Method of removing substrate and apparatus for controlling applied
voltage
    1.
    发明授权
    Method of removing substrate and apparatus for controlling applied voltage 失效
    去除基板的方法和用于控制施加电压的装置

    公开(公告)号:US5699223A

    公开(公告)日:1997-12-16

    申请号:US409991

    申请日:1995-03-24

    IPC分类号: H01L21/683 H02N13/00

    摘要: An apparatus for controlling the voltage applied to an electrostatic clamp enables a substrate removing method capable of rapidly, securely and safely removing a substrate regardless of the presence of a dielectric material on the back surface of the substrate to be processed. Before the substrate supported on an electrode by electrostatic clamping is removed, the potential difference between the substrate and the electrode is made zero, and plasma generation is then stopped. The apparatus for controlling the applied voltage has a circuit for detecting the maximum high-frequency voltage (Vpp) for generating a plasma, an operation circuit for computing the self-bias voltage (Vdc) from the maximum high-frequency voltage (Vpp), and an output control circuit for controlling the DC voltage output from a DC power source based on the self-bias voltage (Vdc).

    摘要翻译: 用于控制施加到静电夹具的电压的装置能够实现能够快速,可靠和安全地移除基板的基板去除方法,而不管介质材料在待处理基板的背面是否存在。 在通过静电夹持将基板支撑在电极上之前,将基板和电极之间的电位差设为零,然后停止等离子体产生。 用于控制施加电压的装置具有用于检测用于产生等离子体的最大高频电压(Vpp)的电路,用于从最大高频电压(Vpp)计算自偏压(Vdc)的运算电路, 以及输出控制电路,用于基于自偏压(Vdc)控制从直流电源输出的直流电压。

    Substrate removal method and mechanism for effecting the method
    2.
    发明授权
    Substrate removal method and mechanism for effecting the method 失效
    底物去除方法及其作用机理

    公开(公告)号:US5552955A

    公开(公告)日:1996-09-03

    申请号:US364314

    申请日:1994-12-27

    IPC分类号: H01L21/683 H02N13/00

    CPC分类号: H01L21/6831 H02N13/00

    摘要: A method for rapidly, reliably, and safely removing a substrate from an electrostatic clamping electrode and a mechanism for effecting the method. The method comprises forming a gap between an electrode and a substrate which had been made to hold onto the electrode by electrostatic clamping to increase the electrostatic potential between the substrate and the electrode, generating a DC-glow-discharge in the vicinity of the substrate according to Paschen's law, and removing the substrate from the electrode after eliminating the static charge from the substrate using gas molecules charged by the DC-glow-discharge. A mechanism for effecting the method comprises a means for introducing a gas, a protruding means, a means for controlling the pressure, a sequencer for sequentially activating them, and a lifting mechanism for adjusting the height of the protruding means to the gap distance necessary for generating a DC-glow-discharge between the substrate and the electrode.

    摘要翻译: 一种用于快速,可靠和安全地从静电夹持电极移除基板的方法和用于实现该方法的机构。 该方法包括通过静电夹持在电极和衬底之间形成间隔,以使其保持在电极上,从而增加衬底与电极之间的静电电位,从而在衬底附近产生直流辉光放电 达帕定律,并且使用通过直流辉光放电充电的气体分子从基板中消除静电荷后,从电极中除去基板。 用于实现该方法的机构包括用于引入气体的装置,突出装置,用于控制压力的装置,用于顺序地启动它们的定序器,以及用于将突出装置的高度调整到所需的间隙距离的提升机构 在基板和电极之间产生直流辉光放电。

    PROCESSING INSTRUCTING DEVICE, PROCESSING INSTRUCTING METHOD, COMPUTER PROGRAM AND PROCESSING DEVICE
    4.
    发明申请
    PROCESSING INSTRUCTING DEVICE, PROCESSING INSTRUCTING METHOD, COMPUTER PROGRAM AND PROCESSING DEVICE 有权
    处理指令装置,处理指令方法,计算机程序和处理装置

    公开(公告)号:US20140358271A1

    公开(公告)日:2014-12-04

    申请号:US14232980

    申请日:2012-07-12

    IPC分类号: G05B19/402

    摘要: A processing indicating device to improve the efficiency of processing on an object. The device includes a first communication unit which communicates information with a plurality of processing devices for processing the object and a second communication unit which communicates information with a conveyance controlling device controlling conveying of the object to the plurality of processing devices. An arrival time predicting unit predicts on the basis of information received by the second communication unit, the time when the conveying device arrives at one of the processing devices. In addition, a finish time predicting unit receives information and predicts the time when the processing on the object in the one processing device finishes. A processing indicating unit causes processing control information that orders the execution of device state improvement treatment to be transmitted to the one processing device on the basis of the predicted respective times.

    摘要翻译: 一种处理指示装置,用于提高对物体的处理效率。 该装置包括:第一通信单元,其与多个用于处理该对象的处理装置进行通信;第二通信单元,其与传送控制装置通信信息,该输送控制装置控制对该多个处理装置的传送。 到达时间预测单元基于由第二通信单元接收的信息,传送设备到达处理设备之一的时间来预测。 此外,完成时间预测单元接收信息并预测在一个处理设备中的对象的处理完成的时间。 处理指示单元基于预测的各个时间,使得命令执行设备状态改善处理的处理控制信息被发送到一个处理设备。