公开(公告)号：US11307495B2

公开(公告)日：2022-04-19

申请号：US16071397

申请日：2017-01-23

Applicant: ADEKA CORPORATION

Inventor： Junya Miyake ,  Yoshitomo Takeuchi ,  Naomi Sato ,  Kentaro Kimura

IPC: G03F7/004 ,  C07D221/14

Abstract: Provided are: a thermal acid generator having a high acid generation temperature; and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

公开(公告)号：US10189847B2

公开(公告)日：2019-01-29

申请号：US15129630

申请日：2015-03-30

Applicant: ADEKA CORPORATION

Inventor： Yoko Komiyama ,  Takeo Oishi ,  Tomoyuki Ariyoshi ,  Tomoya Tamachi ,  Takayuki Ikaga ,  Naomi Sato

IPC: C07D243/36 ,  G03F7/004 ,  C07D487/06 ,  C07D209/14 ,  C08F2/50 ,  G03F7/027 ,  G03F7/031 ,  C07D401/04 ,  C07D405/04 ,  C07D409/04 ,  C07D209/56 ,  C07D209/60 ,  C07D409/10 ,  C07D471/04

Abstract: An oxime ester compound represented by general formula (I), wherein R1to R8 are as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm.

公开(公告)号：US11754920B2

公开(公告)日：2023-09-12

申请号：US17691718

申请日：2022-03-10

Applicant: ADEKA CORPORATION

Inventor： Junya Miyake ,  Yoshitomo Takeuchi ,  Naomi Sato ,  Kentaro Kimura

IPC: G03F7/004 ,  C07D221/14

CPC classification number: G03F7/004 ,  C07D221/14

Abstract: A thermal acid generator having a high acid generation temperature, and a resist composition using the same. The thermal acid generator is a sulfonic acid derivative compound represented by the following Formula (I): (wherein, R1 represents an aliphatic hydrocarbon group having 1 to 18 carbon atoms or the like, or a group represented by the following Formula (II): (wherein, Y1 represents a single bond or an alkanediyl group having 1 to 4 carbon atoms; R11 and R12 each independently represent an alkanediyl group having 2 to 6 carbon atoms, or the like; R13 represents a linear or branched alkyl group having 1 to 18 carbon atoms, or the like; a and b each represent 0 or 1; and either a or b is 1); R2 to R7 each independently represent a linear or branched alkyl group having 1 to 14 carbon atoms; the aliphatic hydrocarbon group or the like of R1 has no substituent or is substituted with a halogen atom or the like; and a methylene structure in the aliphatic hydrocarbon group or the like of R1 is optionally substituted with —O— or the like).

公开(公告)号：US12013637B2

公开(公告)日：2024-06-18

申请号：US17256320

申请日：2019-06-27

Applicant: ADEKA CORPORATION

Inventor： Yoshitomo Takeuchi ,  Taiki Mihara ,  Naomi Sato ,  Kazushi Matsukawa

IPC: G03F7/031 ,  C07D209/14 ,  C07D209/86 ,  C08F2/50 ,  G02B5/22 ,  G03F7/00

CPC classification number: G03F7/031 ,  C07D209/14 ,  C07D209/86 ,  C08F2/50 ,  G02B5/223 ,  G03F7/0007

Abstract: An oxime ester compound is useful as a photopolymerization initiator used in a polymerizable composition. A photopolymerization initiator contains the oxime ester compound. The oxime ester compound contains, in the same molecule: a group represented by the following Formula (I); and a photoradical cleavable group containing no oxime ester group.