Semiconductor device and method of making thereof
    3.
    发明授权
    Semiconductor device and method of making thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US08399286B2

    公开(公告)日:2013-03-19

    申请号:US12654185

    申请日:2009-12-14

    申请人: Timothy Kueper

    发明人: Timothy Kueper

    IPC分类号: H01L21/00

    摘要: A method of making a semiconductor device includes providing a web substrate, forming a first semiconductor layer of a first conductivity type over the web substrate, forming a second semiconductor layer of a second conductivity type over a first side of the first semiconductor layer, forming a first electrode layer over the second semiconductor layer, forming a handle web substrate over the first electrode layer, delaminating the web substrate from the first semiconductor layer after the step of forming the handle web substrate, where at least one opening extends through the first and the second semiconductor layers, and forming a second electrode layer over a second side of the first semiconductor layer such that the first and second electrode layers are in electrical contact with each other.

    摘要翻译: 一种制造半导体器件的方法包括提供网状基板,在幅材基板上形成第一导电类型的第一半导体层,在第一半导体层的第一侧上形成第二导电类型的第二半导体层,形成第 在所述第二半导体层上方的第一电极层,在所述第一电极层上形成手柄网状基材,在形成所述手柄网状基材的步骤之后,将所述网状物基材从所述第一半导体层剥离,其中至少一个开口延伸穿过所述第一和第 第二半导体层,并且在第一半导体层的第二侧上形成第二电极层,使得第一和第二电极层彼此电接触。

    Semiconductor device and method of making thereof
    4.
    发明申请
    Semiconductor device and method of making thereof 有权
    半导体装置及其制造方法

    公开(公告)号:US20110139222A1

    公开(公告)日:2011-06-16

    申请号:US12654185

    申请日:2009-12-14

    申请人: Timothy Kueper

    发明人: Timothy Kueper

    IPC分类号: H01L27/142 H01L31/18

    摘要: A method of making a semiconductor device includes providing a web substrate, forming a first semiconductor layer of a first conductivity type over the web substrate, forming a second semiconductor layer of a second conductivity type over a first side of the first semiconductor layer, forming a first electrode layer over the second semiconductor layer, forming a handle web substrate over the first electrode layer, delaminating the web substrate from the first semiconductor layer after the step of forming the handle web substrate, where at least one opening extends through the first and the second semiconductor layers, and forming a second electrode layer over a second side of the first semiconductor layer such that the first and second electrode layers are in electrical contact with each other.

    摘要翻译: 一种制造半导体器件的方法包括提供网状基板,在幅材基板上形成第一导电类型的第一半导体层,在第一半导体层的第一侧上形成第二导电类型的第二半导体层,形成第 在所述第二半导体层上方的第一电极层,在所述第一电极层上形成手柄网状基材,在形成所述手柄网状基材的步骤之后,将所述网状物基材从所述第一半导体层剥离,其中至少一个开口延伸穿过所述第一和第 第二半导体层,并且在第一半导体层的第二侧上形成第二电极层,使得第一和第二电极层彼此电接触。

    REMOVING DEFECTS FROM PHOTOVOLTAIC CELL METALLIC SUBSTRATES WITH FIXED-ABRASIVE FILAMENT ROLLER BRUSHES
    5.
    发明申请
    REMOVING DEFECTS FROM PHOTOVOLTAIC CELL METALLIC SUBSTRATES WITH FIXED-ABRASIVE FILAMENT ROLLER BRUSHES 审中-公开
    从具有固定磨光纤维滚筒刷的光伏金属基底板上去除缺陷

    公开(公告)号:US20100282276A1

    公开(公告)日:2010-11-11

    申请号:US12842865

    申请日:2010-07-23

    摘要: Provided are methods and apparatuses for processing photovoltaic cell metallic substrates to remove various surface defects. In certain embodiments, a thin stainless steel foil is polished using a proposed method leading to a substantial, e.g., twice or more, increase in its surface gloss. In certain embodiments, a method in accordance with the present invention involves contacting a substrate surface with a fixed-abrasive filament roller brush. The brush may be a close-wound coil brush. The brush includes filaments carrying 5-20 micrometer abrasive particles that are permanently fixed in the brush filaments, for example a polymer base material, such as nylon. The particles may be made of silicon carbide and/or other abrasive materials. In certain embodiments, a substrate surface is polished using a series of roller brushes, at least two of which rotate in different directions with respect to that surface.

    摘要翻译: 提供了用于处理光伏电池金属基板以去除各种表面缺陷的方法和装置。 在某些实施例中,使用提出的方法来抛光薄的不锈钢箔,导致其表面光泽度的实质的,例如两倍或更多的增加。 在某些实施例中,根据本发明的方法包括使基底表面与固定磨料细丝辊刷相接触。 刷子可以是近绕线圈刷。 刷子包括长丝固定在刷丝中的5-20微米磨粒的长丝,例如聚合物基材,例如尼龙。 颗粒可以由碳化硅和/或其它研磨材料制成。 在某些实施例中,使用一系列辊刷抛光衬底表面,其中至少两个辊刷相对于该表面沿不同的方向旋转。