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    Article having photocatalytic activity
    2.
    发明授权
    Article having photocatalytic activity 失效
    文章具有光催化活性

    公开(公告)号：US06833089B1

    公开(公告)日：2004-12-21

    申请号：US09630777

    申请日：2000-08-02

    申请人： Tetsuro Kawahara ,  Kazuhiro Doushita ,  Hiroyuki Inomata ,  Etsuo Ogino ,  Kenji Mori ,  Yoshifumi Kijima ,  Hiroaki Tada

    发明人： Tetsuro Kawahara ,  Kazuhiro Doushita ,  Hiroyuki Inomata ,  Etsuo Ogino ,  Kenji Mori ,  Yoshifumi Kijima ,  Hiroaki Tada

    IPC分类号： B32B702

    CPC分类号： C03C17/3417 ,  C03C2217/71 ,  Y10T428/24942 ,  Y10T428/2495

    摘要： A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.

    摘要翻译： 玻璃板的表面涂覆有作为底漆层的50nm厚的氧化铌膜的第一n型半导体膜。 底漆层涂覆有包含氧化钛的250nm厚的光催化剂膜。 因此，获得具有光催化活性表面的物品。 可以通过溅射形成两个涂膜。 选择作为底漆层的第一n型半导体膜具有比氧化钛更大的能带隙。 由于这种结构，在膜表面附近产生更多的孔。 本发明不含常规的具有光催化活性的氧化钛薄膜的问题，难以产生许多有助于光催化活性的表面空穴，因为电荷分离产生的电子和空穴在膜内复合，使得不可能有效地提高催化活性 活动。

    Low-reflection glass article and method for manufacturing
    3.
    发明申请
    Low-reflection glass article and method for manufacturing 审中-公开
    低反射玻璃制品及其制造方法

    公开(公告)号：US20060121190A1

    公开(公告)日：2006-06-08

    申请号：US11143141

    申请日：2005-06-01

    申请人： Toshifumi Tsujino ,  Hideki Okamoto ,  Tetsuro Kawahara

    发明人： Toshifumi Tsujino ,  Hideki Okamoto ,  Tetsuro Kawahara

    IPC分类号： B05D3/02

    CPC分类号： H01L31/02168 ,  C03C1/008 ,  C03C17/007 ,  C03C17/42 ,  C03C19/00 ,  C03C2217/213 ,  C03C2217/42 ,  C03C2217/478 ,  C03C2218/113 ,  C03C2218/116 ,  F24S80/52 ,  G02B1/11 ,  G02B1/12 ,  Y02E10/40 ,  Y02E10/50 ,  Y10T428/25 ,  Y10T428/26 ,  Y10T428/2993

    摘要： A low reflection film comprising silica fine particles and a binder in a weight ratio proportion of 60:40 to 95:5 is obtained by mixing starting fine particles comprising at least non-aggregated silica fine particles with a mean particle size of 40-1000 nm and/or linear (chain-like) aggregated silica fine particles with a mean primary particle size of 10-100 nm, a hydrolyzable metal compound, water, and a solvent, hydrolyzing the hydrolyzable metal compound in the presence of the starting fine particles, and then coating the prepared coating solution onto a glass base substrate and subjecting it to heat treatment. The obtained low reflection film is a single-layer low reflection film with low reflectivity, excellent abrasion resistance, high film strength and excellent contamination removal property, and coating of the low reflection film onto glass base substrates can give low reflection glass articles.

    摘要翻译： 通过混合至少包含平均粒度为40-1000nm的非聚集的二氧化硅细颗粒的起始细颗粒，得到重量比为60:40至95:5的二氧化硅微粒和粘合剂的低反射膜 和/或平均一次粒径为10-100nm的线性（链状）聚集的二氧化硅细颗粒，水解性金属化合物，水和溶剂，在起始微粒存在下水解可水解的金属化合物， 然后将制备的涂布溶液涂布在玻璃基材上并对其进行热处理。 获得的低反射膜是具有低反射率，优异的耐磨性，高膜强度和优异的污染除去性能的单层低反射膜，并且低反射膜在玻璃基底上的涂布可以产生低反射玻璃制品。

    Multilayer structure and process for producing the same
    4.
    发明授权
    Multilayer structure and process for producing the same 失效
    多层结构及其制造方法

    公开(公告)号：US06436542B1

    公开(公告)日：2002-08-20

    申请号：US09613726

    申请日：2000-07-11

    申请人： Etsuo Ogino ,  Kenji Mori ,  Yoshifumi Kijima ,  Tetsuro Kawahara ,  Kazuhiro Doushita ,  Hiroyuki Inomata

    发明人： Etsuo Ogino ,  Kenji Mori ,  Yoshifumi Kijima ,  Tetsuro Kawahara ,  Kazuhiro Doushita ,  Hiroyuki Inomata

    IPC分类号： B32B1706

    CPC分类号： B01J37/347 ,  B01J35/002 ,  B01J35/004 ,  C03C17/3417 ,  C03C2217/71 ,  C23C14/3414

    摘要： A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 &OHgr;/□ or lower and the sputtering is conducted while heating the substrate at 230° C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350° C. or higher and that the deposited film does not have high photocatalytic activity.

    摘要翻译： 在直流溅射中使用由氧化钛颗粒和2.5重量％氧化铌颗粒的混合物获得的导电烧结物作为靶，以在玻璃基板上形成主要包含氧化钛的光催化活性膜。 目标的表面电阻为500欧姆/平方或以下，并且在230℃下加热基板时进行溅射。光催化活性膜基于无定形基质。 该方法没有常规方法的问题，其中通过使用钛金属作为靶的反应溅射沉积光催化活性的氧化钛膜。 问题是需要将基板加热到350℃以上，并且沉积膜不具有高的光催化活性。