公开(公告)号：US20150175642A1

公开(公告)日：2015-06-25

申请号：US14413102

申请日：2013-10-21

申请人： ADEKA CORPORATION

发明人： Atsushi Sakurai ,  Masako Hatase ,  Naoki Yamada ,  Tsubasa Shiratori ,  Akio Saito ,  Tomoharu Yoshino

IPC分类号： C07F15/06 ,  C23C16/18 ,  C07F15/04 ,  C23C16/40 ,  C07F1/08 ,  C07C251/08

CPC分类号： C07F15/065 ,  C07C251/04 ,  C07C251/08 ,  C07F1/08 ,  C07F7/28 ,  C07F15/045 ,  C23C16/18 ,  C23C16/406 ,  C23C16/408

摘要： Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

摘要翻译： 公开了具有适合用于通过CVD形成薄膜的材料的物理性质的金属醇盐化合物，特别是具有适用于形成金属 - 铜薄膜的材料的物理性质的金属醇盐化合物。 金属醇盐化合物由通式（I）表示。 还描述了包含金属醇盐化合物的薄膜形成材料。 （式中，R1表示甲基或乙基，R2表示氢原子或甲基，R3表示C1-3直链或支链烷基，M表示金属原子或硅原子，n表示 金属原子或硅原子的化合价。

公开(公告)号：US10927460B2

公开(公告)日：2021-02-23

申请号：US16302895

申请日：2017-02-27

申请人： ADEKA CORPORATION

发明人： Hiroki Sato ,  Naoki Yamada ,  Tsubasa Shiratori ,  Haruyoshi Sato

IPC分类号： C23C16/455 ,  C23C16/40

摘要： A raw material for forming a thin film that includes a compound represented by General Formula (1) below. In the formula, R1 represents a linear or branched alkyl group having 2 to 4 carbon atoms; R2 to R5 each independently represent a linear or branched alkyl group having 1 to 4 carbon atoms; A represents an alkanediyl group having 1 to 4 carbon atoms; and M represents titanium, zirconium or hafnium. Provided that when M represents zirconium, A represents an alkanediyl group having 3 or 4 carbon atoms. When M represents titanium or hafnium, it is preferred that A represents an alkanediyl group having 2 or 3 carbon atoms. When M represents zirconium, it is preferred that A represent an alkanediyl group having 3 carbon atoms.

公开(公告)号：US10155784B2

公开(公告)日：2018-12-18

申请号：US15861719

申请日：2018-01-04

申请人： ADEKA CORPORATION

发明人： Atsushi Sakurai ,  Masako Hatase ,  Naoki Yamada ,  Tsubasa Shiratori ,  Akio Saito ,  Tomoharu Yoshino

IPC分类号： C07C251/08 ,  C07F15/06 ,  C07C251/04 ,  C07F1/08 ,  C07F15/04 ,  C23C16/18 ,  C23C16/40 ,  C07F7/28

摘要： An alcohol compound of formula (II) in which R4 represents a methyl group or an ethyl group, R5 represents a hydrogen atom, and R6 represents a C1-3 linear or branched alkyl group. The alcohol compound has physical properties suitable for a material for forming thin films by CVD, and particularly, physical properties suitable for a material for forming metallic-copper thin films.

公开(公告)号：US09896468B2

公开(公告)日：2018-02-20

申请号：US14413102

申请日：2013-10-21

申请人： ADEKA CORPORATION

发明人： Atsushi Sakurai ,  Masako Hatase ,  Naoki Yamada ,  Tsubasa Shiratori ,  Akio Saito ,  Tomoharu Yoshino

IPC分类号： C23C16/00 ,  C07F15/06 ,  C07C251/08 ,  C07C251/04 ,  C07F1/08 ,  C07F15/04 ,  C23C16/18 ,  C23C16/40 ,  C07F7/28

CPC分类号： C07F15/065 ,  C07C251/04 ,  C07C251/08 ,  C07F1/08 ,  C07F7/28 ,  C07F15/045 ,  C23C16/18 ,  C23C16/406 ,  C23C16/408

摘要： Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.