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    Photomask blank, photomask and method of manufacture
    1.
    发明授权
    Photomask blank, photomask and method of manufacture 有权
    光掩模坯料，光掩模和制造方法

    公开(公告)号：US06733930B2

    公开(公告)日：2004-05-11

    申请号：US10073415

    申请日：2002-02-13

    申请人： Tsutomu Shinagawa ,  Tamotsu Maruyama ,  Hideo Kaneko ,  Mikio Kojima ,  Yukio Inazuki ,  Satoshi Okazaki

    发明人： Tsutomu Shinagawa ,  Tamotsu Maruyama ,  Hideo Kaneko ,  Mikio Kojima ,  Yukio Inazuki ,  Satoshi Okazaki

    IPC分类号： G03F900

    CPC分类号： G03F1/50 ,  G03F1/46 ,  G03F1/80

    摘要： In a photomask blank comprising a light-shielding film and an antireflective film on a transparent substrate, the light-shielding film and the antireflective film are formed of a chromium base material containing oxygen, nitrogen and carbon such that the content of carbon decreases stepwise or continuously from a surface side toward the substrate. The photomask blank can be etched at a controlled rate to produce perpendicular walls. A photomask is manufactured by lithographically patterning the photomask blank. The photomask blank and photomask have uniform film properties and contribute to the microfabrication of semiconductor ICs of greater density and finer feature size.

    摘要翻译： 在透明基板上包括遮光膜和抗反射膜的光掩模坯料中，遮光膜和抗反射膜由含有氧，氮和碳的铬基材料形成，使得碳含量逐步降低或 从表面侧连续地朝向基板。 可以以受控的速率蚀刻光掩模坯料以产生垂直的壁。 通过光刻图案化光掩模坯料制造光掩模。 光掩模坯料和光掩模具有均匀的膜性质，并且有助于具有更大密度和更精细特征尺寸的半导体IC的微细加工。

    Sulfonamide derivative, process for preparing the same and herbicide using the same
    3.
    发明授权
    Sulfonamide derivative, process for preparing the same and herbicide using the same 失效
    磺酰胺衍生物，其制备方法和使用其的除草剂

    公开(公告)号：US5376620A

    公开(公告)日：1994-12-27

    申请号：US41998

    申请日：1993-04-02

    申请人： Takaaki Abe ,  Yuji Akiyoshi ,  Hiroshi Shiraishi ,  Ikuo Shiraishi ,  Mikio Kojima ,  Takashi Hayama ,  Takaaki Kuwata

    发明人： Takaaki Abe ,  Yuji Akiyoshi ,  Hiroshi Shiraishi ,  Ikuo Shiraishi ,  Mikio Kojima ,  Takashi Hayama ,  Takaaki Kuwata

    IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/34 ,  C07D251/38 ,  C07D401/12

    CPC分类号： C07D401/12 ,  A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/34 ,  C07D251/38

    摘要： Disclosed are a sulfonamide compound represented by the following formula (I): ##STR1## wherein Y represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group, a cyano-lower alkyl group or --C(CH.sub.3).sub.2 (OR.sup.1) where R.sup.1 represents a lower akyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; Q represents a substituted or unsubstituted pyridyl group or --NR.sup.2 R.sup.3 where R.sup.2 represents a hydrogen atom, a lower alkyl group, a lower alkoxy group; and R.sup.3 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a phenyl group or a benzyl group; or R.sup.2 and R.sup.3 may be combined to form a cycloamino group; X represents an oxygen atom or a sulfur atom; and Z represents a nitrogen atom or --CH.dbd. group;processes for preparing the same and a herbicide containing the same as an active ingredient(s).

    摘要翻译： 公开了由下式（I）表示的磺酰胺化合物：其中Y表示低级烷基，低级烯基，低级炔基，卤代低级烷基，氰基 - 低级烷基 基团或-C（CH 3）2（OR 1），其中R 1表示低级烷基，低级烯基，低级炔基，卤代低级烷基或氰基 - 低级烷基; Q表示取代或未取代的吡啶基或-NR2R3，其中R2表示氢原子，低级烷基，低级烷氧基; R3表示低级烷基，低级烯基，低级炔基，苯基或苄基。 或者R 2和R 3可以组合形成环氨基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团; 其制备方法和含有其作为活性成分的除草剂。

    Pyrimidine derivatives and a pharmaceutical composition containing them
    4.
    发明授权
    Pyrimidine derivatives and a pharmaceutical composition containing them 失效
    嘧啶衍生物和含有它们的药物组合物

    公开(公告)号：US4450162A

    公开(公告)日：1984-05-22

    申请号：US384416

    申请日：1982-06-02

    申请人： Toshiharu Kamioka ,  Isao Nakayama ,  Takeo Honda ,  Takashi Kobayashi ,  Tokio Obata ,  Katsutoshi Fujii ,  Mikio Kojima ,  Yuji Akiyoshi

    发明人： Toshiharu Kamioka ,  Isao Nakayama ,  Takeo Honda ,  Takashi Kobayashi ,  Tokio Obata ,  Katsutoshi Fujii ,  Mikio Kojima ,  Yuji Akiyoshi

    IPC分类号： A61K31/505 ,  A61K31/517 ,  A61P25/24 ,  A61P25/26 ,  C07D239/42 ,  C07D239/70 ,  C07D239/94

    CPC分类号： C07D239/42 ,  C07D239/70

    摘要： New 4-anilinopyrimidine derivatives of formula (I): ##STR1## (wherein: R.sup.1 and R.sup.2 are the same or different and each represents a C.sub.1 -C.sub.6 alkyl group or R.sup.1 and R.sup.2 together represent a C.sub.3 -C.sub.5 alkylene group;R.sup.3 represents a hydrogen atom or a C.sub.1 -C.sub.6 alkyl group;n is 0, 1 or 2; andR.sup.4 represents a C.sub.1 -C.sub.6 alkyl group, a C.sub.1 -C.sub.6 alkoxy group, a C.sub.1 -C.sub.6 haloalkyl group, a halogen atom, a nitro group, a C.sub.1 -C.sub.6 alkanesulphonyl group, a cyano group, a carboxy group or a C.sub.2 -C.sub.7 alkoxycarbonyl group and, when n is 2, the two groups represented by R.sup.4 may be the same or different or they may together represent a methylenedioxy group)and pharmaceutically acceptable acid addition salts thereof have been found to have strong antidepressant activity, with low toxicity and very few side-effects. The compounds may be formulated in conventional pharmaceutical compositions for administration by various routes and may be prepared by reacting a 4-halopyrimidine with aniline or an aniline derivative.

    摘要翻译： 式（I）的新的4-苯胺基嘧啶衍生物：其中：R 1和R 2相同或不同，各自表示C 1 -C 6烷基或R 1和R 2一起代表C 3 -C 5亚烷基; R3表示氢原子或C1-C6烷基; n为0,1或2; R4表示C1-C6烷基，C1-C6烷氧基，C1-C6卤代烷基，卤素原子， 硝基，C1-C6烷磺酰基，氰基，羧基或C2-C7烷氧基羰基，当n为2时，由R4表示的两个基团可以相同或不同，或者它们可以一起代表亚甲二氧基 组）及其药学上可接受的酸加成盐被发现具有强的抗抑郁活性，毒性低，副作用非常少。 化合物可以配制成用于通过各种途径给药的常规药物组合物，并且可以通过4-卤代嘧啶与苯胺或苯胺衍生物反应来制备。

    Triazine derivative, process for preparing the same and herbicide using the same
    6.
    发明授权
    Triazine derivative, process for preparing the same and herbicide using the same 失效
    三嗪衍生物，其制备方法和使用其的除草剂

    公开(公告)号：US5529977A

    公开(公告)日：1996-06-25

    申请号：US326830

    申请日：1994-10-21

    申请人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama

    发明人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama

    IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/30 ,  C07D251/38 ,  C07D521/00 ,  C07D251/34 ,  C07D251/16 ,  C07D403/12

    CPC分类号： C07D231/12 ,  A01N43/54 ,  A01N43/66 ,  C07D233/56 ,  C07D239/60 ,  C07D249/08 ,  C07D251/30 ,  C07D251/38

    摘要： Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 has the same meaning as defined above, hydroxy group, OK, a lower alkoxy group which may have a substituent, a lower alkenyloxy group, a lower alkynyloxy group, a cycloalkoxy group which may have a substituent, a phenoxy group, a benzyloxy group, a lower alkylthio group, a phenylthio group or an alkylsulfonylamino group when Z is --CH.dbd. group; R.sup.5 represents a lower alkoxy group; R.sup.6 represents a lower alkoxy group or a lower alkyl group; X represents oxygen atom or sulfur atom; and Z represents nitrogen atom or --CH.dbd. group.processes for preparing the same and a herbicide containing the same as an active ingredient(s).

    摘要翻译： 公开了由下式（I）表示的嘧啶或三嗪化合物：其中R 1表示氰基，卤素原子，羟基或-O-R 7，其中R 7表示低级烷基，低级烯基 基，低级炔基，卤代低级烷基或氰基 - 低级烷基; R2表示氢原子或低级烷基; R3表示氢原子或低级烷基; R 4表示当Z为氮原子时，可以具有取代基，羟基，低级烷氧基或苄氧基的低级烷基或苯基，-NHSO 2 -R 8， 或1-咪唑基，-NHSO 2 -R 8，其中R8具有与上述相同的含义，羟基，OK，可具有取代基的低级烷氧基，低级链烯氧基，低级炔氧基，环烷氧基 当Z为-CH =基团时，可具有取代基，苯氧基，苄氧基，低级烷硫基，苯硫基或烷基磺酰基氨基; R5代表低级烷氧基; R6代表低级烷氧基或低级烷基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团。 其制备方法和含有其作为活性成分的除草剂。

    Pyrimidine derivatives, process for preparing the same and herbicide using the same
    9.
    发明授权
    Pyrimidine derivatives, process for preparing the same and herbicide using the same 失效
    嘧啶衍生物，其制备方法和使用其的除草剂

    公开(公告)号：US5387575A

    公开(公告)日：1995-02-07

    申请号：US894557

    申请日：1992-06-05

    申请人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama ,  Shohei Fukuda

    发明人： Katsumasa Harada ,  Takaaki Abe ,  Yuji Akiyoshi ,  Akio Matsushita ,  Mikio Kojima ,  Ikuo Shiraishi ,  Kaoru Yamamoto ,  Takashi Hayama ,  Shohei Fukuda

    IPC分类号： A01N43/54 ,  A01N43/66 ,  C07D239/60 ,  C07D251/30 ,  C07D251/38 ,  C07D521/00 ,  C07D239/52 ,  A01N73/54

    CPC分类号： C07D231/12 ,  A01N43/54 ,  A01N43/66 ,  C07D233/56 ,  C07D239/60 ,  C07D249/08 ,  C07D251/30 ,  C07D251/38

    摘要： Disclosed are a pyrimidine or triazine compound represented by the following formula (I): ##STR1## wherein R.sup.1 represents cyano group, a halogen atom, hydroxy group or --O--R.sup.7 where R.sup.7 represents a lower alkyl group, a lower alkenyl group, a lower alkynyl group, a halo-lower alkyl group or a cyano-lower alkyl group; R.sup.2 represents hydrogen atom or a lower alkyl group; R.sup.3 represents hydrogen atom or a lower alkyl group; R.sup.4 represents a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 represents a lower alkyl group or a phenyl group which may have a substituent, hydroxy group, a lower alkoxy group or a benzyloxy group when Z is nitrogen atom; or a 1-imidazolyl group, --NHSO.sub.2 --R.sup.8 where R.sup.8 has the same meaning as defined above, hydroxy group, OK, a lower alkoxy group which may have a substituent, a lower alkenyloxy group, a lower alkynyloxy group, a cycloalkoxy group which may have a substituent, a phenoxy group, a benzyloxy group, a lower alkylthio group, a phenylthio group or an alkylsulfonylamino group when Z is --CH.dbd. group; R.sup.5 represents a lower alkoxy group; R.sup.6 represents a lower alkoxy group or a lower alkyl group; X represents oxygen atom or sulfur atom; and Z represents nitrogen atom or --CH.dbd. group. processes for preparing the same and a herbicide containing the same as an active ingredient(s).

    摘要翻译： 公开了由下式（I）表示的嘧啶或三嗪化合物：其中R 7表示低级烷基，低级烯基，低级炔基，卤代烷基， 低级烷基或氰基 - 低级烷基; R2代表氢原子或低级烷基; R3表示氢原子或低级烷基; R 4表示当Z为氮原子时，可以具有取代基，羟基，低级烷氧基或苄氧基的低级烷基或苯基，-NHSO 2 -R 8， 或1-咪唑基，-NHSO 2 -R 8，其中R8具有与上述相同的含义，羟基，OK，可具有取代基的低级烷氧基，低级链烯氧基，低级炔氧基，环烷氧基 当Z为-CH =基团时，可具有取代基，苯氧基，苄氧基，低级烷硫基，苯硫基或烷基磺酰基氨基; R5代表低级烷氧基; R6代表低级烷氧基或低级烷基; X表示氧原子或硫原子; Z表示氮原子或-CH =基团。 其制备方法和含有其作为活性成分的除草剂。