摘要:
The invention relates to a charged particle detector system comprising a conversion plate (110) to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (120), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S1) and mean energy (S2) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.
摘要:
The invention relates to a charged particle detector system comprising a conversion plate (110) to convert incoming radiation to secondary electrons. These secondary electrons are then detected by a secondary electron detector (120), thereby providing information of the incoming radiation. Often this information is limited to, in first approximation, the flux of incoming radiation. In the case of, for example, backscattered electrons this is the current of the incoming backscattered electrons. The invention proposes to form the conversion plate as, for example, an energy dependent detector, for example a photodiode to detect electrons, so that the detector system simultaneously provides information of, for example, current (S1) and mean energy (S2) of the incoming radiation. The detector system is especially suited for use in a SEM or a DualBeam apparatus.
摘要:
Charged-particle microscopy includes irradiating a sample in N measurement sessions, each having an associated beam parameter (P) value; Detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, where n is an integer in the range 1≦n≦N, and processing the set (S) by: Defining a Point Spread Function (K) having a kernel value Kn for each value of n; Defining a spatial variable (V); Defining an imaging quantity (Q) having for each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; For each value of n, determining a minimum divergence min D(Mn∥Kn*V) between Mn and Qn, solving for V while applying constraints on the values Kn.
摘要:
A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1≦i≦N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.
摘要:
A charged-particle microscopy includes irradiating a sample in measurement sessions, each having an associated beam parameter (P) value detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, wherein an integer in the range of 1≦n≦N, and processing the set (S) by: defining a Point Spread Function (K) having a kernel value Kn for each value n; defining a spatial variable (V); defining an imaging quantity (Q) having fore each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; for each value of n, determining a minimum divergence min D(Mn∥Kn*V) between Mn and Qn, solving V while applying constraints on the values Kn.
摘要:
A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1≦i≦N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.
摘要:
The invention relates to a method and a device for the generation of a plasma through electric discharge in a discharge space which contains at least two electrodes, at least one of which is constructed from a matrix material or carrier material, such that an erosion-susceptible region with an evaporation spot is formed at least by the current flow. To present a method or a device for the generation of a plasma by electric discharge, it is suggested that a sacrificial substrate (38) is provided at least at the evaporation spot, the boiling point of said sacrificial suvstrate (38) during discharge operation lying below the melting point of the carrier material (30), such that charge carriers arising in the current flow are mainly generated from the sacrificial substrate (38).