公开(公告)号：US20100022099A1

公开(公告)日：2010-01-28

申请号：US12573008

申请日：2009-10-02

申请人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

发明人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

IPC分类号： H01L21/302

CPC分类号： H01J37/32082 ,  C23C16/045 ,  C23C16/403 ,  C23C16/448 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32935 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/3162 ,  H01L29/66181

摘要： In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing. In another aspect, alternately and sequentially contacting a substrate, the substrate including openings, with at least two different reactants, wherein an under-saturated dose of at least one of the reactants has been predetermined and the under-saturated dose is provided uniformly across the substrate surface, deposits a film that less than fully covers surfaces of the openings, leading to depletion effects in less accessible regions on the substrate surface

摘要翻译： 在一个方面，通过等离子体增强原子层沉积的变化形成非共形层，其中脉冲持续时间，分离，RF功率导通时间，反应物浓度，压力和电极间距中的一个或多个从真实的自饱和反应变化 以耗尽效应模式运行。 因此，沉积物靠近基底表面发生，但是在到达开口（例如，深的DRAM沟槽，孔隙等）中的特定距离之后被控制终止。 适用于这种调制的反应器配置包括喷头，原位等离子体反应器，特别是具有可调节的电极间距。 在另一方面，交替地和顺序地接触基底，包括开口的基底与至少两种不同的反应物接触，其中至少一种反应物的饱和剂量已被预先确定，并且不饱和剂量被均匀地提供在 衬底表面沉积小于完全覆盖开口表面的膜，导致在衬底表面上较不易接近的区域中的耗尽效应

公开(公告)号：US08334218B2

公开(公告)日：2012-12-18

申请号：US12573008

申请日：2009-10-02

申请人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

发明人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01J37/32082 ,  C23C16/045 ,  C23C16/403 ,  C23C16/448 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32935 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/3162 ,  H01L29/66181

摘要： In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing. In another aspect, alternately and sequentially contacting a substrate, the substrate including openings, with at least two different reactants, wherein an under-saturated dose of at least one of the reactants has been predetermined and the under-saturated dose is provided uniformly across the substrate surface, deposits a film that less than fully covers surfaces of the openings, leading to depletion effects in less accessible regions on the substrate surface.

摘要翻译： 在一个方面，通过等离子体增强原子层沉积的变化形成非共形层，其中脉冲持续时间，分离，RF功率导通时间，反应物浓度，压力和电极间距中的一个或多个从真实的自饱和反应变化 以耗尽效应模式运行。 因此，沉积物靠近基底表面发生，但是在到达开口（例如，深的DRAM沟槽，孔隙等）中的特定距离之后被控制终止。 适用于这种调制的反应器配置包括喷头，原位等离子体反应器，特别是具有可调节的电极间距。 在另一方面，交替地和顺序地接触基底，包括开口的基底与至少两种不同的反应物接触，其中至少一种反应物的饱和剂量已被预先确定，并且不饱和剂量被均匀地提供在 衬底表面沉积小于完全覆盖开口表面的膜，导致在衬底表面上较不易接近的区域中的耗尽效应。

公开(公告)号：US07608549B2

公开(公告)日：2009-10-27

申请号：US11375588

申请日：2006-03-13

申请人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

发明人： Sebastian E. Van Nooten ,  Jan Willem Maes ,  Steven Marcus ,  Glen Wilk ,  Petri Räisänen ,  Kai-Erik Elers

IPC分类号： H01L21/31 ,  H01L21/469

CPC分类号： H01J37/32082 ,  C23C16/045 ,  C23C16/403 ,  C23C16/448 ,  C23C16/45519 ,  C23C16/45525 ,  C23C16/45542 ,  C23C16/45565 ,  C23C16/50 ,  C23C16/5096 ,  C23C16/52 ,  H01J37/3244 ,  H01J37/32935 ,  H01L21/02178 ,  H01L21/02274 ,  H01L21/0228 ,  H01L21/3141 ,  H01L21/3162 ,  H01L29/66181

摘要： In one aspect, non-conformal layers are formed by variations of plasma enhanced atomic layer deposition, where one or more of pulse duration, separation, RF power on-time, reactant concentration, pressure and electrode spacing are varied from true self-saturating reactions to operate in a depletion-effect mode. Deposition thus takes place close to the substrate surface but is controlled to terminate after reaching a specified distance into openings (e.g., deep DRAM trenches, pores, etc.). Reactor configurations that are suited to such modulation include showerhead, in situ plasma reactors, particularly with adjustable electrode spacing. In another aspect, alternately and sequentially contacting a substrate, the substrate including openings, with at least two different reactants, wherein an under-saturated dose of at least one of the reactants has been predetermined and the under-saturated dose is provided uniformly across the substrate surface, deposits a film that less than fully covers surfaces of the openings, leading to depletion effects in less accessible regions on the substrate surface.

摘要翻译： 在一个方面，通过等离子体增强原子层沉积的变化形成非共形层，其中脉冲持续时间，分离，RF功率导通时间，反应物浓度，压力和电极间距中的一个或多个从真实的自饱和反应变化 以耗尽效应模式运行。 因此，沉积物靠近基底表面发生，但是在到达开口（例如，深的DRAM沟槽，孔隙等）中的特定距离之后被控制终止。 适用于这种调制的反应器配置包括喷头，原位等离子体反应器，特别是具有可调节的电极间距。 在另一方面，交替地和顺序地接触基底，包括开口的基底与至少两种不同的反应物接触，其中至少一种反应物的饱和剂量已被预先确定，并且不饱和剂量被均匀地提供在 衬底表面沉积小于完全覆盖开口表面的膜，导致在衬底表面上较不易接近的区域中的耗尽效应。