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64 条记录 (耗时 0.026 秒)

    Method for the application of active materials onto active surfaces and devices made with such methods
    2.
    发明授权
    Method for the application of active materials onto active surfaces and devices made with such methods 失效
    将活性物质施加到活性表面上的方法和用这种方法制造的装置

    公开(公告)号：US08287766B2

    公开(公告)日：2012-10-16

    申请号：US11154925

    申请日：2005-06-16

    申请人： Viacheslav A. Petrov ,  Daniel David Lecloux

    发明人： Viacheslav A. Petrov ,  Daniel David Lecloux

    IPC分类号： H01L51/50 ,  H01B1/12 ,  C07C43/205 ,  C09K9/02 ,  B05D5/12 ,  B05D1/36 ,  B32B9/04

    CPC分类号： H01L51/0007 ,  H01L51/0078 ,  H01L51/0081

    摘要： The invention provides methods for the application of active materials onto active surfaces useful in organic electronic devices. The methods of the invention include selecting a liquid composition including an active material and a suitable liquid medium whereby when the liquid composition is deposited on the desired active surface it has no greater than about a 40° contact angle; treating the active surface to raise its surface tension before the deposition of a liquid composition containing the desired active material is deposited thereon; and combination thereof. The invention also provides organic electronic devices having at least two active layers, wherein at least one active layer comprises an active material that was deposited using at least one practice of the method of the invention.

    摘要翻译： 本发明提供了将活性材料应用于有机电子器件有效表面的方法。 本发明的方法包括选择包括活性材料和合适液体介质的液体组合物，由此当液体组合物沉积在所需活性表面上时，其具有不大于约40°的接触角; 在沉积含有所需活性材料的液体组合物之前，处理活性表面以提高其表面张力; 及其组合。 本发明还提供了具有至少两个活性层的有机电子器件，其中至少一个活性层包含使用本发明方法的至少一种实践沉积的活性材料。

    Method for the application of active materials onto active surfaces and devices made with such methods
    3.
    发明授权
    Method for the application of active materials onto active surfaces and devices made with such methods 有权
    将活性物质施加到活性表面上的方法和用这种方法制造的装置

    公开(公告)号：US07686978B2

    公开(公告)日：2010-03-30

    申请号：US10669403

    申请日：2003-09-24

    申请人： Viacheslav A. Petrov ,  Daniel David Lecloux

    发明人： Viacheslav A. Petrov ,  Daniel David Lecloux

    IPC分类号： C07C43/00 ,  C07C43/30 ,  H01L51/50

    CPC分类号： H01L51/0007 ,  H01L51/0078 ,  H01L51/0081

    摘要： The invention provides methods for the application of active materials onto active surfaces useful in organic electronic devices. The methods of the invention include selecting a liquid composition including an active material and a suitable liquid medium whereby when the liquid composition is deposited on the desired active surface it has no greater than about a 40° contact angle; treating the active surface to raise its surface tension before the deposition of a liquid composition containing the desired active material is deposited thereon; and combination thereof. The invention also provides organic electronic devices having at least two active layers, wherein at least one active layer comprises an active material that was deposited using at least one practice of the method of the invention.

    摘要翻译： 本发明提供了将活性材料应用于可用于有机电子器件的有源表面上的方法。 本发明的方法包括选择包括活性材料和合适液体介质的液体组合物，由此当液体组合物沉积在所需活性表面上时，其具有不大于约40°的接触角; 在沉积含有所需活性材料的液体组合物之前，处理活性表面以提高其表面张力; 及其组合。 本发明还提供了具有至少两个活性层的有机电子器件，其中至少一个活性层包含使用本发明方法的至少一种实践沉积的活性材料。

    CATALYTIC ADDITION OF HYDROFLUOROCARBONS TO FLUOROOLEFINS
    4.
    发明申请
    CATALYTIC ADDITION OF HYDROFLUOROCARBONS TO FLUOROOLEFINS 失效
    氢氟碳化物对氟橄榄油的催化添加

    公开(公告)号：US20090299108A1

    公开(公告)日：2009-12-03

    申请号：US12307754

    申请日：2007-07-03

    申请人： Xuehui Sun ,  Viacheslav A. Petrov ,  Mario Joseph Nappa ,  Velliyur Nott Mallikarjuna Rao ,  Ekaterina N. Swearingen

    发明人： Xuehui Sun ,  Viacheslav A. Petrov ,  Mario Joseph Nappa ,  Velliyur Nott Mallikarjuna Rao ,  Ekaterina N. Swearingen

    IPC分类号： C07C17/269

    CPC分类号： C07C17/278 ,  C07C19/08

    摘要： A process is disclosed for making RR1R2CCR1R2F wherein R is selected from the group consisting of CH3, CH2F, C2H4F, and F(CF2)nCH2CH2 where n is an integer from 1 to 10, each R1 is independently selected from the group consisting of H, Cl, F and CF3, and each R2 is independently selected from the group consisting of H, F and CF3. The process involves reacting RF with R1R2C═CR1R2 in the presence of SbF5 to produce a product mixture comprising RR1R2CCR1R2F, wherein the reaction temperature is from about −60° C. to about −10° C., provided that total number of carbon atoms in R1R2C═CR1R2 is 5 or less.

    摘要翻译： 公开了制备RR1R2CCR1R2F的方法，其中R选自CH 3，CH 2 F，C 2 H 4 F和F（CF 2）n CH 2 CH 2，其中n为1至10的整数，每个R 1独立地选自H， Cl，F和CF 3，并且每个R 2独立地选自H，F和CF 3。 该方法包括在SbF 5存在下使RF与R 1 R 2 C-CR 1 R 2反应以产生包含RR1R2CCR1R2F的产物混合物，其中反应温度为约-60℃至约-10℃，条件是总碳原子数 R1R2C-CR1R2为5以下。