Method of manufacturing an array substrate for LCD device having double-layered metal structure
    1.
    发明授权
    Method of manufacturing an array substrate for LCD device having double-layered metal structure 有权
    制造具有双层金属结构的LCD装置阵列基板的方法

    公开(公告)号:US07956949B2

    公开(公告)日:2011-06-07

    申请号:US12761174

    申请日:2010-04-15

    IPC分类号: G02F1/136

    摘要: An array substrate in a liquid crystal display device includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation laver; an active layer and an ohmic contact layer; a data line, source and drain electrodes, and a data pad each having a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer formed of a transparent conductive material.

    摘要翻译: 液晶显示装置中的阵列基板包括在基板上的栅电极,栅极线和栅极焊盘,其中栅电极,栅极线和栅极焊盘具有由第一金属层和第二金属层构成的双层结构, 从所述基板串联的第一阻挡金属层,其中所述第一金属是铝和铝合金之一; 门绝缘紫菜; 有源层和欧姆接触层; 数据线,源极和漏极以及数据焊盘,每个数据焊盘具有由第二阻挡金属层和第二金属层构成的双层结构; 钝化层; 以及由透明导电材料形成的钝化层上的像素电极,栅极焊盘端子和数据焊盘端子。

    METHOD OF MANUFACTURING AN ARRAY SUBSTRATE FOR LCD DEVICE HAVING DOUBLE-LAYERED METAL STRUCTURE
    2.
    发明申请
    METHOD OF MANUFACTURING AN ARRAY SUBSTRATE FOR LCD DEVICE HAVING DOUBLE-LAYERED METAL STRUCTURE 有权
    具有双层金属结构的液晶显示装置制造阵列基板的方法

    公开(公告)号:US20100203687A1

    公开(公告)日:2010-08-12

    申请号:US12761174

    申请日:2010-04-15

    IPC分类号: H01L21/86

    摘要: The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.

    摘要翻译: 本发明是一种用于液晶显示装置的阵列基板,其包括在基板上的栅电极,栅极线和栅极焊盘,其中栅电极,栅极线和栅极焊盘具有双层 结构由第一金属层和与基板串联的第一阻挡金属层组成,其中第一金属是铝和铝合金之一; 覆盖栅电极,栅极线和栅极焊盘的基板上的栅极绝缘层; 依次形成在栅极绝缘层上和栅电极上的有源层和欧姆接触层; 垂直于栅极线的栅极绝缘层上的数据线,与欧姆接触层接触的源极和漏极以及栅极绝缘层上的数据焊盘,其中,数据线,源极和漏极以及数据焊盘具有 由第二阻挡金属层和铜的第二金属层组成的双层结构; 形成在所述栅极绝缘层上以覆盖所述数据线,源极和漏极以及数据焊盘的钝化层,其中所述钝化层具有暴露所述漏电极的一部分的漏极接触孔, 栅极焊盘和暴露数据焊盘的一部分的数据焊盘接触孔; 以及钝化层上的像素电极,栅极焊盘端子和数据焊盘端子,所有这些都由钝化层上的透明导电材料形成。

    Array substrate for LCD device having double-layered metal structure and manufacturing method thereof
    3.
    发明申请
    Array substrate for LCD device having double-layered metal structure and manufacturing method thereof 有权
    具有双层金属结构的液晶显示装置用阵列基板及其制造方法

    公开(公告)号:US20080182352A1

    公开(公告)日:2008-07-31

    申请号:US12078048

    申请日:2008-03-26

    IPC分类号: H01L21/70

    摘要: The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.

    摘要翻译: 本发明是一种用于液晶显示装置的阵列基板,其包括在基板上的栅电极,栅极线和栅极焊盘,其中栅电极,栅极线和栅极焊盘具有双层 结构由第一金属层和与基板串联的第一阻挡金属层组成,其中第一金属是铝和铝合金之一; 覆盖栅电极,栅极线和栅极焊盘的基板上的栅极绝缘层; 依次形成在栅极绝缘层上和栅电极上的有源层和欧姆接触层; 垂直于栅极线的栅极绝缘层上的数据线,与欧姆接触层接触的源极和漏极以及栅极绝缘层上的数据焊盘,其中数据线,源极和漏极以及数据焊盘具有 由第二阻挡金属层和铜的第二金属层组成的双层结构; 形成在所述栅极绝缘层上以覆盖所述数据线,源极和漏极以及数据焊盘的钝化层,其中所述钝化层具有暴露所述漏电极的一部分的漏极接触孔, 栅极焊盘和暴露数据焊盘的一部分的数据焊盘接触孔; 以及钝化层上的像素电极,栅极焊盘端子和数据焊盘端子,所有这些都由钝化层上的透明导电材料形成。

    Array substrate for LCD device having double-layered metal structure and manufacturing method thereof
    6.
    发明授权
    Array substrate for LCD device having double-layered metal structure and manufacturing method thereof 有权
    具有双层金属结构的液晶显示装置用阵列基板及其制造方法

    公开(公告)号:US07277138B2

    公开(公告)日:2007-10-02

    申请号:US10878516

    申请日:2004-06-29

    IPC分类号: G02F1/136 H01L69/04

    摘要: An array substrate for a liquid crystal display device includes a gate electrode, a gate line and a gate pad electrode disposed on a substrate, each of the gate electrode, the gate line and the gate pad electrode having a first metal barrier layer, a first copper alloy layer, and a first out-diffusion film, and the first out-diffusion film completely covering, surrounding and contacting entire surfaces of the first copper alloy layer. The array substrate includes a gate insulation layer disposed on the substrate and covering the gate electrode, the gate line and the gate pad electrode. An active layer and an ohmic contact layer are sequentially formed on the gate insulation layer and over the gate electrode. A data line is formed on the gate insulation layer and perpendicularly crosses the gate line. A source electrode and a drain electrode contact the ohmic contact layer.

    摘要翻译: 用于液晶显示装置的阵列基板包括栅电极,栅极线和设置在基板上的栅极焊盘电极,栅极电极,栅极线和栅极焊盘电极中的每一个具有第一金属阻挡层,第一 铜合金层和第一外扩散膜,第一外扩散膜完全覆盖,包围并接触第一铜合金层的整个表面。 阵列基板包括设置在基板上并覆盖栅极,栅极线和栅极焊盘电极的栅极绝缘层。 有源层和欧姆接触层依次形成在栅极绝缘层上和栅电极上。 数据线形成在栅极绝缘层上并垂直于栅极线。 源电极和漏极接触欧姆接触层。

    METHOD OF MANUFACTURING AN ARRAY SUBSTRATE FOR LCD DEVICE HAVING DOUBLE-LAYERED METAL STRUCTURE
    7.
    发明申请
    METHOD OF MANUFACTURING AN ARRAY SUBSTRATE FOR LCD DEVICE HAVING DOUBLE-LAYERED METAL STRUCTURE 有权
    具有双层金属结构的液晶显示装置制造阵列基板的方法

    公开(公告)号:US20110212557A1

    公开(公告)日:2011-09-01

    申请号:US13100883

    申请日:2011-05-04

    IPC分类号: H01L33/62

    摘要: The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.

    摘要翻译: 本发明是一种用于液晶显示装置的阵列基板,其包括在基板上的栅电极,栅极线和栅极焊盘,其中栅电极,栅极线和栅极焊盘具有双层 结构由第一金属层和与基板串联的第一阻挡金属层组成,其中第一金属是铝和铝合金之一; 覆盖栅电极,栅极线和栅极焊盘的基板上的栅极绝缘层; 依次形成在栅极绝缘层上和栅电极上的有源层和欧姆接触层; 垂直于栅极线的栅极绝缘层上的数据线,与欧姆接触层接触的源极和漏极以及栅极绝缘层上的数据焊盘,其中数据线,源极和漏极以及数据焊盘具有 由第二阻挡金属层和铜的第二金属层组成的双层结构; 形成在所述栅极绝缘层上以覆盖所述数据线,源极和漏极以及数据焊盘的钝化层,其中所述钝化层具有暴露所述漏电极的一部分的漏极接触孔, 栅极焊盘和暴露数据焊盘的一部分的数据焊盘接触孔; 以及钝化层上的像素电极,栅极焊盘端子和数据焊盘端子,所有这些都由钝化层上的透明导电材料形成。

    Array substrate for LCD device having double-layered metal structure and manufacturing method thereof
    8.
    发明授权
    Array substrate for LCD device having double-layered metal structure and manufacturing method thereof 有权
    具有双层金属结构的液晶显示装置用阵列基板及其制造方法

    公开(公告)号:US07605877B2

    公开(公告)日:2009-10-20

    申请号:US10875559

    申请日:2004-06-25

    IPC分类号: G02F1/136

    摘要: The present invention is an array substrate for use in a liquid crystal display device, which includes a gate electrode, a gate line and a gate pad on a substrate, wherein the gate electrode, the gate line and the gate pad have a double-layered structure consisting of a first metal layer and a first barrier metal layer in series from the substrate, and wherein the first metal is one of aluminum and aluminum alloy; a gate insulation layer on the substrate covering the gate electrode, gate line and gate pad; an active layer and an ohmic contact layer sequentially formed on the gate insulation layer and over the gate electrode; a data line on the gate insulation layer perpendicularly crossing the gate line, source and drain electrodes contacting the ohmic contact layer, and a data pad on the gate insulation layer, wherein the data line, the source and drain electrode and the data pad have a double-layered structure consisting of a second barrier metal layer and a second metal layer of copper; a passivation layer formed on the gate insulation layer to cover the data line, source and drain electrodes, and data pad, wherein the passivation layer has a drain contact hole exposing a portion of the drain electrode, a gate pad contact hole exposing a portion of the gate pad, and a data pad contact hole exposing a portion of the data pad; and a pixel electrode, a gate pad terminal and a data pad terminal on the passivation layer, all of which are formed of a transparent conductive material on the passivation layer.

    摘要翻译: 本发明是一种用于液晶显示装置的阵列基板,其包括在基板上的栅电极,栅极线和栅极焊盘,其中栅电极,栅极线和栅极焊盘具有双层 结构由第一金属层和与基板串联的第一阻挡金属层组成,其中第一金属是铝和铝合金之一; 覆盖栅电极,栅极线和栅极焊盘的基板上的栅极绝缘层; 依次形成在栅极绝缘层上和栅电极上的有源层和欧姆接触层; 垂直于栅极线的栅极绝缘层上的数据线,与欧姆接触层接触的源极和漏极以及栅极绝缘层上的数据焊盘,其中数据线,源极和漏极以及数据焊盘具有 由第二阻挡金属层和铜的第二金属层组成的双层结构; 形成在所述栅极绝缘层上以覆盖所述数据线,源极和漏极以及数据焊盘的钝化层,其中所述钝化层具有暴露所述漏电极的一部分的漏极接触孔, 栅极焊盘和暴露数据焊盘的一部分的数据焊盘接触孔; 以及钝化层上的像素电极,栅极焊盘端子和数据焊盘端子,所有这些都由钝化层上的透明导电材料形成。

    Method of manufacturing an array substrate for LCD device having doubled-layered metal structure
    10.
    发明授权
    Method of manufacturing an array substrate for LCD device having doubled-layered metal structure 有权
    制造具有双层金属结构的LCD器件用阵列基板的方法

    公开(公告)号:US08432503B2

    公开(公告)日:2013-04-30

    申请号:US13100883

    申请日:2011-05-04

    IPC分类号: G02F1/136

    摘要: A method of forming an array substrate for a LCD device includes patterning a first metal layer and a first barrier metal layer to form a gate electrode, a gate line and a gate pad; forming a gate insulation layer to cover the gate electrode, line and pad; forming an active layer, an ohmic contact layer, a second barrier metal layer and a second metal layer including a copper (Cu) layer on the gate insulation layer; patterning the second metal layer and the second barrier metal layer by a first etching process; patterning an exposed portion of the second metal layer and the second barrier metal layer and ohmic contact layer to form source and drain electrodes each having a double layered structure of the second barrier metal layer and the second metal layer; and forming a pixel electrode on a passivation layer formed on the source and drain electrodes.

    摘要翻译: 形成LCD器件的阵列基板的方法包括:图案化第一金属层和第一势垒金属层以形成栅电极,栅极线和栅极焊盘; 形成栅极绝缘层以覆盖栅电极,线和焊盘; 在所述栅极绝缘层上形成有源层,欧姆接触层,第二阻挡金属层和包含铜(Cu)层的第二金属层; 通过第一蚀刻工艺图案化第二金属层和第二阻挡金属层; 图案化第二金属层和第二阻挡金属层和欧姆接触层的暴露部分,以形成各自具有第二阻挡金属层和第二金属层的双层结构的源极和漏极; 以及在形成在源极和漏极上的钝化层上形成像素电极。