Radiation-sensitive resin composition, polymer, and method for forming resist pattern
    1.
    发明授权
    Radiation-sensitive resin composition, polymer, and method for forming resist pattern 有权
    辐射敏感性树脂组合物,聚合物和形成抗蚀剂图案的方法

    公开(公告)号:US08815490B2

    公开(公告)日:2014-08-26

    申请号:US13309573

    申请日:2011-12-02

    摘要: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.

    摘要翻译: 辐射敏感性树脂组合物包括第一聚合物,第二聚合物和辐射敏感性酸产生剂。 第一聚合物包括由式(1)表示的重复单元。 第二聚合物包括酸不稳定基团,并且通过酸的作用解离,使得碱溶解度通过所述酸不稳定基团的解离而给出。 R1表示氢原子,甲基或三氟甲基。 R2表示具有1-20个碳原子的单键或二价直链,支链或环状,饱和或不饱和的烃基。 X表示氟原子取代的亚甲基或具有2-20个碳原子的直链或支链的氟代亚烷基。 R3表示氢原子或一价有机基团。

    RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD
    2.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD 审中-公开
    辐射敏感性树脂组合物和耐蚀图案形成方法

    公开(公告)号:US20110212401A1

    公开(公告)日:2011-09-01

    申请号:US13045962

    申请日:2011-03-11

    IPC分类号: G03F7/004 G03F7/20

    摘要: A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin.

    摘要翻译: 辐射敏感性树脂组合物包括树脂,光致酸产生剂,含氟树脂和内酯化合物。 该树脂不包含第一含氟重复单元。 树脂包括由于酸而变成碱溶性的第一重复单元。 含氟树脂包括第二含氟重复单元和由于酸而变成碱溶性的第二重复单元。 辐射敏感性树脂组合物中的内酯化合物的含量相对于100质量份的树脂为约31〜约200质量份。

    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN
    4.
    发明申请
    RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN 有权
    辐射敏感性树脂组合物,聚合物和形成耐火图案的方法

    公开(公告)号:US20120094234A1

    公开(公告)日:2012-04-19

    申请号:US13309573

    申请日:2011-12-02

    IPC分类号: G03F7/20 C08F220/22 G03F7/004

    摘要: The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R3 represents a hydrogen atom or a monovalent organic group.

    摘要翻译: 辐射敏感性树脂组合物包括第一聚合物,第二聚合物和辐射敏感性酸产生剂。 第一聚合物包括由式(1)表示的重复单元。 第二聚合物包括酸不稳定基团,并且通过酸的作用解离,使得碱溶解度通过所述酸不稳定基团的解离而给出。 R1表示氢原子,甲基或三氟甲基。 R2表示具有1-20个碳原子的单键或二价直链,支链或环状,饱和或不饱和的烃基。 X表示氟原子取代的亚甲基或具有2-20个碳原子的直链或支链的氟代亚烷基。 R3表示氢原子或一价有机基团。