公开(公告)号：US20070204958A1

公开(公告)日：2007-09-06

申请号：US11711612

申请日：2007-02-28

申请人： Seoung-Wook Lee ,  Young-Joo Hwang

发明人： Seoung-Wook Lee ,  Young-Joo Hwang

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C16/5096 ,  H01J2237/0206 ,  Y10S156/914 ,  Y10S414/135

摘要： Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transferring a substrate and opening and closing openings of the chambers. Each of the gate valves includes a valve housing provided between the chambers such that the valve housing contacts side surfaces of the chambers by interposing sealing members therebetween, and forming a designated closed space therein; a valve including a sealing plate contacting an inner surface of the valve housing on the side of the processing chamber, and a back plate contacting the inner surface of the valve housing on the side of the transfer chamber; a valve driving unit connected to the valve for moving the valve in the vertical direction; and a ground member formed on the surface of the valve for electrically connecting the valve and the valve housing when the valve contacts the inner surface of the valve housing.

摘要翻译： 公开了一种等离子体处理装置，其中在传送室中不产生寄生等离子体。 等离子体处理装置具有装载锁定室，传送室，处理室和安装在用于传送基板的室之间的闸阀和打开和关闭室的开口的闸阀。 每个闸阀包括设置在室之间的阀壳体，使得阀壳体通过在其间插入密封构件而接触室的侧表面，并在其中形成指定的封闭空间; 阀，其包括与处理室侧面上的阀壳体的内表面接触的密封板和在传送室侧面与阀壳体的内表面接触的后板; 连接到阀的阀驱动单元，用于沿垂直方向移动阀; 以及形成在所述阀的表面上的接地构件，用于当所述阀接触所述阀壳体的内表面时电气连接所述阀和所述阀壳体。

公开(公告)号：US20100116321A1

公开(公告)日：2010-05-13

申请号：US12481906

申请日：2009-06-10

申请人： Young-Suk JOH ,  Seoung-Wook LEE

发明人： Young-Suk JOH ,  Seoung-Wook LEE

IPC分类号： H01L31/058 ,  F24J2/18 ,  F24J2/10 ,  F24J2/38

CPC分类号： F24S23/79 ,  F24S2023/876 ,  Y02E10/40

摘要： An apparatus for collecting sunlight includes a primary focus reflector, a secondary parallelization reflector, and a connection mechanism. The primary focus reflector has an inner rounded surface, an outer plane formed on an edge of the inner rounded surface, and a through-hole formed at a center of the inner rounded surface. The primary focus reflector collects sunlight on a focus in front of the inner rounded surface. The secondary parallelization reflector is disposed near the focus in front of the primary focus reflector and reflects the sunlight, having been reflected by the primary focus reflector towards the through-hole as parallel light. The connection mechanism connects the secondary parallelization reflector to the primary focus reflector to be secured near the focus. The apparatus further includes a power generation module disposed behind the reflectors. The apparatus has improved light collection and power generation efficiency.

摘要翻译： 用于收集太阳光的装置包括主聚焦反射器，二次平行化反射器和连接机构。 主要聚焦反射器具有内部圆形表面，形成在内部圆形表面的边缘上的外部平面以及形成在内部圆形表面的中心处的通孔。 主要聚焦反射器在内部圆形表面前面的焦点上收集阳光。 二次平行化反射器被设置在主聚焦反射器前面的焦点附近，并且将由主聚焦反射器反射的太阳光作为平行光反射到通孔。 连接机构将二次平行化反射器连接到主焦点反射器以固定在焦点附近。 该设备还包括设置在反射器后面的发电模块。 该装置具有改善的光收集和发电效率。

公开(公告)号：US06562679B2

公开(公告)日：2003-05-13

申请号：US09934660

申请日：2001-08-22

申请人： Kee-jeung Lee ,  Seoung-wook Lee ,  Seung-hyuk Lee ,  Chan-bae Kim ,  Wan-gie Lee

发明人： Kee-jeung Lee ,  Seoung-wook Lee ,  Seung-hyuk Lee ,  Chan-bae Kim ,  Wan-gie Lee

IPC分类号： H01L218242

CPC分类号： H01L27/10894 ,  H01L27/10852 ,  H01L28/84 ,  H01L28/91

摘要： A method for forming the storage node of a capacitor which simplifies its process, and improves the electrical characteristics of semiconductor products by forming the storage node of a capacitor with no stepped portion between cell regions and peripheral circuit regions necessary for memory storage of semiconductor products of the next generation to which a fine line width is applied, and, at the same time, forming a guard ring for dividing the cell regions and the peripheral circuit regions.

公开(公告)号：US07699957B2

公开(公告)日：2010-04-20

申请号：US11711612

申请日：2007-02-28

申请人： Seoung-Wook Lee ,  Young-Joo Hwang

发明人： Seoung-Wook Lee ,  Young-Joo Hwang

IPC分类号： C23F1/00 ,  C23C16/00

CPC分类号： C23C16/54 ,  C23C16/5096 ,  H01J2237/0206 ,  Y10S156/914 ,  Y10S414/135

摘要： Disclosed is a plasma processing apparatus, in which parasitic plasma is not generated in a transfer chamber. The plasma processing apparatus has a load lock chamber, a transfer chamber, a processing chamber, and gate valves installed between the chambers for transferring a substrate and opening and closing openings of the chambers. Each of the gate valves includes a valve housing provided between the chambers such that the valve housing contacts side surfaces of the chambers by interposing sealing members therebetween, and forming a designated closed space therein; a valve including a sealing plate contacting an inner surface of the valve housing on the side of the processing chamber, and a back plate contacting the inner surface of the valve housing on the side of the transfer chamber; a valve driving unit connected to the valve for moving the valve in the vertical direction; and a ground member formed on the surface of the valve for electrically connecting the valve and the valve housing when the valve contacts the inner surface of the valve housing.

摘要翻译： 公开了一种等离子体处理装置，其中在传送室中不产生寄生等离子体。 等离子体处理装置具有装载锁定室，传送室，处理室和安装在用于传送基板的室之间的闸阀和打开和关闭室的开口的闸阀。 每个闸阀包括设置在室之间的阀壳体，使得阀壳体通过在其间插入密封构件而接触室的侧表面，并在其中形成指定的封闭空间; 阀，其包括与处理室侧面上的阀壳体的内表面接触的密封板和在传送室侧面与阀壳体的内表面接触的后板; 连接到阀的阀驱动单元，用于沿垂直方向移动阀; 以及形成在所述阀的表面上的接地构件，用于当所述阀接触所述阀壳体的内表面时电气连接所述阀和所述阀壳体。