摘要:
Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively.
摘要:
Disclosed are method(s), system(s), and article(s) of manufacture for implementing a layout of an electronic circuit using one or more constraint checking windows. The method identifies some constraints on multiple-patterning lithography and multiple constraint checking windows for the layout. The method determines one or more metrics for a constraint checking window or for a layout and assigns one or more shapes in the one or more constraint checking windows to their respective mask designs based on the one or more metrics. The method traverses through the one or more constraint checking windows until all shapes in the layout are assigned to their respective mask designs. The method may also determine a processing order for the one or more constraint checking windows based on the distribution of a type of shapes in the layout.
摘要:
A method for automatically generating and prioritizing several design solutions that resolve a double patterning (DP) loop violation in an IC design layout. The method of some embodiments receives a DP loop violation marker and identifies pairs of edges of shapes that form a double patterning loop based on the DP loop violation marker. For each pair of edges that violates the design rule, the method generates one or more design solutions. Each design solution moves a single edge or both edges to resolve the violation. The method of some embodiments computes the cost of applying each design solution to the IC design layout and prioritizes the generated solutions for all the identified pairs of edges based on the computed cost for each solution. The method in some embodiments then selects a solution from the prioritized solutions and applies the selected solution to the design layout.
摘要:
Disclosed is an improved method and system for implementing parallel processing of computing operations by effectively handling dependencies between different sequences of computing operations. In some approaches, some or all operations corresponding to dependencies between different sequences of operations are duplicated among the different sequences. This approach may be used to implement parallel processing of EDA tools.
摘要:
Disclosed is a method and system for processing the tasks performed by an IC layout processing tool in parallel. In some approaches, the IC layout is divided into a plurality of layout portions and one or more of the layout portions are processed in parallel, where geometric select operations are performed in which data for different layout portions may be shared between different processing entities. One approach includes the following actions: select phase one operation for performing initial select actions within layout portions; distributed regioning action for local regioning; distributed regioning action for global regioning and binary select; count select aggregation for count-based select operations; and select phase two operations for combining results of selecting of internal shapes and interface shapes.
摘要:
Methods and systems for the integration of models and accurate predictions to score the circuit design, which translates to a more accurate and less complex yield prediction. In the present inventive approach, the computer-implemented methods and systems use at least one processor that is configured for performing at least predicting a physical realization of a layout design based at least in part on one or more model parameters, determining one or more hotspots associated with the layout design, determining a score for each of the one or more hotspots associated with the layout design, and categorizing the one or more hotspots according to at least the score in some embodiments. In some embodiments, the methods or the systems further use at least one processor for the act of determining one or more hotspots by using at least the design intent or the manufacturing information.
摘要:
Disclosed encompasses method, system, computer program product for implementing interactive checking of constraints. Various embodiments bridge schematic design environment and layout environment with a binder mapping process and utilize connectivity information from the schematic design to identify constraint violations early in the physical design stage. The method identifies or creates a layout and identifies or generates an object for a modification process. The method may take snapshot(s) of the design database or may use one or more logs for restoring the design database. The method then identifies or creates scratch pad(s) and performs modification process on the object to generate a change. The method uses scratch pad(s) and trigger(s) to perform constraint checking during the modification process to provide interactive feedback in response to the modification process before committing the change to the persistent database.
摘要:
Disclosed are methods and systems for implementing constraint and connectivity aware physical designs. The method or system provides a connectivity-aware environment to implement electronic designs. For example, the method interactively determines whether an electronic design complies with various constraints by using connectivity information in a nearly real-time manner while the electronic design is being created in some embodiments. The method or system uses the connectivity information provided by a connectivity engine or specified by designers to present feedback to a user as to whether a newly created object or a newly modified object complies or violates certain relevant constraints in an interactive manner or in nearly real-time without having to perform such constraints checking in batch mode. The method further enables one to implement electronic designs by using connectivity information without performing extraction on layouts or rebuilding nets.
摘要:
Disclosed are a method, apparatus, and computer program product for performing interactive layout editing to address double patterning approaches to implement lithography of electronic designs. A spatial query is performed around the shape(s) being created during editing with the distance of allowed spacing in a single mask. If a design error is encountered, corrective editing may occur to correct the error. Checking may occur to make sure that the error detection and corrective actions can be performed interactively.
摘要:
In random defect yield simulation, a specific defect size interacts with a specific physical design and has a calculated probability of failure associated with it. The failure model is in terms of probability of failure. It provides a solution to the random defect yield simulation problem of chips with a built-in redundancy scheme. The solution first defines the independent failure modes of the chip with a built-in redundancy scheme and efficiently models each mode. Then, it may accumulate the respective probability of failures according to the chip's architecture.