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公开(公告)号：US06195213B1
公开(公告)日：2001-02-27
申请号：US09328198
申请日：1999-06-08
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70808 , G03F7/70825 , G03F7/70833
摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.
摘要翻译： 本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。 本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。 投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。 该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。 光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。 第一成像光学系统（A）形成图案化表面的中间图像。 光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。 第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。 第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上 平行于重力方向。
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公开(公告)号：US06639732B2
公开(公告)日：2003-10-28
申请号：US10310780
申请日：2002-12-06
申请人： Yasuhiro Omura , Tetsuo Takahashi , Masatoshi Ikeda , Shiwen Li
发明人： Yasuhiro Omura , Tetsuo Takahashi , Masatoshi Ikeda , Shiwen Li
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70808 , G03F7/70825 , G03F7/70833
摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.
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公开(公告)号：US06417914B1
公开(公告)日：2002-07-09
申请号：US09690728
申请日：2000-10-18
申请人： Shiwen Li
发明人： Shiwen Li
IPC分类号： G03B2758
CPC分类号： G03F7/70766 , G03B27/58 , G03F7/70758 , H02K41/03 , H02K2201/18
摘要： The shift in the center of gravity of a stage device and the reaction force caused when at least one of a first and second stage devices move, are canceled out by moving a moving member. The shift in the center of gravity of a stage device and the reaction force caused when the stage devices move that cannot be canceled out by moving the moving member, are completely canceled out by moving a base. That is, even if at least one of the first and second stages move, the center of gravity of the stage device does not move, and the reaction force are reliably canceled. Accordingly, by concurrently performing exposure on the two substrates mounted on the first and second stages, the exposure throughput can be improved, and an exposure with a high precision can be performed.
摘要翻译： 通过移动移动构件来抵消舞台装置的重心位移和当第一和第二平台装置中的至少一个移动时产生的反作用力。 舞台装置的重心偏移以及舞台装置移动引起的反作用力不能通过移动构件移动而被抵消，通过移动底座而被完全抵消。 也就是说，即使第一和第二阶段中的至少一个移动，舞台装置的重心不移动，并且反作用力被可靠地消除。 因此，通过在安装在第一和第二级上的两个基板上同时进行曝光，可以提高曝光量，并且可以进行高精度的曝光。
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