-
公开(公告)号:US4707417A
公开(公告)日:1987-11-17
申请号:US755675
申请日:1985-07-16
申请人: Masatoshi Hayakawa , Koichi Aso , Yoshitaka Ochiai , Hideki Matsuda , Kazuhiko Hayashi , Wataru Ishikawa , You Iwasaki
发明人: Masatoshi Hayakawa , Koichi Aso , Yoshitaka Ochiai , Hideki Matsuda , Kazuhiko Hayashi , Wataru Ishikawa , You Iwasaki
CPC分类号: B82Y25/00 , G11B5/31 , H01F10/142 , H01F10/32 , Y10S428/928 , Y10T428/115 , Y10T428/12465 , Y10T428/12597 , Y10T428/12931 , Y10T428/12937 , Y10T428/12944 , Y10T428/12951 , Y10T428/12958
摘要: A magnetic alloy thin film consisting essentially of a first Fe-Al-Si or Fe-Ni alloy thin film of high permeability and a second Fe-Si alloy thin film directly formed on the first thin film and having high saturation magnetic flux density. The ratio in thickness of the first and second films is preferably in the range of from 1:0.1 to 2.
摘要翻译: 一种磁性合金薄膜,其基本上由高磁导率的第一Fe-Al-Si或Fe-Ni合金薄膜和直接形成在第一薄膜上并具有高饱和磁通密度的第二Fe-Si合金薄膜组成。 第一和第二膜的厚度比优选在1:0.1至2的范围内。
-
2.
公开(公告)号:US4640871A
公开(公告)日:1987-02-03
申请号:US773019
申请日:1985-09-06
申请人: Kazuhiko Hayashi , Yoshitaka Ochiai , Masatoshi Hayakawa , Hideki Matsuda , Wataru Ishikawa , You Iwasaki , Koichi Aso
发明人: Kazuhiko Hayashi , Yoshitaka Ochiai , Masatoshi Hayakawa , Hideki Matsuda , Wataru Ishikawa , You Iwasaki , Koichi Aso
CPC分类号: H01F1/18 , Y10S428/928 , Y10T428/1129 , Y10T428/12465 , Y10T428/12597 , Y10T428/12632 , Y10T428/12861
摘要: A magnetic structure having improved permeability characteristics at very high frequencies and comprising a plurality of magnetic metal layers, together with electrically insulating layers which are interposed between successive magnetic metal layers to form a laminate therewith, and at least one conductive strip electrically connecting together at least two of the magnetic metal layers, the conductive strip being of lesser width than the surface on which it is located, and serving to reduce eddy current losses.
摘要翻译: 一种具有在非常高频率下具有改进的磁导率特性并包括多个磁性金属层的磁性结构,以及介于连续磁性金属层之间的电绝缘层以形成层压体,以及至少一个导电带,至少电连接在一起 两个磁性金属层,导电条的宽度小于其所在的表面,并且用于减少涡流损耗。
-
公开(公告)号:US4748000A
公开(公告)日:1988-05-31
申请号:US850108
申请日:1986-04-10
申请人: Kazuhiko Hayashi , Masatoshi Hayakawa , Yoshitaka Ochiai , Hideki Matsuda , Wataru Ishikawa , You Iwasaki , Kouichi Aso
发明人: Kazuhiko Hayashi , Masatoshi Hayakawa , Yoshitaka Ochiai , Hideki Matsuda , Wataru Ishikawa , You Iwasaki , Kouichi Aso
CPC分类号: H01F10/16 , H01F10/142
摘要: Disclosed is a soft magnetic thin film which has superior soft magnetic characteristics and high saturation magnetic flux density. The magnetic thin film is formed by physical vapor deposition process and composed of Fe, Ga, and Si with optional inclusion of Co, Ru, or Cr.
摘要翻译: 公开了具有优异的软磁特性和高饱和磁通密度的软磁薄膜。 磁性薄膜通过物理气相沉积法形成,由Fe,Ga和Si组成,可选地包含Co,Ru或Cr。
-
-