公开(公告)号：US07999932B2

公开(公告)日：2011-08-16

申请号：US12771842

申请日：2010-04-30

申请人： Hiroyuki Yamashita ,  Yukihisa Mohara ,  Eiji Imai

发明人： Hiroyuki Yamashita ,  Yukihisa Mohara ,  Eiji Imai

IPC分类号： G01N21/00 ,  G01B11/02

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/95607 ,  G01N2021/95615

摘要： An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.

摘要翻译： 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。

公开(公告)号：US07733473B2

公开(公告)日：2010-06-08

申请号：US12057168

申请日：2008-03-27

申请人： Hiroyuki Yamashita ,  Yukihisa Mohara ,  Eiji Imai

发明人： Hiroyuki Yamashita ,  Yukihisa Mohara ,  Eiji Imai

IPC分类号： G01N21/00

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/95607 ,  G01N2021/95615

摘要： An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.

摘要翻译： 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。

公开(公告)号：US20050213086A1

公开(公告)日：2005-09-29

申请号：US11086442

申请日：2005-03-23

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/88 ,  G01N21/956 ,  H01L21/66

CPC分类号： G01N21/956

摘要： An apparatus for inspecting a pattern to detect a small pattern defect has an illuminating light source, as illuminating optical system having a plurality of illuminating portions for switching an optical path of illuminating light flux to a surface of board constituting the inspected object from a plurality of directions different from each other, a detecting optical system having a variable magnification using an object lens for condensing reflected diffracted light from the illuminated board, a focusing optical system having a variable magnification capable of focusing an optical image by converged reflected diffracted light with a desired focusing magnification and an optical detector for detecting the optical image focused by the focusing optical system to convert it into an image signal, an A/D converter for converting the image signal into a digital image signal, and an image signal processor for processing the digital image signal to detect the defect.

摘要翻译： 用于检查图案以检测小图案缺陷的装置具有照明光源，作为具有多个照明部的照明光学系统，所述照明光学系统具有多个照明部分，用于将照明光束的光路从多个照明部分切换到构成被检查物体的板的表面 方向不同的检测光学系统，使用用于聚焦来自照明板的反射衍射光的物镜具有可变放大倍数的检测光学系统，具有可变倍率的聚焦光学系统，其能够通过会聚的反射衍射光聚焦光学图像，具有期望的 聚焦放大率和用于检测由聚焦光学系统聚焦的光学图像以将其转换成图像信号的光学检测器，用于将图像信号转换为数字图像信号的A / D转换器和用于处理数字图像信号的图像信号处理器 图像信号来检测缺陷。

公开(公告)号：US20130194579A1

公开(公告)日：2013-08-01

申请号：US13818781

申请日：2011-07-19

申请人： Yukihisa Mohara ,  Hidetoshi Nishiyama ,  Shuichi Chikamatsu ,  Eiji Imai ,  Koichi Taniguchi

发明人： Yukihisa Mohara ,  Hidetoshi Nishiyama ,  Shuichi Chikamatsu ,  Eiji Imai ,  Koichi Taniguchi

IPC分类号： G01N21/95

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/95676

摘要： In a conventional art, vibrations of compositions (for example, a Z-stage, a θ-stage, a wafer chuck, and a detection optical system mounted above a stage linear scale) within a device are not precisely fed back to a coordinate value.The present invention provides an inspection apparatus that inspects a substrate, including: a substrate holder that holds the substrate; a travel unit that travels the substrate holder; an irradiation unit that irradiates the substrate with light; a charge storage detector that detects the light from the substrate, and stores electric charges; a measurement unit that measures a change in relative position between the substrate holder and the travel unit; and a processing unit, in which the charge storage detector stores the electric charges on the basis of a charge transfer signal obtained on the basis of a measurement result from the measurement unit, and the processing unit detects a defect of the substrate with the use of an image generated by storing the electric charge on the basis of the charge transfer signal.

摘要翻译： 在传统技术中，装置内的组合物（例如，Z级，θ级，晶片卡盘和安装在级线性标尺上方的检测光学系统）的振动不被精确地反馈到坐标值 。 本发明提供一种检查基板的检查装置，包括：保持基板的基板保持件; 行进单元，其行进所述基板保持器; 照射单元，其用光照射所述基板; 电荷存储检测器，其检测来自基板的光，并存储电荷; 测量单元，其测量衬底保持器和行进单元之间的相对位置的变化; 以及处理单元，其中所述电荷存储检测器基于根据来自所述测量单元的测量结果获得的电荷转移信号来存储电荷，并且所述处理单元使用所述电荷检测器检测所述基板的缺陷 基于电荷转移信号存储电荷而产生的图像。

公开(公告)号：US20110032515A1

公开(公告)日：2011-02-10

申请号：US12907895

申请日：2010-10-19

申请人： Akira HAMAMATSU ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira HAMAMATSU ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

公开(公告)号：US07952700B2

公开(公告)日：2011-05-31

申请号：US12907895

申请日：2010-10-19

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

公开(公告)号：US07817261B2

公开(公告)日：2010-10-19

申请号：US12114139

申请日：2008-05-02

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

公开(公告)号：US20080204724A1

公开(公告)日：2008-08-28

申请号：US12114139

申请日：2008-05-02

申请人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

发明人： Akira Hamamatsu ,  Minori Noguchi ,  Yoshimasa Ohshima ,  Sachio Uto ,  Taketo Ueno ,  Hiroyuki Nakano ,  Takahiro Jingu ,  Hisashi Hatano ,  Yukihisa Mohara ,  Seiji Otani ,  Takahiro Togashi

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.

摘要翻译： 通过检查其中形成有多个图案的样本的表面的样本来检测缺陷的方法和装置，通过从仰角不同的多个方向之一的细长形状的光束照射， 根据要检测的缺陷的种类从照明光源发射的光束。 通过用安装在不同仰角方向上的多个图像传感器捕获由细长形状光束照射的样本的多个光学图像，通过根据在照射细长的照射区域中在样品上形成的图案的密度来改变放大倍率 形状光通量。 通过处理由多个图像传感器捕获的图像来检测样本上的缺陷。

公开(公告)号：US20140192352A1

公开(公告)日：2014-07-10

申请号：US14129906

申请日：2012-06-22

申请人： Yoshio Bamba ,  Yukihisa Mohara ,  Kowa Tabei

发明人： Yoshio Bamba ,  Yukihisa Mohara ,  Kowa Tabei

IPC分类号： G01N21/95

CPC分类号： G01N21/9501 ,  G01N21/956 ,  H01L22/12

摘要： This optical inspection device has: a line sensor on which channels are arranged; a moving means for moving a wafer mounted on a stage relative to the line sensor; a stage position detection means for detecting the on-stage positions of pseudo-defects in images formed on the channels as pseudo-defect stage coordinates, said coordinate management wafer being a wafer on which one pseudo-defect die is formed per row and column of a matrix of dies and each pseudo-defect die has a plurality of pseudo-defects formed in a line in the columnar direction; a coordinate transformation means for transforming the pseudo-defect stage coordinates into pseudo-defect die coordinates; a difference computation means for computing the differences of the pseudo-defect die coordinates from design coordinates; and a characteristic pattern acquisition means for obtaining a coordinate error characteristic pattern in which the differences from the pseudo-defect stage coordinates increase or decrease along a straight line.

摘要翻译： 该光学检查装置具有：布置有通道的线传感器; 移动装置，用于相对于所述线传感器移动安装在台架上的晶片; 一个阶段位置检测装置，用于检测在通道上形成的图像中的伪缺陷的载台位置作为伪缺陷级坐标，所述坐标管理晶片是每个行和列上形成有一个伪缺陷管芯的晶片 模具矩阵和每个伪缺陷裸片具有在柱状方向上以一条线形成的多个伪缺陷; 坐标变换装置，用于将伪缺陷级坐标变换为伪缺陷模坐标; 差分计算装置，用于计算伪缺陷管芯坐标与设计坐标的差异; 以及特征模式获取装置，用于获得其中与伪缺陷级坐标的差异沿着直线增加或减少的坐标误差特征图案。

公开(公告)号：US20120224173A1

公开(公告)日：2012-09-06

申请号：US13469071

申请日：2012-05-10

申请人： Hiroyuki Yamashita ,  Yukihisa Mohara ,  Eiji Imai

发明人： Hiroyuki Yamashita ,  Yukihisa Mohara ,  Eiji Imai

IPC分类号： G01N21/88

CPC分类号： H01L21/67288 ,  G01N21/94 ,  G01N21/9501 ,  G01N21/9503 ,  G01N21/95607 ,  G01N2021/95615

摘要： An inspection apparatus includes a wafer stage for carrying a wafer, an illumination module which irradiates an inspection beam on the wafer carried on the wafer stage, a detection module which detects scattering rays or reflection rays from the wafer on the wafer stage and outputs an image signal, a coordinates control module which stores information about the arrangement of individual inspection areas on the wafer, and an imperfect area recognition module which recognizes, on the basis of the inspection area arrangement information stored in the coordinates control module, an imperfect inspection area interfering with a wafer edge.

摘要翻译： 检查装置包括用于承载晶片的晶片台，在晶片载物台上承载的晶片上照射检查光束的照明模块，检测来自晶片台上的晶片的散射光线或反射光线的检测模块，并输出图像 信号，存储关于晶片上的各个检查区域的布置的信息的坐标控制模块，以及不完备区域识别模块，其基于存储在坐标控制模块中的检查区域布置信息识别出不完美的检查区域干扰 具有晶片边缘。