Multi-face forming mask device for vacuum deposition
    2.
    发明授权
    Multi-face forming mask device for vacuum deposition 有权
    用于真空沉积的多面成型掩模装置

    公开(公告)号:US06890385B2

    公开(公告)日:2005-05-10

    申请号:US10399943

    申请日:2002-08-23

    IPC分类号: C23C14/04 C23C16/00 C23C16/04

    CPC分类号: C23C14/042

    摘要: A second metal mask (13) having a screen part (13A) provided with a plurality of parallel, fine slits (13a) arranged at very small intervals is placed on a base plate (12) serving also as a first metal mask and provided with a plurality of windows (18) defining regions in which a material is to be deposited. One end of the second metal mask (13) is fastened to the base plate (12) by a mask clamp (20) and the other end of the same is fastened to a slider (23). Resilient force is applied to the slider (23) by compression coil springs (30). Thus, the screen part (13A) of the second metal mask (13) is tensioned and thereby the slits (13a) are stretched straight and are extended at predetermined pitches. A substrate (17) placed on the second mask (13) is subjected to a vacuum evaporation process to form fine patterns on the substrate (17) in a gang-patterning mode.

    摘要翻译: 具有设置有以非常小的间隔排列的多个平行的细小狭缝(13a)的屏幕部分(13A)的第二金属掩模(13)被放置在也用作第一金属掩模的基板(12)上,并且 设置有限定要在其中沉积材料的区域的多个窗口(18)。 第二金属掩模(13)的一端通过掩模夹(20)固定在基板(12)上,并且另一端固定在滑块(23)上。 弹性力通过压缩螺旋弹簧(30)施加到滑块(23)。 因此,第二金属掩模(13)的屏幕部分(13A)被张紧,从而狭缝(13a)被拉直并且以预定间距延伸。 放置在第二掩模(13)上的衬底(17)进行真空蒸发处理,以在组合图形模式下在衬底(17)上形成精细图案。