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    Microscopic corner radius measurement system
    1.
    发明授权
    Microscopic corner radius measurement system 有权
    显微镜角半径测量系统

    公开(公告)号：US06397165B1

    公开(公告)日：2002-05-28

    申请号：US09877647

    申请日：2001-06-07

    申请人： Peter J. Fiekowsky

    发明人： Peter J. Fiekowsky

    IPC分类号： G03B2742

    CPC分类号： G01N21/956 ,  G03F1/84

    摘要： A measurement tool connects to a microscope for identifying and measuring microscopic dimensions of features on a photographic mask such as area, diameter and corner radius. Dimensions of features having sizes of less than about twice the wavelength being used (less than 1 micron for visible light) are measured quickly and accurately. The radius of curvature is also determined at submicron sizes using a flux measurement. Determination of the expected flux of a perfect comer aids in the measurement.

    摘要翻译： 测量工具连接到显微镜，用于识别和测量照相面具上的特征的微观尺寸，如面积，直径和拐角半径。 测量尺寸小于所用波长的两倍（可见光小于1微米）的特征尺寸被快速准确地测量。 曲率半径也使用通量测量在亚微米尺寸下确定。 确定完美的预期通量有助于测量。

    High accuracy particle dimension measurement system
    2.
    发明授权
    High accuracy particle dimension measurement system 失效
    高精度粒子尺寸测量系统

    公开(公告)号：US5966677A

    公开(公告)日：1999-10-12

    申请号：US807789

    申请日：1997-02-28

    申请人： Peter J. Fiekowsky

    发明人： Peter J. Fiekowsky

    IPC分类号： G01B11/02 ,  G01B11/08 ,  G01N21/956 ,  G03F1/00 ,  G03B27/42

    CPC分类号： G01N21/956 ,  G01N21/95607 ,  G03F1/84 ,  G01N2021/95676

    摘要： A measurement tool connects to an automatic inspection machine for identifying and measuring microscopic dimensions such as area, diameter, height and line width of defects and lines of a photographic mask. An operator draws a rough region of interest around a feature and the tool automatically identifies the feature and calculates its dimensions. For features less than one micron in size, the size of light photons interferes with measurement, so a non-linear polynomial calibration curve is developed for each machine. Features of known sizes are measured on a production machine to produce a calibration curve for each type of defect or line. Features of unknown sizes are measured on the same machine and the measured size in pixels are calibrated using the calibration curve to return a more accurate reading in microns. To determine a dimension, the type of a feature is determined by using a bounding box and light transitions of an intensity profile of the feature; multiple regions of interest are developed for each feature to accommodate angled lines; columns of pixels in each region of interest are summed to produce a light intensity distribution profile for each region of interest; total flux is determined from each profile and the best flux measurement is used to calculate a dimension of the feature. A good image of a feature is obtained by subtracting a reference image from an original image if a profile is of low quality. For lines separated by less than one resolution unit, a full-width half-maximum technique is used to calculate line width.

    摘要翻译： 测量工具连接到自动检测机器，用于识别和测量照相面具的缺陷和线条的微观尺寸，如面积，直径，高度和线宽。 操作员在特征周围绘制一个粗略的感兴趣区域，并且工具自动识别特征并计算其尺寸。 对于尺寸小于1微米的特征，光子的尺寸会干扰测量，因此为每台机器开发了非线性多项式校准曲线。 已知尺寸的特征在生产机器上测量以产生每种类型的缺陷或线的校准曲线。 在同一机器上测量未知尺寸的特征，并使用校准曲线校准测量尺寸（以像素为单位），以返回更精确的微米读数。 为了确定尺寸，通过使用边界框和特征的强度分布的光转换来确定特征的类型; 为每个特征开发多个感兴趣区域以适应成角度的线; 将每个感兴趣区域中的像素列相加以产生每个感兴趣区域的光强度分布分布; 从每个轮廓确定总通量，并且使用最佳通量测量来计算特征的尺寸。 如果轮廓质量较差，则通过从原始图像中减去参考图像获得特征的良好图像。 对于由少于一个分辨率单位分隔的线，使用全角半最大技术来计算线宽。

    Fast image simulation for photolithography
    5.
    发明授权
    Fast image simulation for photolithography 有权
    用于光刻的快速图像模拟

    公开(公告)号：US06765651B1

    公开(公告)日：2004-07-20

    申请号：US10385774

    申请日：2003-03-11

    申请人： Peter J. Fiekowsky ,  Paul R. Kube ,  April Dutta

    发明人： Peter J. Fiekowsky ,  Paul R. Kube ,  April Dutta

    IPC分类号： G03B2732

    CPC分类号： G03F7/705 ,  G06T5/30 ,  G06T7/0002 ,  G06T7/001 ,  G06T11/00 ,  G06T2207/30148

    摘要： A fast method simulates photolithography using conventional image processing techniques. Convolution simulates for blurring; erosion and dilation correct for edge diffraction. In one technique, the source image of the photomask is deconvolved to sharpen it and then dilated to remove edge diffraction. The image is eroded, and then convolved according to the resolution of the stepper at the photomask plane. This aerial image can be further eroded to match the effects of resist and developing. Optional thresholding is done to produce a simulated processed wafer image. In a fast technique, the deconvolution step is eliminated. Dilation and erosion are combined into a single erosion. Where a phase shift mask is involved, a complex convolution is used. Source data can come from the photomask electronic design or from a visual image of the actual photomask. Optimizations include: special microprocessor instructions, floating point pixel values, separable convolution and annular illumination simulation.

    摘要翻译： 一种快速的方法使用传统的图像处理技术来模拟光刻。 卷积模拟模糊; 侵蚀和扩张正确的边缘衍射。 在一种技术中，光掩模的源图像被去卷积以锐化，然后扩大以除去边缘衍射。 图像被侵蚀，然后根据步进器在光掩模平面上的分辨率进行卷积。 这种航空图像可以进一步侵蚀以匹配抗蚀剂和显影剂的效果。 进行可选的阈值处理以产生模拟的处理晶片图像。 在快速的技术中，去卷积步骤被消除。 扩散和侵蚀被组合成单一的侵蚀。 在涉及相移掩模的情况下，使用复数卷积。 源数据可以来自光掩模电子设计或来自实际光掩模的视觉图像。 优化包括：特殊微处理器指令，浮点像素值，可分离卷积和环形照明模拟。

    High accuracy particle dimension measurement system
    6.
    发明授权
    High accuracy particle dimension measurement system 失效
    高精度粒子尺寸测量系统

    公开(公告)号：US06263292B1

    公开(公告)日：2001-07-17

    申请号：US09028207

    申请日：1998-02-23

    申请人： Peter J. Fiekowsky

    发明人： Peter J. Fiekowsky

    IPC分类号： G03B2742

    CPC分类号： G01N21/956 ,  G01N21/95607 ,  G01N2021/95676 ,  G03F1/84

    摘要： A measurement tool connects to a microscope which may be an automatic inspection machine for identifying and measuring microscopic dimensions of features on a photographic mask such as opacity, area, diameter, width, height, line widths and corner radius. Dimensions of features having sizes of less than about twice the wavelength being used (less than 1 micron for visible light) are measured quickly and accurately in a production environment. The opacity of a feature is determined and used for correcting area or height measurements as well as helping to determine what the feature is made of. A contrast vs. diameter curve for known opaque features is used to determine opacity of unknown features. The curvature of the intensity profile of the feature is used in conjunction with a curvature-width lookup table in order to produce the width of the feature. Curvature-width lookup data is developed from the area and diameter of known round defects along with the curvature of the profile of the round defects. A width-height multiplier is used to correct the measured height due to the blurring associated with sizes of features close to the wavelength being used. An opacity correction is also used to correct the height of features that are less than 100% opaque. Width-height multiplier data is developed by measuring the area and diameter of known round defects, measuring their height and computing a multiplier. An actual measurement of the height of a feature measures both the height and the width. Width-height multiplier data is referenced using the measured width to produce a height multiplier for that width. The radius of curvature is also determined at submicron sizes using a flux measurement.

    摘要翻译： 测量工具连接到显微镜，显微镜可以是用于识别和测量照相掩模上的特征的微观尺寸的自动检查机，例如不透明度，面积，直径，宽度，高度，线宽和拐角半径。 在生产环境中快速准确地测量尺寸小于所使用波长的两倍的特征尺寸（对于可见光小于1微米）。 确定特征的不透明度，并用于校正区域或高度测量值，以及帮助确定特征的特征。 已知不透明特征的对比度与直径曲线用于确定未知特征的不透明度。 特征的强度分布的曲率与曲率宽度查找表结合使用，以便产生特征的宽度。 从已知圆形缺陷的面积和直径以及圆形缺陷轮廓的曲率开发曲率宽度查找数据。 使用宽高乘法器来校正测量高度，这是由于与所使用的波长附近的特征尺寸相关联的模糊。 不透明度校正也用于校正小于100％不透明度的特征的高度。 宽度高度乘数数据是通过测量已知圆形缺陷的面积和直径，测量其高度和计算乘数来开发的。 特征高度的实际测量可以测量高度和宽度。 使用测量的宽度引用宽度高度乘数数据，以生成该宽度的高度乘数。 曲率半径也使用通量测量在亚微米尺寸下确定。

    Fast image simulation for photolithography
    8.
    发明授权
    Fast image simulation for photolithography 有权
    用于光刻的快速图像模拟

    公开(公告)号：US07472372B1

    公开(公告)日：2008-12-30

    申请号：US11269910

    申请日：2005-11-08

    申请人： Peter J. Fiekowsky ,  Richard E. Schuster

    发明人： Peter J. Fiekowsky ,  Richard E. Schuster

    IPC分类号： G06F17/50

    CPC分类号： G03F7/705 ,  G03F1/36

    摘要： A fast method simulates photolithography using conventional image processing techniques. Convolution simulates blurring due to optics; erosion and dilation correct for edge diffraction. To produce the convolution kernel, an effective projection lens image for the image source is produced by convolving the lens image with an image of the illuminator aperture shape. An effective projection lens image for the stepper is produced similarly. The stepper effective lens image is divided by the image source effective lens image to produce a corrected effective lens image. A corrected convolution kernel is produced by taking a Fourier transform of the corrected effective lens image. The kernel is used to convolve the image, once using energy and once using voltage, and then squaring the result. The aerial image is produced by blending the energy and voltage convolutions according to the computed partial coherence of the optics. Complex convolution is used to represent relative phases other than 180 degrees.

    摘要翻译： 一种快速的方法使用常规的图像处理技术来模拟光刻。 卷积模拟光学造成的模糊; 侵蚀和扩张正确的边缘衍射。 为了产生卷积核，通过用透镜图像与照明器孔径形状的图像卷积来产生用于图像源的有效投影透镜图像。 类似地产生用于步进器的有效投影透镜图像。 步进有效透镜图像由图像源有效透镜图像分割以产生校正的有效透镜图像。 通过对校正的有效透镜图像进行傅立叶变换来产生校正的卷积核。 内核用于卷积图像，一次使用能量，一次使用电压，然后平方结果。 通过根据所计算的光学部分相干性混合能量和电压卷积来产生空间图像。 复杂卷积用于表示180度以外的相对相位。

    Optical proximity correction serif measurement technique
    9.
    发明授权
    Optical proximity correction serif measurement technique 失效
    光学邻近校正衬线测量技术

    公开(公告)号：US06760473B1

    公开(公告)日：2004-07-06

    申请号：US09685973

    申请日：2000-10-10

    申请人： Peter J. Fiekowsky

    发明人： Peter J. Fiekowsky

    IPC分类号： G06K900

    CPC分类号： G03F1/84 ,  G03F1/36

    摘要： An OPC feature measurement technique accurately measures serif area of OPC features, feature separation and line symmetry, and is especially useful for measuring dimensions which are less than about the wavelength of the examining radiation. The relative area of serifs present on a line end is measured by first defining a region of interest around the line end and then an intensity profile is created. The differences between data points on the profile and a constant value are summed in order to calculate a flux value. The flux value is divided by the intensity range to determine an area. The separation distance between a line end and another feature is determined by first defining a region of interest that spans the separation distance between the two features. Next, an intensity profile is created. The differences between data points on the profile and a constant value are summed to calculate a flux value. The separation distance between the features is calculated from the flux value. The asymmetry of serifs of a line present on a photomask is determined by first defining two regions of interest: a shank region of interest that includes the shank of the line and an end region of interest that includes the end of the line. Intensity profiles are created for both regions of interest. The profiles are created by summing values in a longitudinal direction with respect to the line. Finally, an asymmetry area value for the serifs is calculated using the end intensity profile and a centroid of the shank region of interest. The effective diameter, the separation distance and the asymmetry area are useful for evaluating the quality of the photomask.

    摘要翻译： OPC特征测量技术精确测量OPC特征的谱线区域，特征分离和线对称性，并且对于小于约检测辐射波长的尺寸特别有用。 通过首先在线端周围定义感兴趣区域，然后创建强度分布来测量线端上存在的衬线的相对面积。 将轮廓上的数据点和常数值之间的差值相加以计算通量值。 通量值除以强度范围以确定面积。 通过首先定义跨越两个特征之间的间隔距离的感兴趣区域来确定线端与另一特征之间的间隔距离。 接下来，创建强度分布。 将轮廓上的数据点和常数值之间的差值相加以计算通量值。 特征之间的距离由通量值计算。 通过首先定义两个感兴趣的区域来确定存在于光掩模上的线的不对称性：包括线的柄的感兴趣的柄部区域和包括线的末端的感兴趣的终点区域。 为两个感兴趣的区域创建强度配置文件。 轮廓通过相对于线的纵向方向的值求和来创建。 最后，使用结束强度分布和感兴趣的柄区域的质心来计算衬线的不对称面积值。 有效直径，分离距离和不对称区域对于评估光掩模的质量是有用的。

    Microscopic feature opacity measurement system
    10.
    发明授权
    Microscopic feature opacity measurement system 有权
    微观特征不透明度测量系统

    公开(公告)号：US06405153B1

    公开(公告)日：2002-06-11

    申请号：US09606841

    申请日：2000-06-28

    申请人： Peter J. Fiekowsky

    发明人： Peter J. Fiekowsky

    IPC分类号： G03B2742

    CPC分类号： G01N21/956 ,  G03F1/84

    摘要： A measurement tool connects to a microscope which may be an automatic inspection machine for identifying and measuring microscopic dimensions of features on a photographic mask such as opacity, area, diameter, width, height, line widths and corner radius. Dimensions of features having sizes of less than about twice the wavelength being used (less than 1 micron for visible light) are measured quickly and accurately in a production environment. The opacity of a feature is determined and used for correcting area or height measurements as well as helping to determine what the feature is made of. A contrast vs. diameter curve for known opaque features is used to determine opacity of unknown features. The curvature of the intensity profile of the feature is used in conjunction with a curvature-width lookup table in order to produce the width of the feature. Curvature-width lookup data is developed from the area and diameter of known round defects along with the curvature of the profile of the round defects. A width-height multiplier is used to correct the measured height due to the blurring associated with sizes of features close to the wavelength being used. An opacity correction is also used to correct the height of features that are less than 100% opaque. Width-height multiplier data is developed by measuring the area and diameter of known round defects, measuring their height and computing a multiplier. An actual measurement of the height of a feature measures both the height and the width. Width-height multiplier data is referenced using the measured width to produce a height multiplier for that width. The radius of curvature is also determined at submicron sizes using a flux measurement.

    摘要翻译： 测量工具连接到显微镜，显微镜可以是用于识别和测量照相掩模上的特征的微观尺寸的自动检查机，例如不透明度，面积，直径，宽度，高度，线宽和拐角半径。 在生产环境中快速准确地测量尺寸小于所使用波长的两倍的特征尺寸（对于可见光小于1微米）。 确定特征的不透明度，并用于校正区域或高度测量值，以及帮助确定特征的特征。 已知不透明特征的对比度与直径曲线用于确定未知特征的不透明度。 特征的强度分布的曲率与曲率宽度查找表结合使用，以便产生特征的宽度。 从已知圆形缺陷的面积和直径以及圆形缺陷轮廓的曲率开发曲率宽度查找数据。 使用宽高乘法器来校正测量高度，这是由于与所使用的波长附近的特征尺寸相关联的模糊。 不透明度校正也用于校正小于100％不透明度的特征的高度。 宽度高度乘数数据是通过测量已知圆形缺陷的面积和直径，测量其高度和计算乘数来开发的。 特征高度的实际测量可以测量高度和宽度。 使用测量的宽度引用宽度高度乘数数据，以生成该宽度的高度乘数。 曲率半径也使用通量测量在亚微米尺寸下确定。