公开(公告)号：US07585567B2

公开(公告)日：2009-09-08

申请号：US10555939

申请日：2004-06-16

申请人： Yasunori Seto ,  Akira Fujisawa ,  Yukio Sueyoshi

发明人： Yasunori Seto ,  Akira Fujisawa ,  Yukio Sueyoshi

IPC分类号： B32B15/00 ,  H01L31/04

CPC分类号： H01L31/022466 ,  C03C17/23 ,  C03C2217/211 ,  C03C2217/241 ,  H01L31/03921 ,  H01L31/1884 ,  H01L51/442 ,  H01L51/5206 ,  Y02E10/549 ,  Y02P70/521 ,  Y10T428/24942

摘要： The present invention provides a transparent conductive substrate having optical transparency and conductivity that have been improved in a well-balanced manner. The transparent conductive substrate of the present invention includes a transparent base and a conductive metal oxide film formed on the base. This metal oxide film contains tin and fluorine. In a profile of the metal oxide film determined in the depth direction by SIMS, the value obtained by subtracting the minimum Imin of the ratio of sensitivity of the fluorine to that of the tin from the maximum Imax thereof is at least 0.15. The maximum Imax is higher than 1 while the minimum Imin is lower than 1. Furthermore, the position where the maximum Imax is obtained is closer to the surface of the metal oxide film as compared to the position where the minimum Imin is obtained.

摘要翻译： 本发明提供了具有光学透明性和导电性的透明导电性基板，其以良好平衡的方式得到改善。 本发明的透明导电性基材包括在基材上形成的透明基材和导电性金属氧化物膜。 该金属氧化物膜含有锡和氟。 在通过SIMS在深度方向上确定的金属氧化物膜的轮廓中，通过从其最大Imax减去氟与锡的灵敏度比的最小值Imin获得的值为至少0.15。 最大Imax高于1，而最小Imin低于1.此外，与获得最小Imin的位置相比，获得最大Imax的位置更接近金属氧化物膜的表面。

公开(公告)号：US20060261447A1

公开(公告)日：2006-11-23

申请号：US10555939

申请日：2004-06-16

申请人： Yasunori Seto ,  Akira Fujisawa ,  Yukio Sueyoshi

发明人： Yasunori Seto ,  Akira Fujisawa ,  Yukio Sueyoshi

IPC分类号： H01L23/58

CPC分类号： H01L31/022466 ,  C03C17/23 ,  C03C2217/211 ,  C03C2217/241 ,  H01L31/03921 ,  H01L31/1884 ,  H01L51/442 ,  H01L51/5206 ,  Y02E10/549 ,  Y02P70/521 ,  Y10T428/24942

摘要： The present invention provides a transparent conductive substrate having optical transparency and conductivity that have been improved in a well-balanced manner. The transparent conductive substrate of the present invention includes a transparent base and a conductive metal oxide film formed on the base. This metal oxide film contains tin and fluorine. In a profile of the metal oxide film determined in the depth direction by SIMS, the value obtained by subtracting the minimum Imin of the ratio of sensitivity of the fluorine to that of the tin from the maximum Imax thereof is at least 0.15. The maximum Imax is higher than 1 while the minimum Imin is lower than 1. Furthermore, the position where the maximum Imax is obtained is closer to the surface of the metal oxide film as compared to the position where the minimum Imin is obtained.

摘要翻译： 本发明提供了具有光学透明性和导电性的透明导电性基板，其以良好平衡的方式得到改善。 本发明的透明导电性基材包括在基材上形成的透明基材和导电性金属氧化物膜。 该金属氧化物膜含有锡和氟。 在通过SIMS在深度方向上确定的金属氧化物膜的轮廓中，通过从其最大Imax减去氟与锡的灵敏度比的最小值Imin获得的值为至少0.15。 最大Imax高于1，而最小Imin低于1.此外，与获得最小Imin的位置相比，获得最大Imax的位置更接近金属氧化物膜的表面。

公开(公告)号：US06498380B1

公开(公告)日：2002-12-24

申请号：US09594264

申请日：2000-06-15

申请人： Tsuyoshi Otani ,  Yukio Sueyoshi ,  Akira Fujisawa ,  Masahiro Hirata ,  Akihiko Hattori

发明人： Tsuyoshi Otani ,  Yukio Sueyoshi ,  Akira Fujisawa ,  Masahiro Hirata ,  Akihiko Hattori

IPC分类号： H01L310232

CPC分类号： C03C17/3417 ,  C03C17/36 ,  C03C17/3678 ,  C03C2217/77 ,  H01L31/022466 ,  H01L31/022475 ,  H01L31/0236 ,  H01L31/03921 ,  H01L31/1884 ,  Y02E10/50

摘要： On a glass sheet, undercoating layers and a transparent conductive film containing tin oxide as the main component are formed in this order. The surface of the transparent conductive film is provided with roughness including convex portions and concave portions. The convex portions have a mean diameter in a range between 0.05 &mgr;m and 0.3 &mgr;m and include five convex portions or less with diameters of at least 0.5 &mgr;m per 100 &mgr;m2 of the surface. On the transparent conductive film, a photovoltaic unit and a back electrode are formed, thus obtaining a photoelectric conversion device.

摘要翻译： 在玻璃板上，依次形成底涂层和含有氧化锡作为主要成分的透明导电膜。 透明导电膜的表面设置有包括凸部和凹部的粗糙度。 凸部的平均直径在0.05μm〜0.3μm之间的范围内，并且包括表面的直径为至少0.5μm/ m 2的五个凸部或更小的直径。 在透明导电膜上形成光电单元和背面电极，从而获得光电转换装置。

公开(公告)号：US06447921B1

公开(公告)日：2002-09-10

申请号：US09531899

申请日：2000-03-20

申请人： Hodaka Norimatsu ,  Masahiro Hirata ,  Yukio Sueyoshi ,  Akira Fujisawa ,  Toru Yamamoto

发明人： Hodaka Norimatsu ,  Masahiro Hirata ,  Yukio Sueyoshi ,  Akira Fujisawa ,  Toru Yamamoto

IPC分类号： B32B1706

CPC分类号： C03C17/3417

摘要： A low emissivity (low-E) glass and glass articles made of the low emissivity glass are provided, which permit controlling the solar heat shading property within a certain range without spoiling the transparency and heat insulating property thereof, to thereby realize a comfortable living condition in a wide region of the world or in a wide location of installment. A plurality of metallic oxide based films comprising metallic oxide are laminated on the surface of a glass substrate. The metallic oxide based films include a tin oxide based film containing antimony (SnSbOx film), and a tin oxide based film containing fluorine (SnO2:F film), and further may include a tin oxide based film consisting essentially of tin oxide, and a silicon oxide based film. The SnSbOx film contains antimony in an amount of 0.01 to 0.2 in terms of mole ratio relative to an amount of tin (=Sb mol/Sn mol), to avoid an excessive decrease in visible light transmittance.

摘要翻译： 提供由低辐射玻璃制成的低辐射率（低E）玻璃和玻璃制品，其允许将太阳能遮光性能控制在一定范围内，而不会破坏其透明性和隔热性，从而实现舒适的生活条件 在世界广泛地区或分期付款的广泛地区。 在玻璃基板的表面上层叠多个金属氧化物系金属氧化物系膜。 金属氧化物系膜包含含有锑（SnSbOx膜）的锡氧化物系膜和含氟（SnO 2 :F膜）的氧化锡系膜，还可以含有氧化锡系膜，其主要由氧化锡构成， 氧化硅基膜。 SnSbOx膜相对于锡的摩尔比（= Sbmol / Sn mol）含有0.01〜0.2的锑，以避免可见光透射率的过度降低。

公开(公告)号：US06396633B1

公开(公告)日：2002-05-28

申请号：US09569786

申请日：2000-05-12

申请人： Toru Yamamoto ,  Masahiro Hirata ,  Yukio Sueyoshi

发明人： Toru Yamamoto ,  Masahiro Hirata ,  Yukio Sueyoshi

IPC分类号： G02B110

CPC分类号： G02B5/10 ,  G02B5/08 ,  G02B5/0816 ,  G02B5/0833 ,  G02B5/0883 ,  G02B5/26

摘要： In an optical reflector and a manufacturing method thereof, the reflector is superior in durability and has a high reflectivity to visible light, but not being conspicuous in color tone of reflection. The optical reflector comprises a glass substrate, on which are piled up a film of refractive index n1, a film of refractive index n2, a film of refractive index n3, and a film of refractive index n4, sequentially, wherein the thickness of the films are adjusted so that a relationship, n1≧n4>n3>n2, is established among those refractive indices n1, n2, n3 and n4. The film of refractive index n2 is from 30 nm to 60 nm in the film thickness, a reflectivity to visible light is equal to or greater than 75% upon the surface of the film of refractive index n4, and the value {(a*)2+(b*)2}½ is from 0 to 10 when representing the color tone of reflected light upon this film by a* and b* (psychometric chroma coordinates).

摘要翻译： 在光反射体及其制造方法中，反射器的耐久性优异，对可见光的反射率高，反射色调不明显。 光反射器包括依次堆叠有折射率n1的膜，折射率n2的膜，折射率n3的膜和折射率n4的膜的玻璃基板，其中膜的厚度 被调整为在这些折射率n1，n2，n3和n4之间建立关系n1> = n4> n3> n2。 折射率n2的膜在膜厚度上为30nm至60nm，对于折射率为n4的膜的表面，对可见光的反射率等于或大于75％，并且值（{（a *） 当通过*和b *（心理测量色度坐标）表示该膜上的反射光的色调时，2+（b *）2} 1/2为0至10。

公开(公告)号：US07332226B2

公开(公告)日：2008-02-19

申请号：US10432505

申请日：2001-11-20

申请人： Akira Fujisawa ,  Masatoshi Nara ,  Takahiro Asai ,  Yukio Sueyoshi ,  Kiyotaka Ichiki ,  Koichiro Kiyohara ,  Masahiro Hirata ,  Hiroki Ando

发明人： Akira Fujisawa ,  Masatoshi Nara ,  Takahiro Asai ,  Yukio Sueyoshi ,  Kiyotaka Ichiki ,  Koichiro Kiyohara ,  Masahiro Hirata ,  Hiroki Ando

IPC分类号： B32B17/06

CPC分类号： H01L31/022466 ,  C03C17/3464 ,  C03C17/3482 ,  C03C2217/77 ,  C23C16/407 ,  H01L31/022483 ,  H01L31/02363 ,  H01L31/02366 ,  H01L31/03921 ,  H01L31/1884 ,  Y02E10/50 ,  Y10T428/24364

摘要： A transparent conductive film wherein the height number distribution of projections present on the surface is expressed by a distribution function of χ2 type having a degree of freedom of 3.5 to 15 when the unit of the horizontal axis is a nanometer, the height/width ratio number distribution is expressed by a distribution function of χ2 type having a degree of freedom of 10-35χ2, the projections having a height of 50-350 nm account for 70% of more, and the projections having a height/width ratio of 0.25-1.02 account for 90% or more.

摘要翻译： 透明导电膜，其中存在于表面上的突起的高度数分布由水平轴的单位为自由度为3.5至15的奇偶校验类型的分布函数表示， 纳米，高/宽比数分布由具有10-35℃2的自由度的chi <2>类型的分布函数表示，所述突起的高度 50-350nm占70％以上，高/宽比为0.25-1.02的突起占90％以上。

公开(公告)号：US20070026240A1

公开(公告)日：2007-02-01

申请号：US10558663

申请日：2004-11-18

申请人： Yasunori Seto ,  Hidemasa Yoshida ,  Akira Fujisawa ,  Yukio Sueyoshi

发明人： Yasunori Seto ,  Hidemasa Yoshida ,  Akira Fujisawa ,  Yukio Sueyoshi

IPC分类号： B32B9/00 ,  B05D5/06 ,  B32B17/06

CPC分类号： H01L31/1884 ,  C03C15/00 ,  C03C17/22 ,  C03C2217/77 ,  H01L31/02366 ,  Y02E10/50 ,  Y10T428/24975 ,  Y10T428/265

摘要： The present invention provides a transparent substrate with a transparent conductive film that is thin but has a surface with concavities and convexities of increased height. A manufacturing method of the present invention includes a process of forming a transparent conductive film containing crystalline metal oxide as its main component on a transparent substrate by a pyrolytic oxidation method. In the method, a gaseous material containing a metal compound, an oxidizing material, and hydrogen chloride is supplied onto the transparent substrate. The process includes sequentially: a first step in which a mole ratio of the hydrogen chloride to the metal compound in the gaseous material is 0.5 to 5; and a second step in which the mole ratio is 2 to 10 and is higher than the mole ratio to be employed in the first step. With the present invention, a transparent substrate with a transparent conductive film can be provided that has a haze ratio of at least 15% and includes a transparent conductive film whose thickness is 300 nm to 750 nm.

摘要翻译： 本发明提供一种具有透明导电膜的透明基板，该透明导电膜薄但具有增加高度的凹凸的表面。 本发明的制造方法包括通过热解氧化法在透明基板上形成含有结晶金属氧化物作为主要成分的透明导电膜的工序。 在该方法中，将含有金属化合物，氧化物质和氯化氢的气态物质供给到透明基板上。 该方法依次包括：气态物质中氯化氢与金属化合物的摩尔比为0.5-5的第一步骤; 摩尔比为2〜10，高于第1工序中使用的摩尔比的第2工序。 通过本发明，可以提供具有至少15％的雾度比的具有透明导电膜的透明基板，并且包括厚度为300nm至750nm的透明导电膜。

公开(公告)号：US20050130416A1

公开(公告)日：2005-06-16

申请号：US10496487

申请日：2002-12-03

申请人： Akira Fujisawa ,  Daisuke Arai ,  Kiyotaka Ichiki ,  Yukio Sueyoshi ,  Toru Yamamoto ,  Tsuyoshi Otani

发明人： Akira Fujisawa ,  Daisuke Arai ,  Kiyotaka Ichiki ,  Yukio Sueyoshi ,  Toru Yamamoto ,  Tsuyoshi Otani

IPC分类号： B60R16/02 ,  C03C17/245 ,  C03C17/34 ,  C23C16/02 ,  C23C16/40 ,  C23C16/54 ,  H01B7/08 ,  H01L31/18 ,  H01L21/44

CPC分类号： B60R16/0207 ,  C03C17/245 ,  C03C17/3417 ,  C03C17/3452 ,  C03C2217/211 ,  C03C2217/241 ,  C03C2218/15 ,  C23C16/0272 ,  C23C16/0281 ,  C23C16/407 ,  C23C16/545 ,  H01B7/08 ,  H01L31/1884 ,  Y02E10/50 ,  Y10T428/26

摘要： The present invention provides a method of forming a thin film containing a metal oxide as the main component, the film thickness of which is relatively uniform, at a high film deposition rate over a wide area and over a long time. The present invention is a method for forming a thin film containing a metal oxide as the main component on a substrate using a mixed gas stream containing a metal chloride, an oxidizing material, and hydrogen chloride, by a thermal decomposition method at a film deposition rate of 4500 nm/min. or greater, performing at least one selected from: 1) prior to mixing the metal chloride and the oxidizing material in the mixed gas stream, contacting hydrogen chloride with at least one selected from the metal chloride and the oxidizing material, and 2) forming a buffer layer in advance on a surface of the substrate on which the thin film containing a metal oxide as the main component is to be formed.

摘要翻译： 本发明提供了一种以广泛的区域和长时间的高成膜速度形成含有金属氧化物作为主要成分的膜的方法，其膜厚相对均匀。 本发明是通过热分解法以膜沉积速率形成含有金属氧化物作为主要成分的薄膜的方法，该方法使用含有金属氯化物，氧化物质和氯化氢的混合气流在基板上形成 4500nm / min。 或更大，执行选自以下的至少一种：1）在混合气流中混合金属氯化物和氧化物质之前，使氯化氢与选自金属氯化物和氧化物质的至少一种接触，以及2）形成 预先在其上形成有以金属氧化物为主成分的薄膜的基板的表面上预先形成缓冲层。

公开(公告)号：US20090258205A1

公开(公告)日：2009-10-15

申请号：US12486287

申请日：2009-06-17

申请人： Yasunori SETO ,  Hidemasa YOSHIDA ,  Akira FUJISAWA ,  Yukio SUEYOSHI

发明人： Yasunori SETO ,  Hidemasa YOSHIDA ,  Akira FUJISAWA ,  Yukio SUEYOSHI

IPC分类号： B32B7/02 ,  H01B1/08

CPC分类号： H01L31/1884 ,  C03C15/00 ,  C03C17/22 ,  C03C2217/77 ,  H01L31/02366 ,  Y02E10/50 ,  Y10T428/24975 ,  Y10T428/265

摘要： The present invention provides a transparent substrate with a transparent conductive film that is thin but has a surface with concavities and convexities of increased height. A manufacturing method of the present invention includes a process of forming a transparent conductive film containing crystalline metal oxide as its main component on a transparent substrate by a pyrolytic oxidation method. In the method, a gaseous material containing a metal compound, an oxidizing material, and hydrogen chloride is supplied onto the transparent substrate. The process includes sequentially: a first step in which a mole ratio of the hydrogen chloride to the metal compound in the gaseous material is 0.5 to 5; and a second step in which the mole ratio is 2 to 10 and is higher than the mole ratio to be employed in the first step. With the present invention, a transparent substrate with a transparent conductive film can be provided that has a haze ratio of at least 15% and includes a transparent conductive film whose thickness is 300 nm to 750 nm.

摘要翻译： 本发明提供一种具有透明导电膜的透明基板，该透明导电膜薄但具有增加高度的凹凸的表面。 本发明的制造方法包括通过热解氧化法在透明基板上形成含有结晶金属氧化物作为主要成分的透明导电膜的工序。 在该方法中，将含有金属化合物，氧化物质和氯化氢的气态物质供给到透明基板上。 该方法依次包括：气态物质中氯化氢与金属化合物的摩尔比为0.5-5的第一步骤; 摩尔比为2〜10，高于第1工序中使用的摩尔比的第2工序。 通过本发明，可以提供具有至少15％的雾度比的具有透明导电膜的透明基板，并且包括厚度为300nm至750nm的透明导电膜。

公开(公告)号：US20050121070A1

公开(公告)日：2005-06-09

申请号：US10497367

申请日：2002-12-03

申请人： Akira Fujisawa ,  Yukio Sueyoshi ,  Masahiro Hirata ,  Toru Yamamoto ,  Koichiro Kiyohara ,  Kiyotaka Ichiki

发明人： Akira Fujisawa ,  Yukio Sueyoshi ,  Masahiro Hirata ,  Toru Yamamoto ,  Koichiro Kiyohara ,  Kiyotaka Ichiki

IPC分类号： C03C17/245 ,  C03C17/34 ,  C23C16/02 ,  C23C16/40 ,  C23C16/54 ,  H01L31/18 ,  H01L31/00

CPC分类号： C23C16/407 ,  C03C17/245 ,  C03C17/3417 ,  C03C17/3452 ,  C03C2217/211 ,  C03C2217/241 ,  C03C2218/15 ,  C23C16/0272 ,  C23C16/0281 ,  C23C16/545 ,  H01L31/1884 ,  Y02E10/50

摘要： The present invention provides a thin film-forming method by which, even when a thin film containing a crystalline metal oxide as the main component is formed over a wide area within a short time utilizing a thermal decomposition method, the thickness of the thin film becomes relatively uniform. A thin film-forming method of the present invention includes forming a thin film using a raw material containing a chloride of a metal, and prior to the forming of the thin film, 1) disposing metal-containing particles on the substrate, or 2) forming, at a film deposition rate slower than a film deposition rate for the thin film, a metal-containing thin film on the substrate, and wherein, in the case of the step 2), the thin film containing the metal oxide as the main component is directly formed on the metal-containing thin film.

摘要翻译： 本发明提供一种薄膜形成方法，即使使用热分解方法，即使在短时间内在广泛的区域上形成含有结晶金属氧化物作为主要成分的薄膜时，薄膜的厚度变为 比较均匀。 本发明的薄膜形成方法包括使用含有金属氯化物的原料形成薄膜，并且在形成薄膜之前，1）在基板上设置含金属的颗粒，或2） 以比薄膜成膜速度慢的成膜速度，在基板上形成含金属的薄膜，其中，在步骤2）的情况下，以金属氧化物为主体的薄膜 组分直接形成在含金属的薄膜上。