器包括单极元件和双极元件。 存储器件还包括控制装置,用于在编程操作期间在读取操作或双极元件期间普遍使能单极元件。

    Phase-change memory device and manufacturing process thereof
    6.
    发明申请
    Phase-change memory device and manufacturing process thereof 审中-公开
    相变存储器件及其制造方法

    公开(公告)号:US20060202245A1

    公开(公告)日:2006-09-14

    申请号:US11337787

    申请日:2006-01-23

    IPC分类号: H01L29/94

    摘要: A phase-change memory device, wherein memory cells form a memory array arranged in rows and columns. The memory cells are formed by a MOS selection device and a phase-change region connected to the selection device. The selection device is formed by first and second conductive regions which extend in a semiconductor substrate and are spaced from one another via a channel region, and by an isolated control region connected to a respective row and overlying the channel region. The first conductive region is connected to a connection line extending parallel to the rows, the second conductive region is connected to the phase-change region, and the phase-change region is connected to a respective column. The first connection line is a metal interconnection line and is connected to the first conductive region via a source-contact region made as point contact and distinct from the first connection line.

    摘要翻译: 一种相变存储器件,其中存储器单元形成以行和列布置的存储器阵列。 存储单元由连接到选择装置的MOS选择装置和相变区域形成。 选择装置由在半导体衬底中延伸并且经由沟道区彼此间隔开的第一和第二导电区域以及连接到相应行并且覆盖沟道区域的隔离控制区域形成。 第一导电区域连接到与行平行延伸的连接线,第二导电区域连接到相变区域,并且相变区域连接到相应的列。 第一连接线是金属互连线,并且通过作为点接触而不同于第一连接线的源极接触区域连接到第一导电区域。

    READING VOLTAGE GENERATOR FOR A NON-VOLATILE EEPROM MEMORY CELL MATRIX OF A SEMICONDUCTOR DEVICE AND CORRESPONDING MANUFACTURING PROCESS
    8.
    发明申请
    READING VOLTAGE GENERATOR FOR A NON-VOLATILE EEPROM MEMORY CELL MATRIX OF A SEMICONDUCTOR DEVICE AND CORRESPONDING MANUFACTURING PROCESS 有权
    读取电压发生器用于半导体器件的非易失性EEPROM存储单元矩阵和相应的制造工艺

    公开(公告)号:US20080123404A1

    公开(公告)日:2008-05-29

    申请号:US11941650

    申请日:2007-11-16

    IPC分类号: G11C16/28 H01L21/8247

    摘要: A reference voltage generator for a matrix of non-volatile memory cells of the EEPROM type, comprises at least one array enabled by an access transistor. The array comprises at least one reference cell associated with a relative select transistor, the transistors and the cell being realized on a semiconductor substrate and having active regions delimited by suitable field oxide regions and covered by a tunnel oxide layer and comprising at least one floating gate realized by a first polysilicon layer and covered by a dielectric layer and by a second polysilicon layer. Advantageously, the floating gate of the reference cells is contacted by a first contact terminal connected to a discharge transistor for the periodical discharge of possibly present charges. A process manufactures such a voltage generator.

    摘要翻译: 用于EEPROM类型的非易失性存储器单元的矩阵的参考电压发生器包括由存取晶体管使能的至少一个阵列。 该阵列包括与相对选择晶体管相关联的至少一个参考单元,晶体管和单元被实现在半导体衬底上,并且具有由合适的场氧化物区域限定并被隧道氧化物层覆盖并且包括至少一个浮置栅极 由第一多晶硅层实现并被介电层和第二多晶硅层覆盖。 有利地,参考单元的浮置栅极与连接到放电晶体管的第一接触端子接触,用于可能存在的电荷的周期性放电。 一个工艺制造这样的电压发生器。

    Process for manufacturing a byte selection transistor for a matrix of non volatile memory cells and corresponding structure
    9.
    发明授权
    Process for manufacturing a byte selection transistor for a matrix of non volatile memory cells and corresponding structure 失效
    用于制造用于非易失性存储器单元矩阵的字节选择晶体管和相应结构的工艺

    公开(公告)号:US06972454B2

    公开(公告)日:2005-12-06

    申请号:US10715887

    申请日:2003-11-18

    摘要: In a matrix of non volatile memory cells integrated on a semiconductor substrate, each memory cell includes a floating gate transistor and a selection transistor formed in a first active area, while each byte includes a byte selection transistor formed in a second active area separated from the first by portions of insulating layer. A portion of a multilayer structure including a gate oxide layer, a first polysilicon layer, a dielectric layer, and a second polysilicon layer extends over the byte selection and selection transistors, forming the gate regions thereof, and further extending on a portion of insulating layer. A conductive layer is formed in an opening in the second polysilicon and dielectric layers, over the portion of insulating layer, putting the first polysilicon layer in electric contact with the second polysilicon layer. Another portion of the multiplayer structure comprises the gate region of the floating gate transistor.

    摘要翻译: 在集成在半导体衬底上的非易失性存储单元的矩阵中,每个存储单元包括浮置晶体管和形成在第一有源区中的选择晶体管,而每个字节包括形成在与第一有源区分离的第二有源区中的字节选择晶体管 首先是绝缘层的一部分。 包括栅极氧化物层,第一多晶硅层,电介质层和第二多晶硅层的多层结构的一部分在字节选择和选择晶体管上延伸,形成其栅极区域,并且还在绝缘层的一部分上延伸 。 在第二多晶硅和电介质层的开口中,在绝缘层的部分上形成导电层,使第一多晶硅层与第二多晶硅层电接触。 多人结构的另一部分包括浮置栅极晶体管的栅极区域。

    Non-volatile memory architecture and method, in particular of the EEPROM type
    10.
    发明授权
    Non-volatile memory architecture and method, in particular of the EEPROM type 有权
    非易失性存储器架构和方法,特别是EEPROM类型

    公开(公告)号:US07649786B2

    公开(公告)日:2010-01-19

    申请号:US11701165

    申请日:2007-01-31

    IPC分类号: G11C16/04

    CPC分类号: G11C16/0433

    摘要: A memory architecture includes at least one matrix of memory cells of the EEPROM type organized in rows or word lines and columns or bit lines. Each memory cell includes a floating gate cell transistor and a selection transistor and is connected to a source line shared by the matrix. The memory cells are organized in words, all the memory cells belonging to a same word being driven by a byte switch, which is, in turn, connected to at least one control gate line. The memory cells further have accessible substrate terminals connected to a first additional line.

    摘要翻译: 存储器架构包括以行或字线和列或位线组织的EEPROM类型的至少一个存储器单元矩阵。 每个存储单元包括浮栅单元晶体管和选择晶体管,并连接到由矩阵共享的源极线。 存储器单元以字为单位,属于相同字的所有存储单元由字节开关驱动,该字节开关依次连接至至少一个控制栅极线。 存储单元还具有连接到第一附加线路的可访问基板端子。