公开(公告)号：US09164285B2

公开(公告)日：2015-10-20

申请号：US13472205

申请日：2012-05-15

申请人： Sang Woo Whangbo ,  Jinhwan Kim ,  Haeyoung Yun ,  Seung Jun Jeong

发明人： Sang Woo Whangbo ,  Jinhwan Kim ,  Haeyoung Yun ,  Seung Jun Jeong

IPC分类号： G02B27/22

CPC分类号： G02B27/2214

摘要： A 3D image display apparatus includes a display panel including a plurality of pixels to display an image and a lenticular lens plate disposed in front of the display panel and including a plurality of lenticular lenses. The pixels are arranged to have an arrangement axis inclined with respect to a vertical axis of the display panel, and the lenticular lenses have a lens axis inclined with respect to the vertical axis of the display panel.

摘要翻译： 3D图像显示装置包括：显示面板，包括多个像素以显示图像;以及双凸透镜板，设置在显示面板的前面，并且包括多个双凸透镜。 像素被布置为具有相对于显示面板的垂直轴线倾斜的布置轴，并且双凸透镜具有相对于显示面板的垂直轴线倾斜的透镜轴。

公开(公告)号：US20120009842A1

公开(公告)日：2012-01-12

申请号：US13239759

申请日：2011-09-22

申请人： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

发明人： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

IPC分类号： H01J9/00 ,  G03F1/00

CPC分类号： G02F1/136213 ,  G02F1/13458 ,  G02F2001/136236 ,  H01L2924/0002 ,  H01L2924/00

摘要： A mask is provided. The mask includes a mask body, a first exposing part and a second exposing part. The first exposing part is on the mask body. The first exposing part includes a first light transmitting portion and second light transmitting portions. The first light transmitting portion exposes a portion of the photoresist film corresponding to the output terminal to a light of a first light amount. The second light transmitting portions exposes an adjacent portion of the photoresist film adjacent to the output terminal to a light of a second light amount smaller than the first light amount. The second exposing part is on the mask body. The second exposing part includes third light transmitting portions for partially exposing the photoresist film corresponding to the storage electrode to a light of a third light amount that is between the first and second light amounts.

摘要翻译： 提供面罩。 面罩包括面罩主体，第一曝光部和第二曝光部。 第一曝光部分在面罩主体上。 第一曝光部分包括第一透光部分和第二透光部分。 第一光透射部分将与输出端子相对应的光致抗蚀剂膜的一部分暴露于第一光量的光。 第二透光部分使邻近输出端子的光致抗蚀剂膜的相邻部分暴露于小于第一光量的第二光量的光。 第二曝光部位在面罩主体上。 第二曝光部分包括用于将对应于存储电极的光致抗蚀剂膜部分地曝光到处于第一和第二光量之间的第三光量的光的第三透光部分。

公开(公告)号：US20090280587A1

公开(公告)日：2009-11-12

申请号：US12427996

申请日：2009-04-22

申请人： Sang-Woo WHANGBO ,  Bong-Kyu Shin ,  Sang-Uk Lim ,  Jun-Hyung Souk ,  Jin-Ho Ju

发明人： Sang-Woo WHANGBO ,  Bong-Kyu Shin ,  Sang-Uk Lim ,  Jun-Hyung Souk ,  Jin-Ho Ju

IPC分类号： H01L33/00 ,  B08B5/00 ,  B05D3/10

CPC分类号： C03C23/006 ,  C03C17/36 ,  C03C17/3626 ,  C03C17/3636 ,  C03C23/0075

摘要： A method of treating a soda-lime glass (SLG) substrate includes cleaning the SLG substrate using an alkali cleaning solution and cleaning the cleaned SLG substrate using a plasma process. The SLG substrate is cleaned using the alkali cleaning solution to remove particles adhered to the SLG substrate. Thus, defects due to the adhering particles may be reduced.

摘要翻译： 处理钠钙玻璃（SLG）衬底的方法包括使用碱性清洗溶液清洗SLG衬底并使用等离子体工艺清洁清洁的SLG衬底。 使用碱性清洁溶液清洁SLG基板以除去附着在SLG基板上的颗粒。 因此，可能减少由于粘附颗粒引起的缺陷。

公开(公告)号：US08647928B2

公开(公告)日：2014-02-11

申请号：US11646126

申请日：2006-12-27

申请人： Sang-Woo Whangbo ,  Shi-Yul Kim ,  Sung-Hoon Yang ,  Woo-Geun Lee

发明人： Sang-Woo Whangbo ,  Shi-Yul Kim ,  Sung-Hoon Yang ,  Woo-Geun Lee

IPC分类号： H01L21/00 ,  H01L21/84

CPC分类号： H01L29/4908 ,  H01L27/124 ,  H01L27/1288

摘要： A thin film transistor substrate includes a base substrate, a gate electrode, a gate insulating layer, a surface treating layer, an active layer, a source electrode and a drain electrode. The gate electrode is formed on the base substrate. The gate insulating layer is formed on the base substrate to cover the gate electrode. The surface treating layer is formed on the gate insulating layer by treating the gate insulating layer with a nitrogen-containing gas to prevent leakage current. The active layer is formed on the surface treating layer to cover the gate electrode. The source electrode and the gate electrode that are spaced apart from each other by a predetermined distance are formed on the active layer.

摘要翻译： 薄膜晶体管基板包括基底基板，栅极电极，栅极绝缘层，表面处理层，有源层，源电极和漏电极。 栅电极形成在基底基板上。 栅极绝缘层形成在基底基板上以覆盖栅电极。 通过用含氮气体处理栅极绝缘层，在栅极绝缘层上形成表面处理层，以防止漏电流。 在表面处理层上形成有源层以覆盖栅电极。 在有源层上形成彼此隔开预定距离的源电极和栅电极。

公开(公告)号：US20100203715A1

公开(公告)日：2010-08-12

申请号：US12765698

申请日：2010-04-22

申请人： Sang-Gab KIM ,  Woo-Geun Lee ,  Shi-Yul Kim ,  Jin-Ho Ju ,  Jang-Soo Kim ,  Sang-Woo Whangbo ,  Min-Seok Oh ,  Hye-Young Ryu ,  Hong-Kee Chin

发明人： Sang-Gab KIM ,  Woo-Geun Lee ,  Shi-Yul Kim ,  Jin-Ho Ju ,  Jang-Soo Kim ,  Sang-Woo Whangbo ,  Min-Seok Oh ,  Hye-Young Ryu ,  Hong-Kee Chin

IPC分类号： H01L21/28

CPC分类号： H01L27/124 ,  G02F2001/13629 ,  H01L29/458

摘要： The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting film including Mo, a second conducting film including Al, and a third conducting film including Mo on the ohmic contact; forming a first photoresist pattern on the third conducting film; etching the first, second, and third conducting films, the ohmic contact, and the semiconductor layer using the first photoresist pattern as a mask; removing the first photoresist pattern by a predetermined thickness to form a second photoresist pattern; etching the first, second, and third conducting films using the second photoresist pattern as a mask to expose a portion of the ohmic contact; and etching the exposed ohmic contact using a Cl-containing gas and a F-containing gas.

摘要翻译： 本发明提供一种薄膜晶体管阵列面板的制造方法，其包括在基板上形成栅极线; 在栅极线上形成栅极绝缘层，半导体层和欧姆接触; 形成包括Mo的第一导电膜，包括Al的第二导电膜和在欧姆接触上包含Mo的第三导电膜; 在所述第三导电膜上形成第一光致抗蚀剂图案; 使用第一光致抗蚀剂图案作为掩模蚀刻第一，第二和第三导电膜，欧姆接触和半导体层; 将第一光致抗蚀剂图案去除预定厚度以形成第二光致抗蚀剂图案; 使用第二光致抗蚀剂图案作为掩模蚀刻第一，第二和第三导电膜以暴露欧姆接触的一部分; 并使用含Cl气体和含F气体蚀刻暴露的欧姆接触。

公开(公告)号：US20090239733A1

公开(公告)日：2009-09-24

申请号：US12381207

申请日：2009-03-09

申请人： Se-Ah Kwon ,  Min Kang ,  Byoung-Joo kim ,  Jin-Ho Ju ,  Chul Huh ,  Sang-Woo Whangbo

发明人： Se-Ah Kwon ,  Min Kang ,  Byoung-Joo kim ,  Jin-Ho Ju ,  Chul Huh ,  Sang-Woo Whangbo

IPC分类号： C03C3/04 ,  C03B29/00

CPC分类号： C03B29/08 ,  C03C23/007

摘要： A soda-lime glass substrate formed through a heat-treatment method has an absorption coefficient ranging from about 0.15 λ,W/m·K to about 0.54 λ,W/m·K, and a free path length ranging from about 0.12 cm to about 0.24 cm. The heat-treated soda-lime glass substrate is formed by heating for a selected time at a pre-specified maximum temperature of about 270° C. to about 330° C. so as to remove thermally induced residual deformations from the substrate and then the substrate is slowly cooled so as to substantially avoid reintroducing thermally induced residual deformations into the cooling substrate. Thus, the soda-lime glass substrate is transformed to one at or close to its contraction saturation point. This allows the heat-treated soda-lime glass substrate to serve in a practical way as a substrate of a flat display panel.

摘要翻译： 通过热处理方法形成的钠钙玻璃基板的吸收系数范围为约0.15λ，W / m.K至约0.54λ，W / m.K，自由通道长度范围为约0.12cm至约0.24cm。 热处理的钠钙玻璃基板通过在约270℃至约330℃的预先规定的最高温度下加热选定的时间而形成，以便从基板除去热诱导的残余变形，然后 衬底被缓慢冷却，以便基本上避免将热诱导的残留变形重新引入冷却衬底。 因此，钠钙玻璃基板在其收缩饱和点处或其附近被转变成一个。 这样，作为平面显示面板的基板，能够以实用的方式使热处理的钠钙玻璃基板。

公开(公告)号：US20130128354A1

公开(公告)日：2013-05-23

申请号：US13472205

申请日：2012-05-15

申请人： Sang Woo WHANGBO ,  Jinhwan Kim ,  Haeyoung Yun ,  Seung Jun Jeong

发明人： Sang Woo WHANGBO ,  Jinhwan Kim ,  Haeyoung Yun ,  Seung Jun Jeong

IPC分类号： G02B27/22

CPC分类号： G02B27/2214

摘要： A 3D image display apparatus includes a display panel including a plurality of pixels to display an image and a lenticular lens plate disposed in front of the display panel and including a plurality of lenticular lenses. The pixels are arranged to have an arrangement axis inclined with respect to a vertical axis of the display panel, and the lenticular lenses have a lens axis inclined with respect to the vertical axis of the display panel.

摘要翻译： 3D图像显示装置包括：显示面板，包括多个像素以显示图像;以及双凸透镜板，设置在显示面板的前面，并且包括多个双凸透镜。 像素被布置为具有相对于显示面板的垂直轴线倾斜的布置轴，并且双凸透镜具有相对于显示面板的垂直轴线倾斜的透镜轴。

公开(公告)号：US20130107147A1

公开(公告)日：2013-05-02

申请号：US13616390

申请日：2012-09-14

申请人： Sang-Woo WHANGBO ,  Jin-Hwan KIM ,  Seung-Jun JEONG

发明人： Sang-Woo WHANGBO ,  Jin-Hwan KIM ,  Seung-Jun JEONG

IPC分类号： G02F1/29 ,  B05D5/06 ,  G03F7/20 ,  G02B27/22

CPC分类号： G02B27/2214 ,  G02F1/134309 ,  G02F1/1347 ,  G02F2203/28

摘要： A lens substrate includes a base substrate, a first lens electrode and a first signal line. The base substrate includes a lens area and a peripheral area surrounding the lens area. The first signal line in the peripheral area and includes a layered structure in which a first transparent conductive layer and a metal layer directly contact each other. The first lens electrode is in the lens area and includes the first transparent conductive layer excluding the metal layer. The first signal line is in the peripheral area. The first signal line is connected to the first lens electrode and includes a layered structure in which the first transparent conductive layer and the metal layer directly contact each other.

摘要翻译： 透镜基板包括基底基板，第一透镜电极和第一信号线。 基底基板包括透镜区域和围绕透镜区域的周边区域。 周边区域的第一信号线，包括第一透明导电层和金属层直接接触的层叠结构。 第一透镜电极在透镜区域中，并且包括除了金属层之外的第一透明导电层。 第一条信号线在周边区域。 第一信号线连接到第一透镜电极，并且包括其中第一透明导电层和金属层直接接触的层状结构。

公开(公告)号：US08173493B2

公开(公告)日：2012-05-08

申请号：US12765698

申请日：2010-04-22

申请人： Sang-Gab Kim ,  Woo-Geun Lee ,  Shi-Yul Kim ,  Jin-Ho Ju ,  Jang-Soo Kim ,  Sang-Woo Whangbo ,  Min-Seok Oh ,  Hye-Young Ryu ,  Hong-Kee Chin

发明人： Sang-Gab Kim ,  Woo-Geun Lee ,  Shi-Yul Kim ,  Jin-Ho Ju ,  Jang-Soo Kim ,  Sang-Woo Whangbo ,  Min-Seok Oh ,  Hye-Young Ryu ,  Hong-Kee Chin

IPC分类号： H01L21/00 ,  H01L21/84

CPC分类号： H01L27/124 ,  G02F2001/13629 ,  H01L29/458

摘要： The present invention provides a manufacturing method of a thin film transistor array panel, which includes forming a gate line on a substrate; forming a gate insulating layer, a semiconductor layer, and an ohmic contact on the gate line; forming a first conducting film including Mo, a second conducting film including Al, and a third conducting film including Mo on the ohmic contact; forming a first photoresist pattern on the third conducting film; etching the first, second, and third conducting films, the ohmic contact, and the semiconductor layer using the first photoresist pattern as a mask; removing the first photoresist pattern by a predetermined thickness to form a second photoresist pattern; etching the first, second, and third conducting films using the second photoresist pattern as a mask to expose a portion of the ohmic contact; and etching the exposed ohmic contact using a Cl-containing gas and a F-containing gas.

摘要翻译： 本发明提供一种薄膜晶体管阵列面板的制造方法，其包括在基板上形成栅极线; 在栅极线上形成栅极绝缘层，半导体层和欧姆接触; 形成包括Mo的第一导电膜，包括Al的第二导电膜和在欧姆接触上包含Mo的第三导电膜; 在所述第三导电膜上形成第一光致抗蚀剂图案; 使用第一光致抗蚀剂图案作为掩模蚀刻第一，第二和第三导电膜，欧姆接触和半导体层; 将第一光致抗蚀剂图案去除预定厚度以形成第二光致抗蚀剂图案; 使用第二光致抗蚀剂图案作为掩模蚀刻第一，第二和第三导电膜以暴露欧姆接触的一部分; 并使用含Cl气体和含F气体蚀刻暴露的欧姆接触。

公开(公告)号：US20060274236A1

公开(公告)日：2006-12-07

申请号：US11434487

申请日：2006-05-15

申请人： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

发明人： Chong-Chul Chai ,  Shi-Yul Kim ,  Sang-Gab Kim ,  Jun-Hyung Souk ,  Sang-Woo Whangbo ,  Won-Kie Chang ,  Hi-Kuk Lee ,  Soo-Wan Yoon ,  Soo-Jin Kim

IPC分类号： G02F1/1333

CPC分类号： G02F1/136213 ,  G02F1/13458 ,  G02F2001/136236 ,  H01L2924/0002 ,  H01L2924/00

摘要： A mask is provided. The mask includes a mask body, a first exposing part and a second exposing part. The first exposing part is on the mask body. The first exposing part includes a first light transmitting portion and second light transmitting portions. The first light transmitting portion exposes a portion of the photoresist film corresponding to the output terminal to a light of a first light amount. The second light transmitting portions exposes an adjacent portion of the photoresist film adjacent to the output terminal to a light of a second light amount smaller than the first light amount. The second exposing part is on the mask body. The second exposing part includes third light transmitting portions for partially exposing the photoresist film corresponding to the storage electrode to a light of a third light amount that is between the first and second light amounts.

摘要翻译： 提供面罩。 面罩包括面罩主体，第一曝光部和第二曝光部。 第一曝光部分在面罩主体上。 第一曝光部分包括第一透光部分和第二透光部分。 第一光透射部分将与输出端子相对应的光致抗蚀剂膜的一部分暴露于第一光量的光。 第二透光部分将邻近输出端子的光致抗蚀剂膜的相邻部分暴露于小于第一光量的第二光量的光。 第二曝光部位在面罩主体上。 第二曝光部分包括用于将对应于存储电极的光致抗蚀剂膜部分地曝光到处于第一和第二光量之间的第三光量的光的第三透光部分。