Apparatus for the production of glow discharge
    2.
    发明授权
    Apparatus for the production of glow discharge 失效
    用于产生辉光放电的设备

    公开(公告)号:US5296784A

    公开(公告)日:1994-03-22

    申请号:US795988

    申请日:1991-11-22

    IPC分类号: H05H1/46 H05H7/18 H01J7/24

    摘要: Apparatus for the production of glow discharge, preferably for a large-area plasma CVD process, including a vacuum coating chamber (K) and a microwave waveguide resonator with one or more coupling points, wherein the resonator is made in the form of a microwave waveguide ring resonator (13, 13'), reaction zones (R) are formed at the coupling points between the microwave waveguide ring resonator (13, 13') and the vacuum chamber (K), and in each case a series of magnets (5, 5', . . . ; 6, 6', . . . ) of different polarity are provided, so that in front of the reaction zone (R) individual tunnels of magnetic field lines (16, 16') running parallel thereto are formed and each magnetic field (16, 16') encloses a spatially uniform plasma tube (17) in the reaction zone (R).

    摘要翻译: 用于产生辉光放电的装置,优选用于大面积等离子体CVD工艺,包括具有一个或多个耦合点的真空涂覆室(K)和微波波导谐振器,其中所述谐振器以微波波导的形式 环形谐振器(13,13'),在微波波导环形谐振器(13,13')和真空室(K)之间的耦合点处形成反应区域(R),并且在每种情况下形成一系列磁体(5 ,5',...,6,6',...),使得在反应区(R)的前面与其平行延伸的磁场线(16,16')的各个通道是 并且每个磁场(16,16')在反应区域(R)中包围空间上均匀的等离子体管(17)。

    Apparatus for coating substrates using a microwave ECR plasma source
    3.
    发明授权
    Apparatus for coating substrates using a microwave ECR plasma source 失效
    使用微波ECR等离子体源涂覆基板的设备

    公开(公告)号:US5378284A

    公开(公告)日:1995-01-03

    申请号:US908446

    申请日:1992-06-30

    CPC分类号: C23C16/458 C23C16/511

    摘要: An apparatus and a method for producing layers on the surfaces of workpieces, preferably on spotlight, or headlight, reflector inserts formed of plastic, includes an apparatus having a vacuum chamber that can be operated as a batch system with a PCVD coating process, where a microwave ECR plasma coating source is used, and the workpieces to be coated are secured to a rotary cage arranged in the vacuum chamber. The rotary cage can be conducted past a microwave coating source with a frequency-matched and phase-matched planetary motion. Such a coating process can be used in a vacuum chamber, under plasma, and at pressures below 2.times.10.sup.-2 mbar.

    摘要翻译: 在工件表面上,优选在聚光灯或头灯,由塑料形成的反射器插入件的表面上生产层的装置和方法包括具有真空室的装置,该真空室可以作为具有PCVD​​涂覆工艺的分批系统来操作,其中 使用微波ECR等离子体涂覆源,待涂覆的工件固定在设置在真空室中的旋转笼中。 旋转笼可以经过频率匹配和相位匹配的行星运动的微波涂层源。 这种涂覆方法可以在真空室中,在等离子体下使用,并且在低于2×10-2毫巴的压力下使用。