Method and apparatus for preventing overtunneling in pFET-based nonvolatile memory cells
    2.
    发明授权
    Method and apparatus for preventing overtunneling in pFET-based nonvolatile memory cells 有权
    用于防止基于pFET的非易失性存储单元中的过度隧穿的方法和装置

    公开(公告)号:US06853583B2

    公开(公告)日:2005-02-08

    申请号:US10245183

    申请日:2002-09-16

    CPC classification number: G11C16/3477 G11C16/3404 G11C16/3468 G11C16/3472

    Abstract: Methods and apparatuses prevent overtunneling in pFET-based nonvolatile floating gate memory (NVM) cells. During a tunneling process, in which charge carriers are removed from a floating gate of a pFET-based NVM cell, a channel current of a memory cell transistor is monitored and compared to a predetermined minimum channel current required to maintain a conducting channel in an injection transistor of the memory cell. When the monitored channel current drops below the predetermined minimum channel current, charge carriers are injected onto the floating gate by impact-ionized hot-electron injection (IHEI) so that overtunneling is avoided.

    Abstract translation: 方法和装置可以防止基于pFET的非易失性浮动栅极存储器(NVM)单元中的超导。 在其中从基于pFET的NVM单元的浮置栅极去除电荷载流子的隧穿过程中,监测存储单元晶体管的沟道电流,并将其与在注入中维持导通通道所需的预定最小沟道电流进行比较 晶体管的存储单元。 当监测的通道电流下降到预定的最小通道电流以下时,电荷载流子通过冲击电离热电子注入(IHEI)注入到浮动栅极上,从而避免了超导。

Patent Agency Ranking