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公开(公告)号：US20210249223A1
公开(公告)日：2021-08-12
申请号：US17251043
申请日：2019-06-13
发明人： Benjamine NAVET , Amory JACQUES , Philippe ROQUINY
IPC分类号： H01J37/317 , G01J5/08 , G01J5/04 , C03C23/00 , C03C3/087
摘要： Substrates that can act as optical elements for transmitting infrared light and that have low reflectance for infrared light and the assembly of such substrates with a source of infrared light and/or with an infrared-sensitive optical component. The substrates are suitable for cover glasses and optical elements, such as lenses, prisms, or mirrors to be used with infrared light. Ions are implanted into a substrate in order to reduce its reflectance of infrared light.
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公开(公告)号：US20210087106A1
公开(公告)日：2021-03-25
申请号：US16977703
申请日：2019-02-21
发明人： Benjamine NAVET , Amory JACQUES
摘要： A glass sheet comprising at least one antireflective, etched surface having a surface roughness defined, when measured on an evaluation length of 12 mm and with a Gaussian filter with a cut-off wavelength is 0.8 mm, by: 0.02≤Ra≤0.6 μm; 0.1≤Rz≤3 μm; and 5≤RSm≤180 μm. The glass sheet has the following optical properties, when measured from the antireflective, etched surface: a haze value of from 1 to 40%; a clarity value of from 30 to 100%; a gloss value at 60° of from 20 to 130 SGU; and a luminous reflectance Rc from 4 to 7%. The antireflective, etched surface comprises implanted ions. Such a glass sheet is particularly suitable for display applications as cover glass and has excellent sparkle reduction properties together with an anti-glare effect.
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公开(公告)号：US20220145447A1
公开(公告)日：2022-05-12
申请号：US17435868
申请日：2020-02-25
IPC分类号： C23C14/48 , H01J37/317 , H01J37/32
摘要： A fractioning device for an ion implantation device with at least one fractioning wall, wherein the fractioning device is suitable for being inserted within a channel. The channel is configured to connect an ion source, which is at a first pressure p1 and a processing chamber, which is at a second pressure p2 in an ion implantation device.
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公开(公告)号：US20210347688A1
公开(公告)日：2021-11-11
申请号：US17270714
申请日：2019-07-24
发明人： Benjamine NAVET , Jacques AMORY
IPC分类号： C03C21/00
摘要： A method of implanting ions to modify the invading ion surface layer concentration of a chemically strengthened glass substrate, where the ions are selected from the group consisting of N, H, O, He, Ne, Ar, and Kr and are implanted in the chemically strengthened glass substrate with a dosage between 1014 ions/cm2 and 1018 ions/cm2, and an acceleration voltage between 5 kV and 100 kV.
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公开(公告)号：US20190119155A1
公开(公告)日：2019-04-25
申请号：US16092638
申请日：2017-03-13
发明人： Benjamine NAVET , Pierre BOULANGER
摘要： The invention concerns a method for manufacturing heat treatable antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, O2, or Ar, ionizing the source gas so as to form a mixture of single charge and multicharge ions of Ar, N, or O, forming a beam of single charge and multicharge ions of Ar, N, or O by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and setting the ion dosage at a value comprised between 7.5×1016 and 7.5×1017 ions/cm2. The invention further concerns heat treatable and heat treated antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
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公开(公告)号：US20190161404A1
公开(公告)日：2019-05-30
申请号：US16092461
申请日：2017-03-13
发明人： Benjamine NAVET , Pierre BOULANGER , Denis BUSARDO
摘要： A method for manufacturing antireflective glass substrates by ion implantation, comprising selecting a source gas of N2, or O2, ionizing the source gas so as to form a mixture of single charge and multicharge ions of N, or O, forming a beam of single charge and multicharge ions of N, or O by accelerating with an acceleration voltage A between 13 kV and 40 kV and setting the ion dosage at a value between 5.56×1014×A/kV+4.78×1016 ions/cm2 and −2.22×1016×A/kV+1.09×1018 ions/cm2, as well as antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
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公开(公告)号：US20190161403A1
公开(公告)日：2019-05-30
申请号：US16092373
申请日：2017-03-13
发明人： Benjamine NAVET , Pierre BOULANGER , Denis BUSARDO
摘要： A method for manufacturing blue reflective glass substrates by ion implantation, the method including ionizing a N2 source gas so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N by accelerating with an acceleration voltage A between 15 kV and 35 kV and a dosage D between −9.33×1015×A/kV+3.87×1017 ions/cm2 and 7.50×1017 ions/cm2. A blue reflective glass substrate including an area treated by ion implantation with a mixture of simple charge and multicharge ions according to the method.
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公开(公告)号：US20170334775A1
公开(公告)日：2017-11-23
申请号：US15520908
申请日：2015-10-21
摘要： The invention concerns a process for increasing the scratch resistance of a glass substrate by implantation of simple charge and multicharge ions, comprising maintaining the temperature of the area of the glass substrate being treated at a temperature that is less than or equal to the glass transition temperature of the glass substrate, selecting the ions to be implanted among the ions of Ar, He, and N, setting the acceleration voltage for the extraction of the ions at a value comprised between 5 kV and 200 kV and setting the ion dosage at a value comprised between 1014 ions/cm2 and 2.5×1017 ions/cm2.The invention further concerns glass substrates comprising an area treated by implantation of simple charge and multicharge ions according to this process and their use for reducing the probability of scratching on the glass substrate upon mechanical contact.
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9.发明申请公开(公告)号：US20190092683A1
公开(公告)日：2019-03-28
申请号：US16092346
申请日：2017-03-13
发明人： Benjamine NAVET , Pierre BOULANGER , Denis BUSARDO
摘要： The invention concerns a method for manufacturing scratch-resistant antireflective glass substrates by ion implantation, comprising ionizing a source gas of N2 so as to form a mixture of single charge and multicharge ions of N, forming a beam of single charge and multicharge ions of N, by accelerating with an acceleration voltage comprised between 20 kV and 30 kV and an ion dosage comprised between 5×1016 ions/cm2 and 1017 ions/cm2. The invention further concerns scratch-resistant antireflective glass substrates comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
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10.发明申请公开(公告)号：US20190119154A1
公开(公告)日：2019-04-25
申请号：US16092533
申请日：2017-03-13
发明人： Benjamine NAVET , Pierre BOULANGER
摘要： The invention concerns a method for manufacturing glass substrates with reduced internal reflectance by ion implantation, comprising ionizing a source gas of N2, O2, Ar, and/or He so as to form a mixture of single charge and multicharge ions of N, O, Ar, and/or He forming a beam of single charge and multicharge ions of N, O, Ar, and/or He, by accelerating with an acceleration voltage comprised between 15 kV and 60 kV and an ion dosage comprised between 1017 ions/cm2 and 1018 ions/cm2. The invention further concerns glass substrates having reduced internal reflectance, comprising an area treated by ion implantation with a mixture of simple charge and multicharge ions according to this method.
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