摘要:
Provided are a unit pixel, an image sensor including the same, a portable electronic device including the same, and a method of manufacturing the same. The method of manufacturing includes: forming a photoelectric conversion region in a substrate; forming, in the substrate, a first floating diffusion region spaced apart from the photoelectric conversion region of the substrate, and a second floating diffusion region spaced apart from the first floating diffusion region; forming a first recess spaced apart from the first floating diffusion region and the second floating diffusion region by removing a portion of the substrate from a first surface of the substrate; filling the first recess to form a dual conversion gain (DCG) gate that extends perpendicularly or substantially perpendicularly from the first surface of the substrate; and forming a conductive layer to fill an inside of the first recess.
摘要:
An apparatus and method for reducing power consumption in a mobile communication system are provided. The apparatus includes a time slicing processor. When a frame border of the last section for determining a burst reception end time is not detected during a burst reception operation, the time slicing processor receives a burst enough to restore the whole MPE-FEC frame to the former state or receives an early burst reception end request for notifying that it is impossible to restore the whole MPE-FEC frame to the former state, and terminates the burst reception process.
摘要:
A semiconductor device fabrication method includes the steps of forming a first insulation layer and a first semiconductor layer sequentially on a semiconductor substrate having a buried diffusion region therein. A second insulation layer is formed on the first semiconductor layer. The first insulation layer, the first semiconductor layer, and the second insulation layer are then patterned to create openings that expose the buried diffusion region. A third insulation layer is formed on respective side walls of the openings on the exposed portions of the first semiconductor layer, first insulation layer and second insulation layer that form the openings. A first epitaxial layer is formed on the semiconductor substrate exposed through the openings. A second epitaxial layer is then formed on the first epitaxial layer to be connected to the first semiconductor layer, thereby forming an active base region and a second conductive type collector region in the second epitaxial layer of the first and second openings. A second semiconductor layer is then formed over the entire structure. Portions of the second semiconductor layer are oxidized using an oxidation mask, to form insulator portions. An emitter electrode, a base electrode and a collector electrode are formed on the portions of the second semiconductor layer that correspond to the emitter region, the base region and the collector region. The portions of the second semiconductor layer that are not oxidized form contact plugs that connect the first semiconductor layer and the electrodes.
摘要:
The present invention relates to an integrated viterbi decoder with improved test function. The viterbi decoder recovers original symbol and data bits from convolutional binary symbol stream, reducing a noise and data loss originated from a channel fading. For enhancing the test function of the viterbi decoder, the viterbi decoder of the present invention stores predetermined test control signals in a test register. During a test, the test control signals are synchronized with a test clock apart from a frame synchronous signal of the viterbi decoder. The test time of the viterbi decoder, thus, is not restricted by the frame synchronous signal. As a result, the test time of the viterbi decoder can be reduced without addition of an external pin.
摘要:
A semiconductor device is disclosed, in which a capacitor lower electrode is formed of doped polysilicon and a capacitor upper electrode is formed of metal material to improve voltage coefficient characteristic. The semiconductor device includes a semiconductor substrate in which an active region and a field region are defined, a gate electrode and source and drain regions formed in the active region of the semiconductor substrate, a field oxide film formed in the field region of the semiconductor substrate, a capacitor lower electrode and a resistor formed of a doped polysilicon on the field oxide film, a capacitor dielectric film formed in a predetermined region on the capacitor lower electrode, and a capacitor upper electrode formed of metal material on the capacitor dielectric film.
摘要:
A method for fabricating a bipolar transistor improves the fast characteristics of the transistor at low operating voltages. An oxide film is formed on a semiconductor substrate, in which a buried layer is formed, and a floating poly base is formed on the oxide film. An insulating film is then formed on the entire surface of the semiconductor substrate including the floating poly base. The insulating film and the floating poly base are etched to define a base region and a collector region, and a first epitaxial layer is formed in the base and collector regions, with the first epitaxial layer having a smaller thickness than the oxide film. A second epitaxial layer is formed on the first epitaxial layer, and impurities are implanted into the second epitaxial layer in the base and collector regions. A second polysilicon layer is then formed on the second epitaxial layer in the base region, and electrodes are formed on the semiconductor surface.
摘要:
A method for fabricating a semiconductor device having a base electrode, an emitter electrode, and a collector electrode, includes the steps of: forming first, second, and buried layers in a semiconductor substrate; forming first, second, and third epitaxial layers using the respective buried layers as seeds; forming an isolation region between the first and second epitaxial layers; forming first, second, and third impurity regions connected to the respective buried layers through the respective epitaxial layers; forming fourth, fifth, and sixth impurity regions in the respective epitaxial layers; forming polysilicon layers on the respective epitaxial layers, respectively; defining first, second, and third emitter electrode regions as well as first, second, and third base contact regions; etching portions of the polysilicon layers excluding the emitter electrode regions and the base contact regions down to a predetermined depth; oxidizing the etched portions of the polysilicon layer to grow an oxide layer; implanting N-type impurity ions into the polysilicon layer of the first and second base contact regions and the third emitter electrode region, and P-type ions into the first and second emitter regions and the third base contact region; depositing a metal on the exposed surfaces; and patterning the metal to be in contact with the respective polysilicon layers.
摘要:
A refrigerant expansion device for a refrigeration cycle comprises a housing, a passage formed penetrating the housing, an expansion means for expanding the refrigerant passing through the passage and a flow rate control means for bypassing some of the refrigerant passing through the expansion means according to the pressure of the refrigerant, for supplying to the low pressure portion of the passage, and for controlling the flow rate of the refrigerant through the expansion means.
摘要:
The present invention provides methods for producing cell populations enriched for stable, regulatory T cells (Tregs). In particular, the invention relates to methods for culturing T cells such that the final culture is enriched for stable, regulatory T cells. It also relates to methods for stabilizing regulatory T cells. Also provided are compositions enriched for stable, regulatory T cells, which are useful for treating individuals in need of such treatment. The methods and compositions disclosed herein can also be used to treat an individual suffering from an immune-mediated disease.