公开(公告)号：US07978310B2

公开(公告)日：2011-07-12

申请号：US12719455

申请日：2010-03-08

申请人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

发明人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70341

摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25

摘要翻译： 一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。 在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于1.1的液体（Lm1） 并且在透光构件的侧面（41,42）上形成用于遮蔽光通过的遮光膜（36）。 当D是第二表面和遮光膜之间的空间时，Θ是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

公开(公告)号：US07710653B2

公开(公告)日：2010-05-04

申请号：US11645041

申请日：2006-12-26

申请人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

发明人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

IPC分类号： G02B27/10

CPC分类号： G03F7/70341

摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25

摘要翻译： 一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。 在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于1.1的液体（Lm1） 并且在透光构件的侧面（41,42）上形成用于遮蔽光通过的遮光膜（36）。 当D是第二表面和遮光膜之间的空间时，Θ是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

公开(公告)号：US20070188879A1

公开(公告)日：2007-08-16

申请号：US11645041

申请日：2006-12-26

申请人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

发明人： Hironori Ikezawa ,  Yuji Kudo ,  Yasuhiro Omura

IPC分类号： G02B3/00

CPC分类号： G03F7/70341

摘要： A liquid immersion type projection optical system that can stably prevent the outflow of immersion liquid into inside of an optical system and can maintain good imaging performance. In the projection optical system of the present invention, an optical path between a light transmitting member (Lp) disposed closest to a second surface (W) side and the second surface is filled with a liquid (Lm1) having a refractive index greater than 1.1, and a light shielding film (36) for shielding the passing of light is formed on the side surfaces (41, 42) of the light transmitting member. When D is a space between the second surface and the light shielding film, Θ is a maximum incident angle of an image forming beam which reaches the second surface, and Ym is a maximum image height on the second surface, the condition of 0.25

摘要翻译： 一种液浸型投影光学系统，其可以稳定地防止浸没液体流入光学系统内部并且可以保持良好的成像性能。 在本发明的投影光学系统中，在最靠近第二表面（W）侧设置的透光构件（Lp）和第二表面之间的光路填充有折射率大于 在光透射部件的侧面（41,42）上形成用于遮蔽光的遮光膜（36）。 当D是第二表面和遮光膜之间的空间时，Theta是到达第二表面的图像形成光束的最大入射角，Ym是第二表面上的最大图像高度，条件为0.25

公开(公告)号：US06848409B2

公开(公告)日：2005-02-01

申请号：US10855339

申请日：2004-05-28

申请人： Yuji Kudo ,  Masahiro Murata

发明人： Yuji Kudo ,  Masahiro Murata

IPC分类号： F02M35/02 ,  F02M35/04 ,  F02M35/10 ,  F02M35/16

CPC分类号： F02M35/10144 ,  F02M35/0203 ,  F02M35/04 ,  F02M35/10072 ,  F02M35/112 ,  F02M35/161

摘要： An intake system for an internal combustion engine includes an intake manifold adapted to be attached to a side wall of the engine, and an air cleaner for supplying intake air to the intake manifold. The air cleaner is disposed opposite to the side wall of the engine while interposing therebetween the intake manifold. The air cleaner has an air cleaner main body joined with the intake manifold to constitute a single unit. The air cleaner main body is made of a material lower in the strength than a material which the intake manifold is made of.

摘要翻译： 用于内燃机的进气系统包括适于附接到发动机的侧壁的进气歧管和用于向进气歧管供应进气的空气滤清器。 空气滤清器与发动机的侧壁相对设置，同时插入进气歧管。 空气滤清器具有与进气歧管连接的空气滤清器主体，构成单个单元。 空气滤清器主体由比进气歧管制成的材料低的强度材料制成。

公开(公告)号：US06100961A

公开(公告)日：2000-08-08

申请号：US246852

申请日：1999-02-09

申请人： Naomasa Shiraishi ,  Yuji Kudo

发明人： Naomasa Shiraishi ,  Yuji Kudo

IPC分类号： G03F7/20 ,  F21V7/04 ,  G03B27/54

CPC分类号： G03F7/70075 ,  G03F7/70108 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection exposure apparatus including an irradiation optical system including a light source and irradiating a mask with irradiation light beams, a projection optical system for projecting an image of a pattern of the mask on a substrate, a plurality of first fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed surface with respect to the pattern of the mask in the irradiation optical system or on a plane adjacent to the same and having a center located at a plurality of positions which are eccentric from the optical axis of the irradiation optical system, a plurality of second fly-eye type optical integrators each having an emission side focal plane disposed on a Fourier transformed plane with respect to the incidental end of each of a plurality of the first fly-eye type optical integrators or on a plane adjacent to the same and being disposed to correspond to a plurality of the first fly-eye type optical integrators, and a light divider for dividing and causing the irradiation light beams from the light source to be incident on each of a plurality of the second fly-eye type optical integrators.

摘要翻译： 一种投射曝光装置，包括：包含光源的照射光学系统和照射光束照射掩模;投影光学系统，用于将掩模图案的图像投影在基板上;多个第一飞眼型光学积分器 每个具有相对于照射光学系统中的掩模的图案或与其相邻的平面设置在傅立叶变换表面上的发射侧焦平面，并且具有位于与光学偏心的多个位置的中心 照射光学系统的轴线，多个第二飞眼型光学积分器，其各自具有相对于多个第一飞眼型光学积分器中的每一个的附带端设置在傅立叶变换平面上的发射侧焦平面 或者在与其相邻的平面上并且被设置为对应于多个第一飞眼型光学积分器，并且li 用于分割和使来自光源的照射光束入射到多个第二飞眼型光学积分器中的每一个上。

公开(公告)号：US5745294A

公开(公告)日：1998-04-28

申请号：US609180

申请日：1996-03-01

申请人： Yuji Kudo

发明人： Yuji Kudo

IPC分类号： G03B27/32 ,  F21S8/00 ,  F21V13/04 ,  G02B27/30 ,  G03B27/54 ,  G03F7/20 ,  H01L21/027 ,  G02B27/10 ,  F21V29/00 ,  F21V7/00

CPC分类号： G03F7/70058 ,  F21V13/04 ,  G02B27/30 ,  G03F7/70091 ,  G03F7/701 ,  F21W2131/402

摘要： An illuminating optical apparatus comprises a light source providing a light beam; a rotationally symmetrical mirror having an aperture of a predetermined shape; a collimating optical system for converting the light beam, coming from the light source and condensed by the rotationally symmetrical mirror, into a substantially parallel light beam; a multiple light source forming device for forming plural secondary light sources by said substantially parallel light beam; and a condenser optical system for condensing the light beam from the multiple light source forming device, thereby uniformly illuminating an object of illumination. The collimating optical system is adapted to form an image of the reflecting surface of the rotationally symmetrical mirror on a predetermined plane of the multiple light source forming device.

摘要翻译： 照明光学装置包括提供光束的光源; 具有预定形状的孔的旋转对称的反射镜; 用于将来自光源并由旋转对称反射镜聚光的光束转换成基本上平行的光束的准直光学系统; 用于通过所述基本上平行的光束形成多个二次光源的多光源形成装置; 以及用于聚集来自多个光源形成装置的光束的聚光光学系统，从而均匀地照射照明对象。 准直光学系统适于在多光源形成装置的预定平面上形成旋转对称反射镜的反射表面的图像。

公开(公告)号：US5300971A

公开(公告)日：1994-04-05

申请号：US8547

申请日：1993-01-25

申请人： Yuji Kudo

发明人： Yuji Kudo

IPC分类号： G02B19/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  G03B27/54 ,  G03B27/42

CPC分类号： G03F7/70108

摘要： A projection exposure apparatus is provided with a light source generating pulsed light, a rotary deflecting prism for deviating the light beam from the light source, fly's eye lenses for forming surface light sources in succession by thus deviated light beam, and a condenser lens for condensing the light from the fly's eye lens for illuminating the reticle. The pulsed light from the light source is alternately introduced into the fly's eye lenses by every pulse or by every plural number of pulses.

摘要翻译： 投影曝光装置设置有产生脉冲光的光源，用于偏离来自光源的光束的旋转偏转棱镜，用于通过偏离光束连续形成表面光源的飞眼透镜，以及用于冷凝的聚光透镜 来自飞眼镜片的光用于照射掩模版。 来自光源的脉冲光通过每个脉冲或每多个脉冲被交替地引入飞眼镜片。

公开(公告)号：US5237367A

公开(公告)日：1993-08-17

申请号：US811665

申请日：1991-12-23

申请人： Yuji Kudo

发明人： Yuji Kudo

IPC分类号： G02B27/10 ,  G02B6/04 ,  G03F7/20 ,  H01L21/027

CPC分类号： G02B3/0056 ,  G02B3/0062 ,  G03F7/70075 ,  G03F7/70183

摘要： An illuminating optical system comprises parallel light beam generating means for providing a parallel light beam, a first optical integrator for substantially forming a first planar light source by the light beam coming from the parallel light beam generating means, a first condensing optical system for condensing the light beam from the first planar light source, a second optical integrator for substantially forming a second planar light source by the light beam condensed by the first condensing optical system, and a second condensing optical system for illuminating an illuminated plane in overlapping manner by condensing the light beam from the second planar light source formed by the second optical integrator.At least either of the first optical integrator and the first condensing optical system has a variable focal length, and the size of the second planar light source is rendered variable while the size of the illuminated area is maintained constant, through a change in the focal length.

摘要翻译： 一种照明光学系统，包括用于提供平行光束的平行光束产生装置，用于通过来自平行光束产生装置的光束基本上形成第一平面光源的第一光学积分器，用于冷凝 来自第一平面光源的光束，用于通过由第一聚光光学系统聚光的光束基本上形成第二平面光源的第二光学积分器，以及用于通过冷凝来重叠地照亮照明平面的第二聚光光学系统 来自由第二光学积分器形成的第二平面光源的光束。 第一光学积分器和第一聚光光学系统中的至少一个具有可变的焦距，并且通过焦距的变化使第二平面光源的尺寸可变，同时照明区域的尺寸保持恒定 。

公开(公告)号：US08334977B2

公开(公告)日：2012-12-18

申请号：US13067101

申请日：2011-05-09

申请人： Kazuhiko Fukazawa ,  Yuji Kudo

发明人： Kazuhiko Fukazawa ,  Yuji Kudo

IPC分类号： G01J4/00

CPC分类号： G01J4/00 ,  G01N21/21 ,  G01N21/95607

摘要： In an evaluation device an analyzer is rotated so that the azimuth of the transmission axis of the analyzer has an inclination angle of 90 degrees±3 degrees with respect to the transmission axis of a polarizer. An imaging camera captures a regularly reflected image of a wafer under each condition, and an image processing unit evaluates the shape of a repeating pattern and detects dose defects and focus defects on the basis of the two images of the wafer captured by the imaging camera.

摘要翻译： 在评价装置中，旋转分析器，使得分析器的透射轴的方位角相对于偏振器的透射轴具有90度±3度的倾斜角。 成像摄像机在每个条件下捕获晶片的规则反射图像，并且图像处理单元评估重复图案的形状，并且基于由成像照相机捕获的晶片的两个图像来检测剂量缺陷和聚焦缺陷。

公开(公告)号：US20080123086A1

公开(公告)日：2008-05-29

申请号：US11662066

申请日：2005-09-08

申请人： Yuji Kudo ,  Takeshi Iwasaki

发明人： Yuji Kudo ,  Takeshi Iwasaki

IPC分类号： G01B9/00

CPC分类号： G03F7/70591 ,  G02B13/143

摘要： A projection optical system provided with at least one of optical members made of a calcium fluoride single crystal, wherein each of the optical members satisfies at least any one of the following conditions of (i) to (iii): (i) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 50 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.35 nm/cm; (ii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 100 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.45 nm/cm; and (iii) an RMS value of a spatial frequency component having a number of periods fPD in partial diameter in a range from 10 periods to 150 periods inclusive out of fluctuation of a transmission wavefront relative to light having a wavelength of 633 nm is equal to or below 0.50 nm/cm.

摘要翻译： 一种设置有由氟化钙单晶制成的光学部件中的至少一个的投影光学系统，其中每个光学部件满足（i）至（iii）的以下条件中的至少一个：（i）RMS值 在相对于具有波长为633nm的光的发射波阵面的波动的范围内，在10个周期到50个周期的范围内具有部分直径的周期数f PD的空间频率分量相等 至或低于0.35nm / cm; （ii）具有从10个周期到100个周期的范围内的部分直径的周期数f PD的空间频率分量的RMS值，包括发射波阵面的波动相对于具有 633nm的波长等于或低于0.45nm / cm; 以及（iii）具有从10个周期到150个周期的范围内部分直径的多个周期f SUB PD的空间频率分量的RMS值，包括发射波阵面相对于具有 633nm的波长等于或小于0.50nm / cm。