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1.发明申请NEGATIVE PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME 有权负极光电组合物及使用其制造阵列基板的方法公开(公告)号：US20090176337A1
公开(公告)日：2009-07-09
申请号：US12345169
申请日：2008-12-29
Applicant: Hoon KANG , Jae-Sung KIM , Yang-Ho JUNG , Hi-Kuk LEE , Yasuhiro KAMEYAMA , Yuuji MIZUHO , Jong-Cheol KIM , Se-Jin CHOI
Inventor： Hoon KANG , Jae-Sung KIM , Yang-Ho JUNG , Hi-Kuk LEE , Yasuhiro KAMEYAMA , Yuuji MIZUHO , Jong-Cheol KIM , Se-Jin CHOI
IPC: H01L21/336 , G03F7/004
CPC classification number: H01L27/1288 , G03F7/0007 , G03F7/027 , G03F7/033 , H01L27/1214 , Y10S430/111
Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
Abstract translation: 负性光致抗蚀剂组合物和阵列基板的制造方法。 负性光致抗蚀剂组合物包括含有乙烯不饱和键的乙烯不饱和化合物和光聚合引发剂的光固化性组合物，包含通过热交联的碱溶性树脂和有机溶剂的热固性组合物。 负性光致抗蚀剂组合物提高了稳定性，光敏性，进行显影操作后的可剥离性，并且降低了残留物以提高有机绝缘层的可靠性。 此外，负性光致抗蚀剂组合物提高了有机绝缘层的透射率，并且减少了颜色坐标的变化，从而提高了显示装置的显示质量。
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2.发明申请COMPOSITION FOR MOLD SHEET AND METHOD FOR PREPARING MOLD SHEET USING SAME 审中-公开用于模具片的组合物和使用其制备模具片的方法公开(公告)号：US20100255268A1
公开(公告)日：2010-10-07
申请号：US12743322
申请日：2008-11-10
Applicant: Se Jin Choi , Tae Wan Kim , Seung Joon Baek
Inventor： Se Jin Choi , Tae Wan Kim , Seung Joon Baek
CPC classification number: G03F7/0757 , G03F7/029 , G03F7/0295 , G03F7/0388 , Y10T428/24802
Abstract: The present invention relates to a mold sheet composition for forming patterns, which comprises (A) an active energy ray-curable compound having one or more unsaturated double bond, and (B) 0.1 to 20 parts by weight of a photo-initiator based on 100 parts by weight of the component (A); and a mold sheet for forming patterns, which comprises the active energy curable compound of the composition, and has an intaglio of the desired pattern thereon.
Abstract translation: 本发明涉及一种用于形成图案的模片组合物，其包含（A）具有一个或多个不饱和双键的活性能量射线固化性化合物，和（B）0.1至20重量份基于 100重量份组分（A）; 以及用于形成图案的模板，其包含所述组合物的活性能量可固化化合物，并且具有其上所需图案的凹版。
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3.发明授权Photoresist monomers, polymers and photoresist compositions for preventing acid diffusion 失效用于防止酸扩散的光致抗蚀剂单体，聚合物和光致抗蚀剂组合物公开(公告)号：US06924078B2
公开(公告)日：2005-08-02
申请号：US10225992
申请日：2002-08-22
Applicant: Geun Su Lee , Jae Chang Jung , Ki Soo Shin , Se Jin Choi , Deog Bae Kim , Jae Hyun Kim
Inventor： Geun Su Lee , Jae Chang Jung , Ki Soo Shin , Se Jin Choi , Deog Bae Kim , Jae Hyun Kim
IPC: G03F7/027 , C07D273/00 , C07D323/00 , C08F226/06 , C08F232/00 , C08F234/02 , G03F7/039 , H01L21/027 , G03F7/40
CPC classification number: C07D273/00 , C07D323/00 , G03F7/0395 , G03F7/0397 , Y10S430/143
Abstract: Photoresist monomers, polymers thereof, photoresist compositions containing the same for preventing acid generated in the exposed area during the course of a photolithography process from being diffused to the unexposed area. The line edge roughness and slope pattern are improved when an ultrafine photoresist pattern is formed using photoresist copolymer having a multi-oxygen-containing compound as a repeating unit such as an ethyleneoxy moiety represented by Formula 1 with at least one polymerizable carbon-carbon double bond. In addition, the shape of pattern is improved by eliminating top loss and the adhesion of pattern to the substrate is improved. wherein n is an integer ranging from 1 to 5.
Abstract translation: 光致抗蚀剂单体，其聚合物，含有其的光致抗蚀剂组合物，用于防止在光刻过程中在曝光区域产生的酸被扩散到未曝光区域。 当使用具有多含氧化合物作为重复单元的光致抗蚀剂共聚物形成超细光致抗蚀剂图案时，线边缘粗糙度和斜率图案得到改善，所述重复单元例如由式1表示的乙氧基部分与至少一个可聚合的碳 - 碳双键 。 此外，通过消除顶部损耗来提高图案的形状，并提高图案对基板的粘附性。 其中n是1至5的整数。
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4.发明授权公开(公告)号：US08092981B2
公开(公告)日：2012-01-10
申请号：US12345169
申请日：2008-12-29
Applicant: Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Hi-Kuk Lee , Yasuhiro Kameyama , Yuuji Mizuho , Jong-Cheol Kim , Se-Jin Choi
Inventor： Hoon Kang , Jae-Sung Kim , Yang-Ho Jung , Hi-Kuk Lee , Yasuhiro Kameyama , Yuuji Mizuho , Jong-Cheol Kim , Se-Jin Choi
CPC classification number: H01L27/1288 , G03F7/0007 , G03F7/027 , G03F7/033 , H01L27/1214 , Y10S430/111
Abstract: A negative photoresist composition and a method of manufacturing an array substrate. The negative photoresist composition includes a photocurable composition including an ethylene unsaturated compound containing an ethylene unsaturated bond and a photopolymerization initiator, a thermosetting composition including an alkali-soluble resin crosslinked by heat and an organic solvent. The negative photoresist composition improves stability, photosensitivity, detachability after performing a developing operation and reduces residue to improve the reliability of an organic insulation layer. Furthermore, the negative photoresist composition improves the transmittance of an organic insulation layer and reduces the variation of color coordinates to improve the display quality of a display apparatus.
Abstract translation: 负性光致抗蚀剂组合物和阵列基板的制造方法。 负性光致抗蚀剂组合物包括含有乙烯不饱和键的乙烯不饱和化合物和光聚合引发剂的光固化性组合物，包含通过热交联的碱溶性树脂和有机溶剂的热固性组合物。 负性光致抗蚀剂组合物提高了稳定性，光敏性，进行显影操作后的可剥离性，并且降低了残留物以提高有机绝缘层的可靠性。 此外，负性光致抗蚀剂组合物提高了有机绝缘层的透射率，并且减少了颜色坐标的变化，从而提高了显示装置的显示质量。
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