公开(公告)号：US20130171757A1

公开(公告)日：2013-07-04

申请号：US13732662

申请日：2013-01-02

申请人： HARI K. PONNEKANTI ,  Alexander S. Polyak ,  James L'Heureux ,  Michael S. Cox ,  Christopher T. Lane ,  Edward P. Hammond, IV ,  Hemant P. Mungekar ,  Susanne Schlaefer ,  Wolfgang Buschbeck ,  Juergen Henrich ,  Andreas Lopp

发明人： HARI K. PONNEKANTI ,  Alexander S. Polyak ,  James L'Heureux ,  Michael S. Cox ,  Christopher T. Lane ,  Edward P. Hammond, IV ,  Hemant P. Mungekar ,  Susanne Schlaefer ,  Wolfgang Buschbeck ,  Juergen Henrich ,  Andreas Lopp

IPC分类号： H01L31/18

CPC分类号： H01L31/18 ,  C23C14/568 ,  C23C16/54 ,  H01L21/67115 ,  H01L21/67173 ,  H01L21/6776

摘要： The present invention generally provides a high throughput substrate processing system that is used to form one or more regions of a solar cell device. In one configuration of a processing system, one or more solar cell passivating or dielectric layers are deposited and further processed within one or more processing chambers contained within the high throughput substrate processing system. The processing chambers may be, for example, plasma enhanced chemical vapor deposition (PECVD) chambers, low pressure chemical vapor deposition (LPCVD) chambers, atomic layer deposition (ALD) chambers, physical vapor deposition (PVD) or sputtering chambers, thermal processing chambers (e.g., RTA or RTO chambers), substrate reorientation chambers (e.g., flipping chambers) and/or other similar processing chambers.

摘要翻译： 本发明通常提供用于形成太阳能电池器件的一个或多个区域的高通量衬底处理系统。 在处理系统的一种配置中，一个或多个太阳能电池钝化或电介质层被沉积并在包含在高通量衬底处理系统内的一个或多个处理室内进一步处理。 处理室可以是例如等离子体增强化学气相沉积（PECVD）室，低压化学气相沉积（LPCVD）室，原子层沉积（ALD）室，物理气相沉积（PVD）或溅射室，热处理室 （例如，RTA或RTO室），基板重新定向室（例如，翻转室）和/或其它类似的处理室。

公开(公告)号：US20130199891A1

公开(公告)日：2013-08-08

申请号：US13748271

申请日：2013-01-23

申请人： Wolfgang BUSCHBECK ,  Juergen HENRICH ,  Andreas LOPP ,  Susanne SCHLAEFER

发明人： Wolfgang BUSCHBECK ,  Juergen HENRICH ,  Andreas LOPP ,  Susanne SCHLAEFER

IPC分类号： H01L21/677

CPC分类号： H01L21/67739 ,  H01L21/67201

摘要： A dynamic load lock chamber that includes a plurality of actuators positioned along its length to achieve a desired pressure gradient from an atmospheric pressure side to a processing pressure side of the chamber is provided. The chamber includes a transport belt continuously running through the chamber to transport substrates from the atmospheric pressure side to the processing pressure side of the chamber, if situated on an inlet side of a production line, and from the processing pressure side to the atmospheric pressure side of the chamber, if positioned on an outlet side of the production line. Separation mechanisms may be attached to the belt to separate discrete regions within the chamber into a plurality of discrete volumes. Substrates may be disposed between the separation mechanisms, such that separation between adjacent pressure regions within the chamber is maintained as the substrates are transported through the chamber.

摘要翻译： 提供一种动态负载锁定室，其包括沿其长度定位的多个致动器，以实现从室的大气压侧到处理压力侧的期望的压力梯度。 所述腔室包括连续运行通过所述腔室的输送带，以将衬底从所述大气压侧输送到所述腔室的处理压力侧，如果位于生产线的入口侧，以及从处理压力侧到大气压侧 如果位于生产线的出口侧。 分离机构可以附接到带上以将腔室内的离散区域分离成多个离散体积。 衬底可以设置在分离机构之间，使得当衬底被输送通过腔室时，保持室内的相邻压力区域之间的间隔。

公开(公告)号：US20080223693A1

公开(公告)日：2008-09-18

申请号：US12039606

申请日：2008-02-28

申请人： Edgar Haberkorn ,  Susanne Schlaefer

发明人： Edgar Haberkorn ,  Susanne Schlaefer

IPC分类号： B65G35/00 ,  B65G13/02

CPC分类号： H01L21/68785 ,  C23C14/56 ,  C23C16/54

摘要： An arrangement for moving a carrier within a vacuum chamber is described. This carrier is formed in the shape of a plate and is supported with its narrow-side lower edge on rollers driven by a drive system. As a drive system uses a magnetic coupling which is disposed partially within the vacuum chamber and partially outside of the vacuum chamber. With the aid of a force acting in the vertical direction the two components of the magnetic coupling can be displaced relative to one another. In addition, horizontal displacement of the carrier is also possible.

摘要翻译： 描述了用于在真空室内移动载体的装置。 该载体形成为板状，并且由驱动系统驱动的辊的窄侧下缘支撑。 当驱动系统使用部分设置在真空室内并且部分位于真空室外部的磁耦合时。 借助于在垂直方向上作用的力，磁耦合的两个部件可相对于彼此移位。 此外，载体的水平位移也是可能的。