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公开(公告)号：US06775069B2
公开(公告)日：2004-08-10
申请号：US10270556
申请日：2002-10-16
申请人： Mark Oskotsky , Lev Ryzhikov , Scott Coston , James Tsacoyeanes , Peter J. Baumgartner , Walter Augustyn
发明人： Mark Oskotsky , Lev Ryzhikov , Scott Coston , James Tsacoyeanes , Peter J. Baumgartner , Walter Augustyn
IPC分类号： G02B2710
CPC分类号： G03F7/70158 , G03F7/70183
摘要： The present invention relates to an illumination system including an illumination source, a beam conditioner placed in an optical path with the illumination source, a first diffractive array, a condenser system and a second diffractive array. The illumination source directs light through the beam conditioner onto the first diffractive array. The light is then directed to the condenser system placed in an optical path between the first diffractive array and second diffractive array. The condenser system includes a plurality of stationary optical elements and a plurality of movable optical elements. The plurality of movable optical elements are placed in an optical path with the plurality of stationary optical elements. The movable optical elements are capable of translation between the plurality of stationary optical element to zoom the light received from the first diffractive array. The second diffractive array is optically coupled to the condenser system, receives light from the condenser system, which in turn generates an illumination field at a reticle.
摘要翻译： 本发明涉及一种照明系统，包括照明源，放置在与照明源的光路中的光束调节器，第一衍射阵列，冷凝器系统和第二衍射阵列。 照明源将光通过光束调节器引导到第一衍射阵列上。 然后将光导向放置在第一衍射阵列和第二衍射阵列之间的光路中的聚光系统。 冷凝器系统包括多个固定光学元件和多个可移动光学元件。 多个可移动光学元件被放置在具有多个固定光学元件的光路中。 可移动光学元件能够在多个固定光学元件之间平移以放大从第一衍射阵列接收的光。 第二衍射阵列光耦合到冷凝器系统，接收来自冷凝器系统的光，其又在光罩处产生照明场。
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公开(公告)号：US07187430B2
公开(公告)日：2007-03-06
申请号：US10896022
申请日：2004-07-22
CPC分类号： G03F7/70158 , G03F7/70091 , G03F7/70183
摘要： A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
摘要翻译： 微光学系统包括照明源; 一种照明光学系统，其从物体方向依次包括：（a）从所述照明源接收照明的第一衍射光学元件，（b）变焦透镜，（c）第二衍射光学元件，（d）冷凝器 透镜，（e）中继透镜，以及（f）掩模版和用于将掩模版成像到基板上的投影光学系统，其中用于微光刻的系统提供可变倍数值孔径。
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公开(公告)号：US20070146674A1
公开(公告)日：2007-06-28
申请号：US11682573
申请日：2007-03-06
IPC分类号： G03B27/54
CPC分类号： G03F7/70158 , G03F7/70091 , G03F7/70183
摘要： A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
摘要翻译： 微光学系统包括照明源; 一种照明光学系统，其从物体方向依次包括：（a）从所述照明源接收照明的第一衍射光学元件，（b）变焦透镜，（c）第二衍射光学元件，（d）冷凝器 透镜，（e）中继透镜，以及（f）掩模版和用于将掩模版成像到基板上的投影光学系统，其中用于微光刻的系统提供可变倍数值孔径。
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公开(公告)号：US06813003B2
公开(公告)日：2004-11-02
申请号：US10166062
申请日：2002-06-11
IPC分类号： G03B2752
CPC分类号： G03F7/70158 , G03F7/70091 , G03F7/70183
摘要： A system for microlithography comprises an illumination source; an illumination optical system including, in order from an objective side, (a) a first diffractive optical element that receives illumination from the illumination source, (b) a zoom lens, (c) a second diffractive optical element, (d) a condenser lens, (e) a relay lens, and (f) a reticle, and a projection optical system for imaging the reticle onto a substrate, wherein the system for microlithography provides a zoomable numerical aperture.
摘要翻译： 微光学系统包括照明源; 一种照明光学系统，其从物体方向依次包括：（a）从所述照明源接收照明的第一衍射光学元件，（b）变焦透镜，（c）第二衍射光学元件，（d）冷凝器 透镜，（e）中继透镜，以及（f）掩模版和用于将掩模版成像到基板上的投影光学系统，其中用于微光刻的系统提供可变倍数值孔径。
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公开(公告)号：US07023525B2
公开(公告)日：2006-04-04
申请号：US10883791
申请日：2004-07-06
申请人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.
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公开(公告)号：US06778257B2
公开(公告)日：2004-08-17
申请号：US10200577
申请日：2002-07-23
申请人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
发明人： Arno Jan Bleeker , Pieter Willem Herman De Jager , Jason Douglas Hintersteiner , Borgert Kruizinga , Matthew Eugene McCarthy , Mark Oskotsky , Lev Ryzhikov , Lev Sakin , Stanislav Smirnov , Bart Snijders , Karel Diederick Van Der Mast , Huibert Visser
IPC分类号： G03B2754
CPC分类号： G03F7/70283 , G03F7/70291
摘要： An imaging apparatus according to one embodiment of the invention includes a programmable patterning structure configured to pattern a projection beam of radiation according to a desired pattern. The programmable patterning structure includes a plurality of separate patterning sub-elements, each sub-element being configured to generate a patterned sub-beam. At least one of the separate patterning sub-elements is configured to generate a patterned sub-beam whose cross-section contains regions of different intensities. The imaging apparatus also includes a combining structure configured to combine the plurality of patterned sub-beams into a single patterned image, and a projection system configured to project the patterned image onto a target portion of a substrate.
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公开(公告)号：US06307682B1
公开(公告)日：2001-10-23
申请号：US09504719
申请日：2000-02-16
IPC分类号： G02B1322
CPC分类号： G03F7/70183 , G02B3/005 , G03F7/70075
摘要： The present invention provides an illumination system for varying the size of an illumination field incident to a scattering optical element. The illumination field is subsequently imaged to a reticle in a photolithographic process. The illumination system includes, in series along an optical axis of the illumination system, an optical source, a beam conditioner, a first optical integrator, a first or input collimating lens, a zoom array integrator (ZAI), a second or output collimating lens, the optical scattering element, a relay lens, and the reticle. The ZAI includes an assembly of fixed and moveable lens components arranged to vary the size of the illumination field throughout a zoom range of the ZAI while maintaining telecentric illumination at a substantially fixed numerical aperture. Illumination telecentricity and substantially fixed numerical apertures are maintained at both the scattering optical element and the reticle throughout the zoom range.
摘要翻译： 本发明提供一种用于改变入射到散射光学元件的照明场的尺寸的照明系统。 照射场随后在光刻工艺中成像到掩模版。 照明系统沿照明系统的光轴串联包括光源，光束调节器，第一光学积分器，第一或输入准直透镜，变焦阵列积分器（ZAI），第二或输出准直透镜 ，光散射元件，中继透镜和掩模版。 ZAI包括固定和可移动透镜组件的组件，其被布置成在ZAI的整个变焦范围内改变照明场的大小，同时将远心照明保持在基本上固定的数值孔径。 在整个变焦范围内，散射光学元件和掩模版都保持照明远心度和基本固定的数值孔径。
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公开(公告)号：US20120147483A1
公开(公告)日：2012-06-14
申请号：US13392116
申请日：2011-03-23
IPC分类号： G02B13/04
CPC分类号： G02B13/04 , G02B7/028 , G02B9/60 , G02B13/0045 , G02B13/18
摘要： A wide field optically athermalized orthoscopic lens system includes, in order from object to image, a first lens having a negative power, a second lens having a positive power, a third lens group having a positive power, a fourth lens having a positive power and a fifth lens having a negative power. The third lens group includes two lenses having, in order, a first lens with positive power and a second lens with negative power. The powers, shapes, Abbe dispersion values and temperature coefficients of refractive indices of the lenses are selected such that the lens system is athermalized, orthoscopic and achromatized over a wide (e.g. >140° C.) temperature range.
摘要翻译： 宽场光学无热式化的正射镜透镜系统包括从物体到图像的顺序，具有负光焦度的第一透镜，具有正光焦度的第二透镜，具有正光焦度的第三透镜组，具有正光焦度的第四透镜;以及 具有负功率的第五透镜。 第三透镜组包括依次具有正光焦度的第一透镜和具有负光焦度的第二透镜的两个透镜。 选择透镜的功率，形状，阿贝分散值和折射率的温度系数，使得透镜系统在宽（例如> 140℃）的温度范围内被无热处理，无畸变和消色差。
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公开(公告)号：US08817392B2
公开(公告)日：2014-08-26
申请号：US13392116
申请日：2011-03-23
CPC分类号： G02B13/04 , G02B7/028 , G02B9/60 , G02B13/0045 , G02B13/18
摘要： A wide field optically athermalized orthoscopic lens system includes, in order from object to image, a first lens having a negative power, a second lens having a positive power, a third lens group having a positive power, a fourth lens having a positive power and a fifth lens having a negative power. The third lens group includes two lenses having, in order, a first lens with positive power and a second lens with negative power. The powers, shapes, Abbe dispersion values and temperature coefficients of refractive indices of the lenses are selected such that the lens system is athermalized, orthoscopic and achromatized over a wide (e.g. >140° C.) temperature range.
摘要翻译： 宽场光学无热式化的正射镜透镜系统包括从物体到图像的顺序，具有负光焦度的第一透镜，具有正光焦度的第二透镜，具有正光焦度的第三透镜组，具有正光焦度的第四透镜;以及 具有负功率的第五透镜。 第三透镜组包括依次具有正光焦度的第一透镜和具有负光焦度的第二透镜的两个透镜。 选择透镜的功率，形状，阿贝分散值和折射率的温度系数，使得透镜系统在宽（例如> 140℃）的温度范围内被无热处理，无畸变和消色差。
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公开(公告)号：US20090153954A1
公开(公告)日：2009-06-18
申请号：US12389593
申请日：2009-02-20
申请人： Stanislav SMIRNOV , Mark Oskotsky
发明人： Stanislav SMIRNOV , Mark Oskotsky
CPC分类号： G03B27/54 , G02B17/0812 , G03F7/70225
摘要： The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.
摘要翻译： 本发明涉及用于光刻工具的离轴反射折射投影光学系统，用于处理用于在诸如半导体晶片或平板显示器的基板上形成图像的调制光。 在一个实施例中，光学系统包括离轴镜片段，折叠镜，继电器，孔径光阑和折射透镜组。 调制光通过系统透射以在基底上形成图像。 在第二实施例中，投影系统包括离轴镜片段，孔径光阑和折射透镜组。 在第三实施例中，投影系统包括离轴镜片段，负折射透镜组，凹面镜，继电器，孔径光阑和折射透镜组。 还提供了使用包括具有离轴镜片段的投影系统作为投影光学系统中的第一元素的光刻设备的方法。
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