公开(公告)号：US06733930B2

公开(公告)日：2004-05-11

申请号：US10073415

申请日：2002-02-13

申请人： Tsutomu Shinagawa ,  Tamotsu Maruyama ,  Hideo Kaneko ,  Mikio Kojima ,  Yukio Inazuki ,  Satoshi Okazaki

发明人： Tsutomu Shinagawa ,  Tamotsu Maruyama ,  Hideo Kaneko ,  Mikio Kojima ,  Yukio Inazuki ,  Satoshi Okazaki

IPC分类号： G03F900

CPC分类号： G03F1/50 ,  G03F1/46 ,  G03F1/80

摘要： In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

摘要翻译： 在透明基板上包括遮光膜和抗反射膜的光掩模坯料中，遮光膜和抗反射膜由含有氧，氮和碳的铬基材料形成，使得碳含量逐步降低或 从表面侧连续地朝向基板。 可以以受控的速率蚀刻光掩模坯料以产生垂直的壁。 通过光刻图案化光掩模坯料制造光掩模。 光掩模坯料和光掩模具有均匀的膜性质，并且有助于具有更大密度和更精细特征尺寸的半导体IC的微细加工。

公开(公告)号：US20140224453A1

公开(公告)日：2014-08-14

申请号：US14346559

申请日：2012-08-31

申请人： Takafumi Yamauchi ,  Takashi Shimazu ,  Tsutomu Shinagawa ,  Shuzou Sanda

发明人： Takafumi Yamauchi ,  Takashi Shimazu ,  Tsutomu Shinagawa ,  Shuzou Sanda

IPC分类号： F28D20/00 ,  B60H1/00

CPC分类号： F28D20/003 ,  B60H1/00271 ,  B60H1/00278 ,  F01N2610/02 ,  F01P2011/205 ,  H01M10/615 ,  H01M10/625 ,  H01M10/659 ,  H01M10/6595 ,  Y02E60/142

摘要： An object is to enable a compact and high output heat storage system to perform warm-up rapidly when a vehicle is started up, and after warm-up, to recover surplus heat that is present in a heat source in the vehicle to prepare for the next warm-up event. A heat recovery-type heating device includes: an ammonia buffer configured so as to be capable of fixing and desorbing ammonia that serves as a chemical reaction medium; and a chemical heat storage reactor provided with a chemical heat storage material that generates heat through a chemical reaction with ammonia supplied from the ammonia buffer, and that desorbs ammonia using surplus heat from a heat source and returns the ammonia to the ammonia buffer.

摘要翻译： 目的是使紧凑型高输出蓄热系统能够在车辆启动时快速进行预热，并且在预热之后，回收存在于车辆的热源中的多余的热量以准备 接下来的热身赛。 热回收型加热装置包括：氨缓冲器，其能够固定和解吸用作化学反应介质的氨; 以及化学蓄热反应器，其具有通过与从氨缓冲液供给的氨的化学反应产生热量的化学蓄热材料，并且使用来自热源的余热将氨返回到氨缓冲液。

公开(公告)号：US09791216B2

公开(公告)日：2017-10-17

申请号：US14346559

申请日：2012-08-31

申请人： Takafumi Yamauchi ,  Takashi Shimazu ,  Tsutomu Shinagawa ,  Shuzou Sanda

发明人： Takafumi Yamauchi ,  Takashi Shimazu ,  Tsutomu Shinagawa ,  Shuzou Sanda

IPC分类号： F28D15/00 ,  F28D20/00 ,  B60H1/00 ,  H01M10/625 ,  H01M10/615 ,  H01M10/6595 ,  H01M10/659 ,  F01P11/20

CPC分类号： F28D20/003 ,  B60H1/00271 ,  B60H1/00278 ,  F01N2610/02 ,  F01P2011/205 ,  H01M10/615 ,  H01M10/625 ,  H01M10/659 ,  H01M10/6595 ,  Y02E60/142

摘要： An object is to enable a compact and high output heat storage system to perform warm-up rapidly when a vehicle is started up, and after warm-up, to recover surplus heat that is present in a heat source in the vehicle to prepare for the next warm-up event. A heat recovery-type heating device includes: an ammonia buffer configured so as to be capable of fixing and desorbing ammonia that serves as a chemical reaction medium; and a chemical heat storage reactor provided with a chemical heat storage material that generates heat through a chemical reaction with ammonia supplied from the ammonia buffer, and that desorbs ammonia using surplus heat from a heat source and returns the ammonia to the ammonia buffer.

公开(公告)号：US06727027B2

公开(公告)日：2004-04-27

申请号：US10020987

申请日：2001-12-19

申请人： Tetsushi Tsukamoto ,  Hideo Kaneko ,  Tamotsu Maruyama ,  Yukio Inazuki ,  Tsutomu Shinagawa ,  Satoshi Okazaki

发明人： Tetsushi Tsukamoto ,  Hideo Kaneko ,  Tamotsu Maruyama ,  Yukio Inazuki ,  Tsutomu Shinagawa ,  Satoshi Okazaki

IPC分类号： G03F900

CPC分类号： G03F1/50 ,  G03F1/38

摘要： In the manufacture of a photomask blank, a seed layer of a chromium material containing oxygen, nitrogen and/or carbon is formed on a transparent substrate before a light-shielding film and an antireflective film are deposited thereon. Any film on the seed layer builds up in accordance with fine granular growth, and so the resulting photomask blank has an improved surface roughness, which enables high-sensitivity detection in the process of defect inspection and circuit pattern inspection. By lithographically patterning the photomask blank, a photomask is fabricated.

摘要翻译： 在光掩模坯料的制造中，在其上沉积有遮光膜和抗反射膜之前，在透明基板上形成含有氧，氮和/或碳的铬材料的晶种层。 种子层上的任何薄膜均按照细颗粒生长形成，因此得到的光掩模坯料具有改善的表面粗糙度，这使得能够在缺陷检查和电路图形检查的过程中进行高灵敏度检测。 通过光刻图案化光掩模坯料，制造光掩模。