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公开(公告)号：US20050248743A1
公开(公告)日：2005-11-10
申请号：US11183847
申请日：2005-07-19
申请人： Walter Augustyn , Richard Gontin
发明人： Walter Augustyn , Richard Gontin
CPC分类号： G03F7/706 , G02B5/1838
摘要： An electromagnetic radiation diffuser, operative at extreme ultraviolet (EUV) wavelengths, is fabricated on a substrate. The diffuser comprises a randomized structure having a peak and valley profile over which a highly reflective coating is formed. The reflective coating substantially takes the form of the peak and valley profile beneath it. An absorptive grating can be fabricated over the reflective coating. The grating spaces will diffusely reflect electromagnetic radiation because of the profile of the randomized structure beneath. The absorptive grating will absorb the electromagnetic radiation. The grating thus becomes a specialized Ronchi ruling that may be used for wavefront evaluation and other optical diagnostics in extremely short wavelength reflective lithography systems, such as EUV lithography systems.
摘要翻译： 在基板上制造在极紫外（EUV）波长下工作的电磁辐射漫射器。 扩散器包括具有峰和谷分布的随机化结构，在其上形成高反射涂层。 反射涂层基本上呈现在其下面的峰和谷轮廓的形式。 可以在反射涂层上制造吸收光栅。 由于下面的随机化结构的轮廓，光栅空间将漫反射电磁辐射。 吸收光栅将吸收电磁辐射。 因此，光栅成为专门的Ronchi规则，可用于波长极端评估和其他光学诊断技术在极短波长反射光刻系统（如EUV光刻系统）中。
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公开(公告)号：US06819402B2
公开(公告)日：2004-11-16
申请号：US10270561
申请日：2002-10-16
申请人： Walter Augustyn , James Tsacoyeanes
发明人： Walter Augustyn , James Tsacoyeanes
IPC分类号： G03B2754
CPC分类号： G03F7/70583
摘要： The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
摘要翻译： 本发明涉及一种用于扩大激光束的方法和系统。 照明系统包括水平反射多路复用器和垂直反射多路复用器。 水平反射多路复用器沿着第一维复用输入光束以形成第一复用光束。 垂直反射多路复用器沿着第二维复用第一多路复用波束以形成第二多路复用波束。 在一个示例中，水平反射多路复用器包括第一分束器，第二分束器和反射镜。 垂直反射多路复用器包括分束器和反射镜。
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公开(公告)号：US07187430B2
公开(公告)日：2007-03-06
申请号：US10896022
申请日：2004-07-22
CPC分类号： G03F7/70158 , G03F7/70091 , G03F7/70183
摘要： A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
摘要翻译： 微光学系统包括照明源; 一种照明光学系统，其从物体方向依次包括：（a）从所述照明源接收照明的第一衍射光学元件，（b）变焦透镜，（c）第二衍射光学元件，（d）冷凝器 透镜，（e）中继透镜，以及（f）掩模版和用于将掩模版成像到基板上的投影光学系统，其中用于微光刻的系统提供可变倍数值孔径。
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公开(公告)号：US06775069B2
公开(公告)日：2004-08-10
申请号：US10270556
申请日：2002-10-16
申请人： Mark Oskotsky , Lev Ryzhikov , Scott Coston , James Tsacoyeanes , Peter J. Baumgartner , Walter Augustyn
发明人： Mark Oskotsky , Lev Ryzhikov , Scott Coston , James Tsacoyeanes , Peter J. Baumgartner , Walter Augustyn
IPC分类号： G02B2710
CPC分类号： G03F7/70158 , G03F7/70183
摘要： The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array. The second diffractive array is optically coupled to the condenser system, receives light from the condenser system, which in turn generates an illumination field at a reticle.
摘要翻译： 本发明涉及一种照明系统，包括照明源，放置在与照明源的光路中的光束调节器，第一衍射阵列，冷凝器系统和第二衍射阵列。 照明源将光通过光束调节器引导到第一衍射阵列上。 然后将光导向放置在第一衍射阵列和第二衍射阵列之间的光路中的聚光系统。 冷凝器系统包括多个固定光学元件和多个可移动光学元件。 多个可移动光学元件被放置在具有多个固定光学元件的光路中。 可移动光学元件能够在多个固定光学元件之间平移以放大从第一衍射阵列接收的光。 第二衍射阵列光耦合到冷凝器系统，接收来自冷凝器系统的光，其又在光罩处产生照明场。
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公开(公告)号：US20070146674A1
公开(公告)日：2007-06-28
申请号：US11682573
申请日：2007-03-06
IPC分类号： G03B27/54
CPC分类号： G03F7/70158 , G03F7/70091 , G03F7/70183
摘要： A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
摘要翻译： 微光学系统包括照明源; 一种照明光学系统，其从物体方向依次包括：（a）从所述照明源接收照明的第一衍射光学元件，（b）变焦透镜，（c）第二衍射光学元件，（d）冷凝器 透镜，（e）中继透镜，以及（f）掩模版和用于将掩模版成像到基板上的投影光学系统，其中用于微光刻的系统提供可变倍数值孔径。
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6.发明申请System and method using visible and infrared light to align and measure alignment patterns on multiple layers 失效使用可见光和红外光对准和测量多层对准图案的系统和方法公开(公告)号：US20060115956A1
公开(公告)日：2006-06-01
申请号：US11272711
申请日：2005-11-15
申请人： Pankaj Raval , Walter Augustyn
发明人： Pankaj Raval , Walter Augustyn
IPC分类号： H01L21/76
CPC分类号： G03F9/7084 , G03F9/7003 , G03F9/7065 , G03F9/7088
摘要： A system and method are used to increase alignment accuracy of feature patterns through detection of alignment patterns on both a surface layer and at least one below surface layers of an object. Visible light is used to detect alignment patterns on the surface layer and infrared light is used to detect patterns one layers below the surface. For example, reflected visible light and transmitted infrared light are co-focused onto detector after impinging on respective alignment patterns. The co-focused light is then used to determine proper alignment of the object for subsequent pattern features. This substantially increases accuracy of alignment of pattern features between layers, as compared to conventional systems.
摘要翻译： 系统和方法用于通过检测表面层和物体的至少一个下表面层上的对准图案来增加特征图案的对准精度。 可见光用于检测表面层上的对准图案，红外光用于检测表面下方的图案。 例如，反射的可见光和透射的红外光在撞击到相应的对准图案之后共同聚焦在检测器上。 然后使用共焦点光来确定对象对于随后的图案特征的适当对准。 与传统系统相比，这显着增加了层之间图案特征的对准精度。
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公开(公告)号：US07006198B2
公开(公告)日：2006-02-28
申请号：US10970411
申请日：2004-10-22
申请人： Walter Augustyn , James Tsacoyeanes
发明人： Walter Augustyn , James Tsacoyeanes
CPC分类号： G03F7/70583
摘要： The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
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公开(公告)号：US20050083505A1
公开(公告)日：2005-04-21
申请号：US10970411
申请日：2004-10-22
申请人： Walter Augustyn , James Tsacoyeanes
发明人： Walter Augustyn , James Tsacoyeanes
IPC分类号： G02B27/09 , G03F7/20 , H01L21/027 , H01S3/10 , G03B27/54
CPC分类号： G03F7/70583
摘要： The present invention relates to a method and system for expanding a laser beam. An illumination system includes a horizontal reflective multiplexer and a vertical reflective multiplexer. The horizontal reflective multiplexer replicates the input beam along a first dimension to form a first multiplexed beam. The vertical reflective multiplexer replicates the first multiplexed beam along a second dimension to form a second multiplexed beam. In one example, the horizontal reflective multiplexer includes a first beam splitter, second beam splitter, and mirror. The vertical reflective multiplexer includes a beam splitter and mirror.
摘要翻译： 本发明涉及一种用于扩大激光束的方法和系统。 照明系统包括水平反射多路复用器和垂直反射多路复用器。 水平反射多路复用器沿着第一维复用输入光束以形成第一复用光束。 垂直反射多路复用器沿着第二维复用第一多路复用波束以形成第二多路复用波束。 在一个示例中，水平反射多路复用器包括第一分束器，第二分束器和反射镜。 垂直反射多路复用器包括分束器和反射镜。
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公开(公告)号：US06813003B2
公开(公告)日：2004-11-02
申请号：US10166062
申请日：2002-06-11
IPC分类号： G03B2752
CPC分类号： G03F7/70158 , G03F7/70091 , G03F7/70183
摘要： A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
摘要翻译： 微光学系统包括照明源; 一种照明光学系统，其从物体方向依次包括：（a）从所述照明源接收照明的第一衍射光学元件，（b）变焦透镜，（c）第二衍射光学元件，（d）冷凝器 透镜，（e）中继透镜，以及（f）掩模版和用于将掩模版成像到基板上的投影光学系统，其中用于微光刻的系统提供可变倍数值孔径。
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