MULTILAYER OPTICAL FILMS HAVING SIDE-BY-SIDE POLARIZER/POLARIZER ZONES
    4.
    发明申请
    MULTILAYER OPTICAL FILMS HAVING SIDE-BY-SIDE POLARIZER/POLARIZER ZONES 有权
    具有侧面偏振器/极化区域的多层光学膜

    公开(公告)号:US20160170113A1

    公开(公告)日:2016-06-16

    申请号:US15042425

    申请日:2016-02-12

    摘要: A reflective film includes interior layers that selectively reflect light by constructive or destructive interference, the layers extending from a first to a second zone of the film. In the first zone the layers provide a first reflective polarizer characteristic, and in a second zone the layers provide a substantially different reflective polarizer characteristic. The second zone is characterized by at least some of the layers having a reduced birefringence relative to their birefringence in the first zone. In some cases the first reflective polarizer characteristic may have a pass axis that is substantially orthogonal to that of the second reflective polarizer characteristic. The film may have substantially the same thickness in the first and second zones, or a substantially reduced thickness in the second zone relative to the first zone.

    摘要翻译: 反射膜包括通过结构性或相消干涉选择性地反射光的内层,层从膜的第一区延伸到第二区。 在第一区域中,这些层提供第一反射偏振器特性,并且在第二区域中,这些层提供基本不同的反射偏振器特性。 第二区的特征在于至少一些层相对于第一区中的双折射具有降低的双折射。 在一些情况下,第一反射偏振器特性可以具有与第二反射偏振器特性基本正交的通过轴。 膜可以在第一和第二区域中具有基本上相同的厚度,或者在第二区域中相对于第一区域具有基本上减小的厚度。

    MASK PROCESSING USING FILMS WITH SPATIALLY SELECTIVE BIREFRINGENCE REDUCTION
    7.
    发明申请
    MASK PROCESSING USING FILMS WITH SPATIALLY SELECTIVE BIREFRINGENCE REDUCTION 有权
    使用具有空间选择性减少的薄膜的掩模处理

    公开(公告)号:US20150301255A1

    公开(公告)日:2015-10-22

    申请号:US14755457

    申请日:2015-06-30

    IPC分类号: G02B5/30 G02B1/12

    摘要: Certain patternable reflective films are used as masks to make other patterned articles, and one or more initial masks can be used to pattern the patternable reflective films. An exemplary patternable reflective film has an absorption characteristic suitable to, upon exposure to a radiant beam, absorptively heat a portion of the film by an amount sufficient to change a first reflective characteristic to a different second reflective characteristic. The change from the first to the second reflective characteristic is attributable to a change in birefringence of one or more layers or materials of the patternable film. In a related article, a mask is attached to such a patternable reflective film. The mask may have opaque portions and light-transmissive portions. Further, the mask may have light-transmissive portions with structures such as focusing elements and/or prismatic elements.

    摘要翻译: 某些可图案化的反射膜用作掩模以制造其它图案制品,并且可以使用一个或多个初始掩模来对可图案化的反射膜进行图案化。 示例性的可图案化反射膜具有适于在暴露于辐射束时吸收特性的吸收特性,以将膜的一部分吸收热量足以将第一反射特性改变为不同的第二反射特性。 从第一反射特性到第二反射特性的变化归因于图案化膜的一个或多个层或材料的双折射变化。 在相关文章中,将掩模附着到这种可图案化的反射膜。 掩模可以具有不透明部分和透光部分。 此外,掩模可以具有诸如聚焦元件和/或棱镜元件的结构的透光部分。