公开(公告)号：US20230256469A1

公开(公告)日：2023-08-17

申请号：US18104853

申请日：2023-02-02

Applicant: AGC INC.

Inventor： Ryuta TAKASHITA ,  Toyokazu ENTA

IPC: B05D5/08 ,  B05D1/00 ,  B05D7/00

CPC classification number: B05D5/086 ,  B05D1/60 ,  B05D7/5483 ,  B05D2203/35 ,  B05D2506/10 ,  B05D2350/60 ,  B05D2401/33

Abstract: A substrate with a water and oil repellent layer having excellent abrasion resistance and a method for producing the substrate are provided. The substrate with a water and oil repellent layer contains a substrate, an undercoat layer formed on the surface of the substrate, and a water and oil repellent layer formed on the surface of the undercoat layer. The undercoat layer contains an oxide containing silicon and a specific element. The water and oil repellent layer is made of a hydrolytic condensation compound of a fluorinated ether compound, which is a compound represented by the formula (A1) or a compound represented by the formula (A2):


Rf—O—(Rf1O)m—Rf2[—R1—C(—R2-T)a(—R3)3-a]b  (A1)



[(T-R2—)a(R3—)3-aC—R1—]bRf2—O—(Rf1O)m—Rf2[—R1—C(—R2-T)a(—R3)3-a]b  (A2).

公开(公告)号：US20210348024A1

公开(公告)日：2021-11-11

申请号：US17443038

申请日：2021-07-20

Applicant: AGC Inc.

Inventor： Keigo MATSUURA ,  Taiki HOSHINO ,  Kiyotaka TAKAO ,  Makoto UNO ,  Eiichiro ANRAKU ,  Motoshi AOYAMA ,  Naoki KATSUKI ,  Yusuke TOMIYORI ,  Toyokazu ENTA ,  Hiromasa YAMAMOTO

IPC: C09D183/10 ,  C09D5/00 ,  C09D7/20

Abstract: To provide a composition with which a surface layer excellent in abrasion resistance and sliding resistance can be formed, and an article.
The composition of the present invention comprises a compound represented by the formula (1) and a compound represented by the formula (2), wherein the ratio of the number of moles of the group represented by —CF3 in Rf1 in the formula (1) to the total of the number of moles of the group represented by —CF2— closest to Y1 in Rf2 in the formula (1), the number of moles of the group represented by —CF2— closest to Y2 in Rf3 in the formula (2) and the number of moles of the group represented by —CF2— closest to Y3 in Rf3 in the formula (2), is from 0.001 to 0.1: Rf1—(OX1)m1—O—Rf2—Y1—[Si(R1)n1L13-n1]g1  (1) [L23-n2(R2)n2Si]g2—Y2—Rf3—(OX2)m2—O—Rf4—Y3—[Si(R3)n3L33-n3]g3  (2)

公开(公告)号：US20230399293A1

公开(公告)日：2023-12-14

申请号：US18456611

申请日：2023-08-28

Applicant: AGC Inc.

Inventor： Toyokazu ENTA ,  Makoto UNO

IPC: C07C309/65 ,  C07C303/30 ,  C07C19/08 ,  C07C43/12

CPC classification number: C07C309/65 ,  C07C303/30 ,  C07C19/08 ,  C07C43/126

Abstract: An object is to provide a method for producing a fluorine-containing compound by using an easily available compound under relatively mild reaction conditions to produce a fluorine-containing compound, a fluorine-containing compound suitably used in the production method, and a fluorine-containing compound obtained by the production method.
There is provided a method for producing a fluorine-containing compound, the method including: reacting a compound having a partial structure represented by the following formula (a) with a Grignard reagent in the presence of a transition metal compound.


—C(—Ra)(—Rb)—CH2-L  Formula (a)



where, in the formula, Ra is a fluorine atom or a fluoroalkyl group, Rb is a hydrogen atom or a fluoroalkyl group, and L is a sulfonate group.

公开(公告)号：US20220298301A1

公开(公告)日：2022-09-22

申请号：US17804356

申请日：2022-05-27

Applicant: AGC Inc.

Inventor： Masayuki HARAGUCHI ,  Makoto UNO ,  Yusuke TOMIYORI ,  Toyokazu ENTA

IPC: C08G65/00 ,  B05D5/08

Abstract: To provide a fluorinated ether compound capable of forming a water and oil repellent layer with excellent abrasion resistance on a metal surface of a substrate, a composition, and an article provided with a water and oil repellent layer.
The fluorinated ether compound of the present invention is represented by [Rf—(OX)m—O—]j1Y1—Z1[-L1-S—R11]g11[R12]g12. Rf is a perfluoroalkyl group, X is a fluoroalkylene group having at least one fluorine atom, m is an integer of at least 2, Y1 is a single bond or a (j1+1) valent linking group, and Z1 is a (g11+g12+1) valent linking group, L1 is a single bond or a divalent linking group, R11 is a hydrogen atom or a monovalent substituent, R12 is a hydrogen atom or a monovalent substituent, j1 is an integer of at least 1, g11 is an integer of at least 2, and g12 is an integer of at least 0.