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66 条记录 (耗时 0.047 秒)

    Light exposure apparatus
    7.
    发明授权
    Light exposure apparatus 失效
    在照明区域中曝光光的强度分布变化的扫描曝光装置和方法。

    公开(公告)号：US06713747B2

    公开(公告)日：2004-03-30

    申请号：US10207832

    申请日：2002-07-31

    申请人： Akikazu Tanimoto

    发明人： Akikazu Tanimoto

    IPC分类号： G01J132

    CPC分类号： G03F7/70058 ,  G03F7/70358 ,  G03F7/70558

    摘要： A scanning exposure apparatus and method uses an optical member to change an intensity distribution of exposure light in an illumination region.

    摘要翻译： 扫描曝光装置和方法使用光学部件来改变照明区域中的曝光光的强度分布。

    Alignment method and exposure apparatus for use in such alignment method
    8.
    发明授权
    Alignment method and exposure apparatus for use in such alignment method 失效
    对准方法和用于这种对准方法的曝光装置

    公开(公告)号：US5906901A

    公开(公告)日：1999-05-25

    申请号：US580886

    申请日：1995-12-29

    申请人： Akikazu Tanimoto

    发明人： Akikazu Tanimoto

    IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

    CPC分类号： G03F7/70425 ,  G03F7/70358 ,  G03F9/70

    摘要： In a lithographic process for fabrication of integrated circuit chips, a projection exposure machine is used to print a mask pattern onto each of a plurality of shot areas defined on a substrate, where an alignment method for establishing alignment between each shot area on the substrate and the mask pattern is performed. The alignment method comprises the step of forming on the substrate a regular pattern which comprises a plurality of pattern elements regularly distributed over the plurality of shot areas, and the step of performing an alignment operation based on the position of the regular pattern so as to establish alignment between each of the plurality of shot areas and the mask pattern. An exposure apparatus may be used to form the regular pattern on the substrate. The exposure apparatus comprises a light source for emitting a primary light beam, a beam-splitting optical system for splitting the primary light beam into a plurality of secondary light beams which are coherent with each other, and an objective optical system for modifying each secondary light beam into a substantially plane wave light beam, and for illuminating a region of a photoresist-coated substrate with the secondary light beams at different incident angles, the region of the substrate extending over a plurality of shot areas defined on the substrate, wherein the region is exposed to a regular pattern of light of interference fringes produced on the substrate from the plurality of secondary light beams.

    摘要翻译： 在用于制造集成电路芯片的光刻工艺中，使用投影曝光机将掩模图案印刷到限定在基板上的多个照射区域中的每一个上，其中用于在基板上的每个照射区域之间建立对准的对准方法和 执行掩模图案。 对准方法包括在基板上形成规则图案的步骤，该规则图案包括规则分布在多个拍摄区域上的多个图案元素，以及基于规则图案的位置执行对准操作的步骤，以便建立 多个拍摄区域中的每一个与掩模图案之间的对准。 可以使用曝光装置在基板上形成规则图案。 曝光装置包括用于发射主光束的光源，用于将主光束分离成彼此相干的多个次级光束的分束光学系统，以及用于修改每个二次光的物镜光学系统 射入基本上平面的波长光束中，并且用不同入射角的二次光束照射光致抗蚀剂涂覆的基底的区域，衬底的区域延伸在限定在衬底上的多个注射区域上，其中区域 暴露于从多个次级光束在基板上产生的干涉条纹的规则图案。

    Laser beam working system
    9.
    发明授权
    Laser beam working system 失效
    激光束工作系统

    公开(公告)号：US4820899A

    公开(公告)日：1989-04-11

    申请号：US161944

    申请日：1988-02-29

    申请人： Ikuo Hikima ,  Akira Miyaji ,  Saburo Kamiya ,  Akikazu Tanimoto

    发明人： Ikuo Hikima ,  Akira Miyaji ,  Saburo Kamiya ,  Akikazu Tanimoto

    IPC分类号： B23K26/067 ,  H01R43/02 ,  B23K26/00

    CPC分类号： B23K26/0673 ,  B23K26/067 ,  H01R43/0221

    摘要： A laser working system comprises supplying means for supplying a laser beam, a working unit which includes a stage for supporting a workpiece and means for exposing the workpiece to the laser beam, and a room unit which includes wall means for surrounding the working unit and accomodates the working unit to spatially isolate it from outside of the wall means. The supplying means is arranged outside the room unit and includes first and second laser units each for generating the laser beam.The laser working system further comprises beam guiding means which creates first light path for optically communicating the first laser unit with the working unit through the wall means, and second light path for optically communicating the second laser unit with the working unit through the wall means, respectively.

    摘要翻译： 一种激光加工系统，包括用于供应激光束的供给装置，包括用于支撑工件的台和用于将工件暴露于激光束的装置的工作单元，以及包括用于围绕工作单元并适应 工作单元将其与墙壁外部空间隔离。 供给装置设置在房间单元的外部，并且包括用于产生激光束的第一和第二激光单元。 所述激光加工系统还包括光束引导装置，所述光束引导装置产生用于通过所述壁装置将所述第一激光单元与所述工作单元光学连通的第一光路，以及用于通过所述壁装置将所述第二激光单元与所述作业单元光学连通的第二光路， 分别。

    Projection exposure apparatus
    10.
    发明授权
    Projection exposure apparatus 失效
    投影曝光装置

    公开(公告)号：US4690528A

    公开(公告)日：1987-09-01

    申请号：US656746

    申请日：1984-10-01

    申请人： Akikazu Tanimoto ,  Kazunori Imamura

    发明人： Akikazu Tanimoto ,  Kazunori Imamura

    IPC分类号： G03F7/20 ,  G03F7/207 ,  G03B3/10

    CPC分类号： G03F7/70241 ,  G03F7/70858 ,  G03F7/70883 ,  G03F7/70891

    摘要： A projection exposure apparatus used to project a minute pattern formed on a photomask or reticle onto a semiconductive wafer has a stabilized image-forming performance. The apparatus comprises a projection lens system including a plurality number of lens elements spaced apart from each other, means for supplying a gas flow to at least one of spaces through which the gas passes, means for isolating the space(s) supplied with gas from atmosphere and means for changing the refractive index of the isolated space(s).

    摘要翻译： 用于将形成在光掩模或掩模版上的微小图案投影到半导体晶片上的投影曝光装置具有稳定的图像形成性能。 该装置包括投影透镜系统，该投影透镜系统包括彼此间隔开的多个透镜元件，用于向气体通过的空间中的至少一个供应气流的装置，用于将供应气体的空间与 气氛和用于改变隔离空间的折射率的装置。