公开(公告)号：US20100183818A1

公开(公告)日：2010-07-22

申请号：US12440304

申请日：2007-09-06

申请人： Nong-Moon Hwang ,  Chan-Soo Kim ,  Jae-Ik Lee ,  Yung-Bin Chung ,  Woong-Kyu Youn

发明人： Nong-Moon Hwang ,  Chan-Soo Kim ,  Jae-Ik Lee ,  Yung-Bin Chung ,  Woong-Kyu Youn

IPC分类号： C23C4/10

CPC分类号： C23C16/4401 ,  C23C16/44 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/0259 ,  H01L21/0262

摘要： Provided are an apparatus and a method of depositing films capable of controlling deposition rate and film properties using the charging behavior of nanoparticles formed in gas phase. The apparatus includes a chamber in which a substrate is loaded, a gas supply system configured to introduce a reaction gas into the chamber, a filament configured to emit heat for dissociating the introduced reaction gas, a power supply configured to apply a constant alternate current or direct current voltage, and a bias supply unit configured to apply a bias to at least one of a top, a side and a bottom of the substrate using a voltage applied from the power supply while a film is deposited on the substrate from the dissociated reaction gas, the bias supply unit being separated from the substrate.

摘要翻译： 提供了一种使用在气相中形成的纳米颗粒的充电行为来沉积能够控制沉积速率和膜性质的膜的装置和方法。 该装置包括：其中装载有基板的腔室，构造成将反应气体引入腔室中的气体供给系统，被配置为发射热量以解散引入的反应气体的细丝;配置为施加恒定交流电流的电源; 以及偏置电源单元，其被配置为使用从电源施加的电压向衬底的顶部，侧面和底部中的至少一个施加偏压，同时膜从解离反应沉积在衬底上 气体，偏压供应单元与基板分离。

公开(公告)号：US20100136767A1

公开(公告)日：2010-06-03

申请号：US12531436

申请日：2008-08-19

申请人： Nong Moon Hwang ,  Yung Bin Chung ,  Dong Kwon Lee

发明人： Nong Moon Hwang ,  Yung Bin Chung ,  Dong Kwon Lee

IPC分类号： H01L21/326 ,  B05B5/00

CPC分类号： H01L21/0262 ,  C23C16/0272 ,  C23C16/24 ,  C23C16/44 ,  H01L21/02422 ,  H01L21/02527 ,  H01L21/02529 ,  H01L21/02532 ,  H01L21/02573 ,  H01L21/02601

摘要： A method for manufacturing a thin film is provided. A substrate is loaded into a chamber. A first reaction gas and a second reaction gas are supplied into the chamber. The first reaction gas is dissociated to form crystalline nanoparticles. An amorphous material is inhibited from being formed on the substrate using the second reaction gas. Thereafter, a crystalline thin film is formed from the crystalline nanoparticles provided on the substrate.

摘要翻译： 提供一种制造薄膜的方法。 将基板装载到室中。 将第一反应气体和第二反应气体供应到室中。 解离第一反应气体以形成结晶纳米颗粒。 使用第二反应气体抑制在基板上形成无定形材料。 此后，由设置在基板上的结晶纳米粒子形成结晶薄膜。