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公开(公告)号:US10005851B2
公开(公告)日:2018-06-26
申请号:US15318780
申请日:2015-07-24
申请人: ADEKA CORPORATION
IPC分类号: C08F2/50 , C07D295/10 , C07C323/32 , C07F7/18 , C07C323/31 , C07D295/116 , C08F20/00 , C08F2/38
CPC分类号: C08F2/50 , C07C323/31 , C07C323/32 , C07D295/10 , C07D295/116 , C07F7/1804 , C08F2/38 , C08F20/00 , C08L33/00
摘要: Provided is an α-aminoalkylphenone compound that has good stability and low sublimability, efficiently generates radicals when irradiated with a bright line at 365 nm (I line) or the like, and is useful as a polymerization initiator to be used in a radically polymerizable composition. The α-aminoalkylphenone compound is represented by Formula (I) mentioned below. In Formula (I) mentioned above, it is preferable that R11 is a nitro group, an alkoxy group having 1 to 12 carbon atoms, or an alkoxycarbonyl group having 1 to 12 carbon atoms. The α-aminoalkylphenone compound can be preferably used in a polymerization initiator.
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公开(公告)号:US20150291772A1
公开(公告)日:2015-10-15
申请号:US14405159
申请日:2013-06-21
申请人: ADEKA CORPORATION
发明人: Mitsuhiro Okada , Tomoyuki Ariyoshi
IPC分类号: C08K5/3492 , C08K5/11 , C08K5/1575 , C08K5/20 , C08K5/3475 , C08K5/41 , C08K5/3417 , C08K5/1545 , C07C69/96 , C07D251/32 , C07D493/10 , C07C243/32 , C07D249/20 , C07D251/24 , C08K5/04
CPC分类号: C08K5/34924 , C07C69/96 , C07C243/32 , C07C2601/14 , C07D249/20 , C07D251/24 , C07D251/32 , C07D493/10 , C08K5/04 , C08K5/109 , C08K5/11 , C08K5/1545 , C08K5/1575 , C08K5/175 , C08K5/18 , C08K5/20 , C08K5/315 , C08K5/3417 , C08K5/3435 , C08K5/3462 , C08K5/3475 , C08K5/3492 , C08K5/34922 , C08K5/41 , C08K5/521 , C08K5/5333 , C09B11/02 , C09B11/04 , C09B11/24 , C09B23/06 , C09B23/083 , C09B23/105 , C09B29/0808 , C09B29/081 , C09B29/366 , C09K15/06 , C09K15/20
摘要: A latent additive represented by general formula (1): wherein A is a 5- or 6-membered aromatic or heterocyclic ring; R1 and R2 are each hydrogen, halogen, cyano, hydroxyl, nitro, carboxyl, optionally substituted C1-C40 alkyl, C6-C20 aryl, C7-C20 arylalkyl, or C2-C20 heterocyclic ring-containing group; and R4 is C1-C20 alkyl, C2-C20 alkenyl, C6-C20 aryl, C7-C20 arylalkyl, C2-C20 heterocyclic ring-containing group, or trialkylsilyl.
摘要翻译: 由通式(1)表示的潜在添加剂:其中A是5-或6-元芳族或杂环; R 1和R 2各自为氢,卤素,氰基,羟基,硝基,羧基,任选取代的C 1 -C 40烷基,C 6 -C 20芳基,C 7 -C 20芳烷基或C 2 -C 20杂环基团; 和R 4是C 1 -C 20烷基,C 2 -C 20烯基,C 6 -C 20芳基,C 7 -C 20芳基烷基,C 2 -C 20杂环基或三烷基甲硅烷基。
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公开(公告)号:US10189847B2
公开(公告)日:2019-01-29
申请号:US15129630
申请日:2015-03-30
申请人: ADEKA CORPORATION
发明人: Yoko Komiyama , Takeo Oishi , Tomoyuki Ariyoshi , Tomoya Tamachi , Takayuki Ikaga , Naomi Sato
IPC分类号: C07D243/36 , G03F7/004 , C07D487/06 , C07D209/14 , C08F2/50 , G03F7/027 , G03F7/031 , C07D401/04 , C07D405/04 , C07D409/04 , C07D209/56 , C07D209/60 , C07D409/10 , C07D471/04
摘要: An oxime ester compound represented by general formula (I), wherein R1to R8 are as defined in the description, and n is 0 or 1; a photopolymerization initiator containing the compound; a photosensitive composition, alkali-developable photosensitive resin composition, and colored alkali-developable photosensitive resin composition containing the photopolymerization initiator; and a cured product of these compositions are provided. The compound is useful as a high-sensitivity photopolymerization initiator that has good stability and low sublimability and that efficiently absorbs, and is activated by, near-ultraviolet light, e.g., at 365 nm.
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公开(公告)号:US09777138B2
公开(公告)日:2017-10-03
申请号:US14405159
申请日:2013-06-21
申请人: ADEKA CORPORATION
发明人: Mitsuhiro Okada , Tomoyuki Ariyoshi
IPC分类号: C07C69/96 , C09K15/04 , C08K5/134 , C08K5/3492 , C07C243/32 , C09B11/24 , C09B23/06 , C09B23/08 , C09B29/08 , C09B29/50 , C09K15/20 , C07D249/20 , C07D251/24 , C07D251/32 , C07D493/10 , C08K5/04 , C08K5/11 , C08K5/1545 , C08K5/1575 , C08K5/20 , C08K5/3417 , C08K5/3475 , C08K5/41 , C08K5/109 , C08K5/17 , C08K5/18 , C08K5/315 , C08K5/3435 , C08K5/3462 , C08K5/521 , C08K5/5333 , C09K15/06 , C09B11/02 , C09B11/04 , C09B23/10
CPC分类号: C08K5/34924 , C07C69/96 , C07C243/32 , C07C2601/14 , C07D249/20 , C07D251/24 , C07D251/32 , C07D493/10 , C08K5/04 , C08K5/109 , C08K5/11 , C08K5/1545 , C08K5/1575 , C08K5/175 , C08K5/18 , C08K5/20 , C08K5/315 , C08K5/3417 , C08K5/3435 , C08K5/3462 , C08K5/3475 , C08K5/3492 , C08K5/34922 , C08K5/41 , C08K5/521 , C08K5/5333 , C09B11/02 , C09B11/04 , C09B11/24 , C09B23/06 , C09B23/083 , C09B23/105 , C09B29/0808 , C09B29/081 , C09B29/366 , C09K15/06 , C09K15/20
摘要: A latent additive which is represented by general formula (1). (In the formula, A represents a five-membered or six-membered aromatic ring or heterocyclic ring; each of R1 and R2 independently represents a hydrogen atom, a halogen atom, a cyano group, a hydroxyl group, a nitro group, a carboxyl group, an optionally substituted alkyl group having 1-40 carbon atoms, an aryl group having 6-20 carbon atoms, an arylalkyl group having 7-20 carbon atoms or a heterocyclic ring-containing group having 2-20 carbon atoms; and R4 represents an alkyl group having 1-20 carbon atoms, an alkenyl group having 2-20 carbon atoms, an aryl group having 6-20 carbon atoms, an arylalkyl group having 7-20 carbon atoms, a heterocyclic ring-containing group having 2-20 carbon atoms or a trialkylsilyl group.)
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