公开(公告)号：US20100330809A1

公开(公告)日：2010-12-30

申请号：US12877010

申请日：2010-09-07

申请人： Tadashi INABA ,  Takahiro MATSUNO ,  Makoto KIKUCHI

发明人： Tadashi INABA ,  Takahiro MATSUNO ,  Makoto KIKUCHI

IPC分类号： H01L21/306

CPC分类号： C23F3/06 ,  C09G1/02 ,  C09K3/1472 ,  C23F3/04 ,  H01L21/3212

摘要： A liquid for polishing metals, which is used in the chemical and/or mechanical flattening of a semiconductor device, the polishing liquid being characterized in that it comprises at least one member selected from the group consisting of tetrazoles or triazoles represented by any one of the following general formulas (I) to (III): wherein, Ra represents at least one substituent selected from the group consisting of a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; Rb represents at least one substituent selected from the group consisting of a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; and Lb represents a divalent connecting group; and Rc and Rd each independently represent a hydrogen atom or a substituent, and at least one of Rc and Rd represent a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group or a group: -La-Re; wherein La represents a divalent connecting group; Re represents a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl or a sulfonamide group; R and R′ each independently represent a group selected from the group consisting of a hydrogen atom, alkyl groups and aryl groups; and R″ independently represents a group selected from the group consisting of alkyl groups and aryl groups.

摘要翻译： 一种用于抛光金属的液体，其用于半导体器件的化学和/或机械平整化，抛光液的特征在于，其包含至少一种选自由以下任何一种表示的四唑或三唑的成员： 通式（I）〜（III）表示：其中，Ra表示选自磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基和磺酰胺基中的至少一种取代基。 Rb表示选自羟基，羧基，磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基和磺酰胺基中的至少一个取代基。 Lb表示二价连接基团; Rc和R d各自独立地表示氢原子或取代基，Rc和Rd中的至少一个表示羟基，羧基，磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基和磺酰胺 组或组：-La-Re; 其中La表示二价连接基团; Re表示羟基，羧基，磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基或氨磺酰基; R和R'各自独立地表示选自氢原子，烷基和芳基的基团; 和R“独立地表示选自烷基和芳基的基团。

公开(公告)号：US20070200089A1

公开(公告)日：2007-08-30

申请号：US11648618

申请日：2007-01-03

申请人： Tadashi Inaba ,  Takahiro Matsuno ,  Makoto Kikuchi

发明人： Tadashi Inaba ,  Takahiro Matsuno ,  Makoto Kikuchi

IPC分类号： C09K13/00 ,  C09K13/06

CPC分类号： C23F3/06 ,  C09G1/02 ,  C09K3/1472 ,  C23F3/04 ,  H01L21/3212

摘要： A liquid for polishing metals, which is used in the chemical and/or mechanical flattening of a semiconductor device, the polishing liquid being characterized in that it comprises at least one member selected from the group consisting of tetrazoles or triazoles represented by any one of the following general formulas (I) to (III): wherein, Ra represents at least one substituent selected from the group consisting of a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; Rb represents at least one substituent selected from the group consisting of a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group; and Lb represents a divalent connecting group; and Rc and Rd each independently represent a hydrogen atom or a substituent, and at least one of Rc and Rd represent a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl, and a sulfonamide group or a group: -La-Re; wherein La represents a divalent connecting group; Re represents a hydroxyl, a carboxyl, a sulfo, an amino, a phosphono, a carbamoyl, a carbamide, a sulfamoyl or a sulfonamide group; R and R′ each independently represent a group selected from the group consisting of a hydrogen atom, alkyl groups and aryl groups; and R″ independently represents a group selected from the group consisting of alkyl groups and aryl groups.

摘要翻译： 一种用于抛光金属的液体，其用于半导体器件的化学和/或机械平整化，抛光液的特征在于，其包含至少一种选自由以下任何一种表示的四唑或三唑的成员： 按照通式（I）至（III）：其中R a表示至少一个选自磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基 ，和磺酰胺基; R b表示至少一个选自羟基，羧基，磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基和磺酰胺基的取代基。 且L b表示二价连接基团; 和R d和R d各自独立地表示氢原子或取代基，R 1d和R dd中的至少一个 代表羟基，羧基，磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基和磺酰胺基或基团：-L < SUP> e ; 其中L a a表示二价连接基团; R e表示羟基，羧基，磺基，氨基，膦酰基，氨基甲酰基，氨基甲酰基，氨磺酰基或磺酰胺基; R和R'各自独立地表示选自氢原子，烷基和芳基的基团; 和R“独立地表示选自烷基和芳基的基团。

公开(公告)号：US06638702B2

公开(公告)日：2003-10-28

申请号：US09987399

申请日：2001-11-14

申请人： Tadanobu Sato ,  Tomonori Owaki ,  Takahiro Matsuno ,  Tadashi Inaba

发明人： Tadanobu Sato ,  Tomonori Owaki ,  Takahiro Matsuno ,  Tadashi Inaba

IPC分类号： G03C1005

CPC分类号： G03C1/08

摘要： The Silver halide grains in the silver halide emulsion is disclosed, comprising silver halide grains containing three or more kinds of transition metal complexes each having a different electron-releasing time respectively classified into any of Class A (100 seconds or more), Class B (more than 1/10 seconds and less than 100 seconds), Class C (more than 1/1000 seconds and 1/10 seconds or less) and Class D (1/1000 seconds or less).

摘要翻译： 公开了卤化银乳剂中的卤化银颗粒，其包含含有三种或更多种各自具有不同电子释放时间的过渡金属配合物的卤化银颗粒，分别分类为A类（100秒以上），B类（ 超过1/10秒，小于100秒），C级（1/1000秒，1/10秒以下）和D级（1/1000秒以下）。

公开(公告)号：US06579670B2

公开(公告)日：2003-06-17

申请号：US09879147

申请日：2001-06-13

申请人： Tomonori Owaki ,  Tadanobu Sato ,  Takahiro Matsuno

发明人： Tomonori Owaki ,  Tadanobu Sato ,  Takahiro Matsuno

IPC分类号： G03C106

CPC分类号： G03C1/08 ,  G03C1/035 ,  G03C1/09 ,  G03C2001/03517 ,  G03C2001/093

摘要： The present invention provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer comprises silver halide grains having a silver chloride content of 90 mol % or more, and the silver halide emulsion further contains a metal complex having H2O as a ligand. It also provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer contains a metal complex having O2− as a ligand.

公开(公告)号：US08083964B2

公开(公告)日：2011-12-27

申请号：US12055930

申请日：2008-03-26

申请人： Toru Yamada ,  Makoto Kikuchi ,  Tadashi Inaba ,  Takahiro Matsuno ,  Takamitsu Tomiga ,  Kazutaka Takahashi

发明人： Toru Yamada ,  Makoto Kikuchi ,  Tadashi Inaba ,  Takahiro Matsuno ,  Takamitsu Tomiga ,  Kazutaka Takahashi

IPC分类号： C03C15/00

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463

摘要： A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), R1 represents an alkyl group having 1 to 4 carbon atoms and R2 represents an alkylene group having 1 to 4 carbon atoms.

摘要翻译： 1.一种金属抛光液，其特征在于，在所述半导体装置的制造方法中，对铜或铜合金的导体膜进行化学机械研磨的金属研磨液，所述金属抛光液含有：（1）式 ）; 和（2）表面活性剂，其中，在式（I）中，R 1表示碳原子数1〜4的烷基，R 2表示碳原子数1〜4的亚烷基。

公开(公告)号：US06808870B2

公开(公告)日：2004-10-26

申请号：US10251775

申请日：2002-09-23

申请人： Tadanobu Sato ,  Takahiro Matsuno ,  Masaru Takasaki ,  Tadashi Inaba

发明人： Tadanobu Sato ,  Takahiro Matsuno ,  Masaru Takasaki ,  Tadashi Inaba

IPC分类号： G03C1005

CPC分类号： G03C1/08 ,  G03C1/035 ,  G03C2001/03517 ,  G03C2001/03535

摘要： A light-sensitive silver halide grain containing at least one metal complex, wherein when an a-axis, a b-axis and a c-axis of a silver halide crystal lattice are each established taking as an origin a central metal of the metal complex incorporated into the silver halide grain, the metal complex has in a ligand thereof a site which can form any bond of a covalent bond, a dative bond and an ionic bond, or a bond in a mixed form of these bonds with a silver ion on a lattice point which does not exist on any of the a-axis, the b-axis and the c-axis. The silver halide photographic material has no reciprocity failure over a wide range of exposure illuminations without desensitization and decrease of contrast on the low intensity side.

摘要翻译： 含有至少一种金属络合物的感光卤化银颗粒，其中当卤化银晶格的a轴，b轴和c轴各自被确定为金属络合物的中心金属时 掺入卤化银颗粒中，金属络合物在其配体中具有可以形成共价键，定位键和离子键的任何键的位点，或这些键与银离子的混合形式的键 在a轴，b轴和c轴上不存在的格点。 卤化银照相材料在宽范围的曝光照明下没有互易失效，而在低强度侧没有脱敏和降低对比度。

公开(公告)号：US06723496B2

公开(公告)日：2004-04-20

申请号：US09789802

申请日：2001-02-22

申请人： Tadanobu Sato ,  Takahiro Matsuno ,  Tadashi Inaba

发明人： Tadanobu Sato ,  Takahiro Matsuno ,  Tadashi Inaba

IPC分类号： G03C109

CPC分类号： G03C1/08 ,  G03C1/09

摘要： A silver halide photographic material comprising a support having thereon at least one silver halide emulsion layer, wherein the material is contained at least one complex selected from complexes having a compound represented by the following formula (I) as at least one of their respective ligands or complexes having a diketone compound as at least one of their respective ligands: wherein X represents an atom or atomic group bridging two pyridine rings, each of R1 to R4 represents a hydrogen atom or a substituent group, and each of R1′ to R2′ represents a hydrogen atom or a substituent group.

摘要翻译： 一种卤化银照相材料，其包含其上具有至少一个卤化银乳剂层的载体，其中所述材料含有至少一种选自具有下式（I）表示的化合物的络合物的络合物作为其各自配位体中的至少一种或 具有二酮化合物作为其各自配体中的至少一种的络合物：其中X表示桥接两个吡啶环的原子或原子团，R 1至R 4各自表示氢原子或取代基，并且R 1'至R 2'各自表示 氢原子或取代基。

公开(公告)号：USRE40603E1

公开(公告)日：2008-12-09

申请号：US10959946

申请日：2004-10-07

申请人： Tomonori Owaki ,  Tadanobu Sato ,  Takahiro Matsuno

发明人： Tomonori Owaki ,  Tadanobu Sato ,  Takahiro Matsuno

IPC分类号： G03C1/06 ,  G03C1/005 ,  G03C1/494

CPC分类号： G03C1/08 ,  G03C1/035 ,  G03C1/09 ,  G03C2001/03517 ,  G03C2001/093

摘要： The present invention provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer comprises silver halide grains having a silver chloride content of 90 mol % or more, and the silver halide emulsion further contains a metal complex having H2O as a ligand. It also provides a silver halide photographic light-sensitive material comprising a support having thereon at least one silver halide emulsion layer, wherein the silver halide emulsion contained in the silver halide emulsion layer contains a metal complex having O2− as a ligand.

摘要翻译： 本发明提供了一种卤化银照相感光材料，其包括其上具有至少一个卤化银乳剂层的载体，其中卤化银乳剂层中所含的卤化银乳剂包含卤化银颗粒，其卤化银颗粒的氯化银含量为90mol％ 以上，并且卤化银乳剂还含有具有H 2 O作为配体的金属络合物。 它还提供一种卤化银照相感光材料，其包括其上具有至少一个卤化银乳剂层的载体，其中卤化银乳剂层中所含的卤化银乳剂含有具有O 2 - 作为配体的金属络合物。

公开(公告)号：US20080242090A1

公开(公告)日：2008-10-02

申请号：US12055930

申请日：2008-03-26

申请人： Toru YAMADA ,  Makoto KIKUCHI ,  Tadashi INABA ,  Takahiro MATSUNO ,  Takamitsu TOMIGA ,  Kazutaka TAKAHASHI

发明人： Toru YAMADA ,  Makoto KIKUCHI ,  Tadashi INABA ,  Takahiro MATSUNO ,  Takamitsu TOMIGA ,  Kazutaka TAKAHASHI

IPC分类号： H01L21/302 ,  C09K13/00

CPC分类号： H01L21/3212 ,  C09G1/02 ,  C09K3/1436 ,  C09K3/1463

摘要： A metal-polishing liquid used for chemical-mechanical polishing of a conductor film of copper or a copper alloy in a process for manufacturing a semiconductor device, the metal-polishing liquid comprising: (1) an amino acid derivative represented by the formula (I); and (2) a surfactant, wherein, in the formula (I), R1 represents an alkyl group having 1 to 4 carbon atoms and R2 represents an alkylene group having 1 to 4 carbon atoms.

摘要翻译： 1.一种金属抛光液，其特征在于，在所述半导体装置的制造方法中，对铜或铜合金的导体膜进行化学机械研磨的金属研磨液，所述金属抛光液含有：（1）式 ）; 和（2）表面活性剂，其中在式（I）中，R 1表示具有1至4个碳原子的烷基，R 2表示具有 1至4个碳原子。

公开(公告)号：US06372419B1

公开(公告)日：2002-04-16

申请号：US09614454

申请日：2000-07-12

申请人： Tadashi Inaba ,  Tadanobu Sato ,  Kohzaburoh Yamada ,  Takahiro Matsuno

发明人： Tadashi Inaba ,  Tadanobu Sato ,  Kohzaburoh Yamada ,  Takahiro Matsuno

IPC分类号： G03C1035

CPC分类号： G03C1/08 ,  G03C1/0051 ,  G03C7/30 ,  G03C2001/0055 ,  G03C2001/0056 ,  Y10S430/137

摘要： A silver halide photographic material comprising a support having provided thereon at least a silver halide emulsion layer, wherein the material contains at least one metal complex contained in any of groups A, B and C: group A: an optically active metal complex; group B: a metal complex comprising a metal ion selected from the group consisting of transition metallic elements belonging to period 4 to 6 and group III to XI of the Periodic Table, and typical metallic elements belonging to period 4 to 6 and group XII to XIV of the Periodic Table, and at least one ligand represented by the following formula (I): wherein Z represents an atomic group to form a 5- or 6-membered ring; A represents a carbon atom or a nitrogen atom; X represents O31, S31 , NR1R2 or COO−; R1 and R2 each represents a hydrogen atom or an alkyl group; R represents a substituent; and n represents 0 or an integer of from 1 to 6; group C: a metal complex selected from a porphyrin complex, a porphycene complex, a phthalocyanine complex, a chlorin complex, and a bacteriochlorin complex.

摘要翻译： 一种卤化银照相材料，其包含至少提供有卤化银乳剂层的载体，其中所述材料包含至少一种包含在A，B和C组中的任何一种金属络合物：A组：光学活性金属络合物; B族 ：金属络合物，其包含选自属于周期表4至6和第III至XI族的过渡金属元素的金属离子，以及属于第4至6周期的典型金属元素和第Ⅳ〜ⅩⅣ族的金属元素 周期表和由下式（I）表示的至少一种配体：其中Z表示形成5-或6-元环的原子团; A表示碳原子或氮原子; X表示O31，S31，NR1R2或COO-; R1和R2各自表示氢原子或烷基; R表示取代基; n表示0或1〜6的整数; C组：选自卟啉络合物，卟吩络合物，酞菁络合物，二氢卟酚络合物和细菌菌素复合物的金属络合物。