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公开(公告)号：US12191141B2
公开(公告)日：2025-01-07
申请号：US17917155
申请日：2021-02-18
Inventor： Chang-Koo Kim , Jun-Hyun Kim
IPC: H01L21/02 , H01L21/311 , H01J37/32
Abstract: A plasma etching method is disclosed. The plasma etching method comprises: a first step of vaporizing liquid perfluoroisopropyl vinylether (PIPVE); a second step of supplying, to a plasma chamber in which an object to be etched is arranged, the vaporized PIPVE and a discharge gas comprising argon gas; and a third step of discharging the discharge gas so as to generate plasma, and using same so as to plasma-etch the object to be etched.
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公开(公告)号：US20250099342A1
公开(公告)日：2025-03-27
申请号：US18898326
申请日：2024-09-26
Inventor： Hee-Kyung Kim , ChulHo Kim , SungUn Kang , Seung-Joo Kim , Yu-Kwon Kim , Chang-Koo Kim , Sanghyun You , Dayoung Lee
Abstract: The present invention relates to a dental 3Y-TZP zirconia material whose surface is modified by plasma treatment, an implant and a manufacturing method thereof. The 3Y-TZP zirconia material and implant manufactured according to the present invention have improved cell adhesion and antibacterial effects, thereby improving biocompatibility and minimizing inflammatory reactions of the user.
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公开(公告)号：US11764547B2
公开(公告)日：2023-09-19
申请号：US17223381
申请日：2021-04-06
Inventor： Chang-Koo Kim , Hae-Min Lee , Doo Won Kang , Hyun Chang Kim
IPC: H01T4/12 , H01T21/00 , C23C18/50 , C23C18/18 , C23C18/16 , C23C18/36 , H01T4/02 , H01C1/024 , H01C1/026
CPC classification number: H01T4/12 , C23C18/1651 , C23C18/1692 , C23C18/1893 , C23C18/36 , C23C18/50 , H01T21/00 , H01C1/024 , H01C1/026 , H01T4/02
Abstract: A method for manufacturing a surge absorbing device is provided. The method includes providing an elongate ceramic tube having a hollow space defined therein and having open and opposite first and second end; forming a first plating layer and a second plating layer on the first end and the second end, respectively; placing a surge absorbing element within the hollow space within the ceramic tube; disposing first and second brazing rings on the first plating layer and the second plating layer, respectively; disposing first and second sealing electrodes on the first and second brazing rings respectively; and melting the first and second brazing rings in an inert gas atmosphere to attach the first and second sealing electrodes onto the first plating layer and the second plating layer, respectively.
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公开(公告)号：US20250100944A1
公开(公告)日：2025-03-27
申请号：US18898319
申请日：2024-09-26
Inventor： Hee-Kyung Kim , ChulHo Kim , SungUn Kang , Seung-Joo Kim , Yu-Kwon Kim , Chang-Koo Kim , Sanghyn You , Dayoung Lee
Abstract: The present invention relates to a dental 3Y-TZP zirconia material whose surface is modified by plasma treatment, an implant and a manufacturing method thereof. The 3Y-TZP zirconia material and implant manufactured according to the present invention have improved cell adhesion and antibacterial effects, thereby improving biocompatibility and minimizing inflammatory reactions of the user.
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公开(公告)号：US11681078B2
公开(公告)日：2023-06-20
申请号：US17691566
申请日：2022-03-10
Inventor： Chang-Koo Kim , Jun-Hyun Kim
IPC: G02B1/11 , H01L31/054 , H01L33/46 , H01L31/0236 , H01L31/028 , G02B1/12 , G02B5/02 , H01L33/44 , H01L31/18
CPC classification number: G02B1/11 , G02B1/12 , G02B5/0294 , H01L31/028 , H01L31/02363 , H01L31/054 , H01L31/1804 , H01L33/44 , H01L33/46
Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
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Patent Agency Ranking
公开(公告)号：US11081361B2
公开(公告)日：2021-08-03
申请号：US16521701
申请日：2019-07-25
Inventor： Chang-Koo Kim , Jun-Hyun Kim , Jin-Su Park
IPC: H01L21/311 , C09K13/08
Abstract: Provided is a plasma etching method comprising supplying both hexafluoroisopropanol (HFIP) gas and argon (Ar) gas to a plasma chamber receiving an etching target therein, thereby to plasma-etch the etching target.
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公开(公告)号：US12134722B2
公开(公告)日：2024-11-05
申请号：US17760519
申请日：2020-06-01
Inventor： Chang-Koo Kim , Jun-Hyun Kim , Jin-Su Park
IPC: C09K13/00 , H01J37/32 , H01L21/311
Abstract: Disclosed is a plasma etching method including a first step of providing a mixed gas containing argon gas and vaporized 1,1,2,2-tetrafluoroethyl-2,2,2-trifluoroethyl ether having a molecular structure of a following Chemical Formula 1 to a plasma chamber in which an etching target is disposed; and a second step of etching the etching target using plasma generated from the mixed gas:
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公开(公告)号：US11300711B2
公开(公告)日：2022-04-12
申请号：US16866017
申请日：2020-05-04
Inventor： Chang-Koo Kim , Jun-Hyun Kim
IPC: G02B1/11 , H01L31/054 , H01L33/46 , H01L31/0236 , H01L31/028 , G02B1/12 , G02B5/02 , H01L33/44 , H01L31/18
Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
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公开(公告)号：US11005235B2
公开(公告)日：2021-05-11
申请号：US15755417
申请日：2016-08-10
Inventor： Chang-Koo Kim , Hae-Min Lee , Doo Won Kang , Hyun Chang Kim
IPC: H01T4/02 , H01T21/00 , H01T4/12 , C23C18/50 , C23C18/18 , C23C18/16 , C23C18/36 , H01C1/024 , H01C1/026
Abstract: A method for manufacturing a surge absorbing device is provided. The method includes providing an elongate ceramic tube having a hollow space defined therein and having open and opposite first and second end; forming a first plating layer and a second plating layer on the first end and the second end, respectively; placing a surge absorbing element within the hollow space within the ceramic tube; disposing first and second brazing rings on the first plating layer and the second plating layer, respectively; disposing first and second sealing electrodes on the first and second brazing rings respectively; and melting the first and second brazing rings in an inert gas atmosphere to attach the first and second sealing electrodes onto the first plating layer and the second plating layer, respectively.
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公开(公告)号：US10690811B2
公开(公告)日：2020-06-23
申请号：US16057128
申请日：2018-08-07
Inventor： Chang-Koo Kim , Jun-Hyun Kim
IPC: H01L31/054 , H01L33/46 , G02B1/11 , H01L31/0236 , H01L31/028 , G02B1/12 , G02B5/02 , H01L33/44 , H01L31/18
Abstract: The present disclosure provides a structure having a low reflectance surface, wherein the structure comprises: a base plate; and a plurality of inclined rods protruding from a first face of the base plate and inclined relative to a normal line to the first face, wherein the inclined rods are spaced from each other. Travel paths of light beams in the structure may be longer along the inclined rods. As a result, a larger amount of light may be absorbed by the structure having a low reflectance surface. The amount of light-beams as reflected from the structure having a low reflectance surface may be significantly reduced.
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