公开(公告)号：US08793638B2

公开(公告)日：2014-07-29

申请号：US13559081

申请日：2012-07-26

申请人： Keuing Hui ,  Yen-Wei Cheng ,  Yen-Di Tsen ,  Jong-I Mou ,  Chin-Hsiang Lin

发明人： Keuing Hui ,  Yen-Wei Cheng ,  Yen-Di Tsen ,  Jong-I Mou ,  Chin-Hsiang Lin

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G06F2217/12 ,  Y02P90/265

摘要： The present disclosure describes a method of optimizing a design for manufacture (DFM) simulation. The method includes receiving an integrated circuit (IC) design data having a feature, receiving a process data having a parameter or a plurality of parameters, performing the DFM simulation, and optimizing the DFM simulation. The performing the DFM simulation includes generating a simulation output data using the IC design data and the process data. The optimizing the DFM simulation includes generating a performance index of the parameter or the plurality of parameters by the DFM simulation. The optimizing the DFM simulation includes adjusting the parameter or the plurality of parameters at outer loop, middle loop, and the inner loop. The optimizing the DFM simulation also includes locating a nadir of the performance index of the parameter or the plurality of parameters over a range of the parameter or the plurality of parameters.

摘要翻译： 本公开描述了优化用于制造（DFM）仿真的设计的方法。 该方法包括接收具有特征的集成电路（IC）设计数据，接收具有参数或多个参数的处理数据，执行DFM仿真和优化DFM仿真。 执行DFM模拟包括使用IC设计数据和过程数据生成模拟输出数据。 优化DFM模拟包括通过DFM仿真生成参数或多个参数的性能指标。 优化DFM模拟包括调整外循环，中间循环和内循环的参数或多个参数。 优化DFM模拟还包括在参数或多个参数的范围内定位参数或多个参数的性能指标的最低点。

公开(公告)号：US08394719B2

公开(公告)日：2013-03-12

申请号：US13106711

申请日：2011-05-12

申请人： Andy Tsen ,  Jin-Ning Sung ,  Po-Feng Tsai ,  Jong-I Mou ,  Yen-Wei Cheng

发明人： Andy Tsen ,  Jin-Ning Sung ,  Po-Feng Tsai ,  Jong-I Mou ,  Yen-Wei Cheng

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L22/20 ,  G05B19/41875 ,  H01L22/12 ,  Y02P90/22 ,  Y02P90/26

摘要： System and method for implementing multi-resolution advanced process control (“APC”) are described. One embodiment is a method including obtaining low resolution metrology data and high resolution metrology data related to a process module for performing a process on the wafer. A process variable of the process is modeled as a function of the low resolution metrology data to generate a low-resolution process model and the process variable is modeled as a function of the high resolution metrology data to generate a high-resolution process model. The method further includes calibrating the low resolution process model; combining the calibrated low resolution process model with the high resolution process model to generate a multi-resolution process model that models the process variable as a function of both the low resolution metrology data and the high resolution metrology data; and analyzing a response of the multi-resolution process model and the low and high resolution metrology data to control performance of a process module.

摘要翻译： 描述了实现多分辨率高级过程控制（APC）的系统和方法。 一个实施例是一种方法，包括获得与用于在晶片上执行处理的处理模块相关的低分辨率度量数据和高分辨率度量数据。 该过程的过程变量被模型化为低分辨率度量数据的函数，以生成低分辨率过程模型，并且将过程变量建模为高分辨率度量数据的函数以生成高分辨率过程模型。 该方法还包括校准低分辨率过程模型; 将校准的低分辨率过程模型与高分辨率过程模型相结合，以生成多分辨率过程模型，其将过程变量建模为低分辨率度量数据和高分辨率度量数据的函数; 并分析多分辨率过程模型和低分辨率和高分辨率度量数据的响应，以控制过程模块的性能。

公开(公告)号：US20140033159A1

公开(公告)日：2014-01-30

申请号：US13559081

申请日：2012-07-26

申请人： Keuing Hui ,  Yen-Wei Cheng ,  Yen-Di Tsen ,  Jong-I Mou ,  Chin-Hsiang Lin

发明人： Keuing Hui ,  Yen-Wei Cheng ,  Yen-Di Tsen ,  Jong-I Mou ,  Chin-Hsiang Lin

IPC分类号： G06F17/50

CPC分类号： G06F17/5068 ,  G06F2217/12 ,  Y02P90/265

摘要： The present disclosure describes a method of optimizing a design for manufacture (DFM) simulation. The method includes receiving an integrated circuit (IC) design data having a feature, receiving a process data having a parameter or a plurality of parameters, performing the DFM simulation, and optimizing the DFM simulation. The performing the DFM simulation includes generating a simulation output data using the IC design data and the process data. The optimizing the DFM simulation includes generating a performance index of the parameter or the plurality of parameters by the DFM simulation. The optimizing the DFM simulation includes adjusting the parameter or the plurality of parameters at outer loop, middle loop, and the inner loop. The optimizing the DFM simulation also includes locating a nadir of the performance index of the parameter or the plurality of parameters over a range of the parameter or the plurality of parameters.

摘要翻译： 本公开描述了优化用于制造（DFM）仿真的设计的方法。 该方法包括接收具有特征的集成电路（IC）设计数据，接收具有参数或多个参数的处理数据，执行DFM仿真和优化DFM仿真。 执行DFM模拟包括使用IC设计数据和过程数据生成模拟输出数据。 优化DFM模拟包括通过DFM仿真生成参数或多个参数的性能指标。 优化DFM模拟包括调整外循环，中间循环和内循环的参数或多个参数。 优化DFM模拟还包括在参数或多个参数的范围内定位参数或多个参数的性能指标的最低点。

公开(公告)号：US20110213478A1

公开(公告)日：2011-09-01

申请号：US13106711

申请日：2011-05-12

申请人： Andy Tsen ,  Jin-Ning Sung ,  Po-Feng Tsai ,  Jong-l Mou ,  Yen-Wei Cheng

发明人： Andy Tsen ,  Jin-Ning Sung ,  Po-Feng Tsai ,  Jong-l Mou ,  Yen-Wei Cheng

IPC分类号： G06F17/00

CPC分类号： H01L22/20 ,  G05B19/41875 ,  H01L22/12 ,  Y02P90/22 ,  Y02P90/26

摘要： System and method for implementing multi-resolution advanced process control (“APC”) are described. One embodiment is a method comprising obtaining low resolution metrology data and high resolution metrology data related to a process module for performing a process on the wafer; modeling a process variable of the process as a function of the low resolution metrology data to generate a low-resolution process model; and modeling the process variable as a function of the high resolution metrology data to generate a high-resolution process model. The method further includes calibrating the low resolution process model; combining the calibrated low resolution process model with the high resolution process model to generate a multi-resolution process model that models the process variable as a function of both the low resolution metrology data and the high resolution metrology data; and analyzing a response of the multi-resolution process model and the low and high resolution metrology data to control performance of a process module.

摘要翻译： 描述了用于实现多分辨率高级过程控制（“APC”）的系统和方法。 一个实施例是一种方法，包括获得与用于在晶片上执行处理的处理模块相关的低分辨率度量数据和高分辨率度量数据; 将过程的过程变量建模为低分辨率度量数据的函数，以生成低分辨率过程模型; 并将过程变量建模为高分辨率度量数据的函数，以生成高分辨率过程模型。 该方法还包括校准低分辨率过程模型; 将校准的低分辨率过程模型与高分辨率过程模型相结合，以生成多分辨率过程模型，其将过程变量建模为低分辨率度量数据和高分辨率度量数据的函数; 并分析多分辨率过程模型和低分辨率和高分辨率度量数据的响应，以控制过程模块的性能。