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公开(公告)号:US20220246453A1
公开(公告)日:2022-08-04
申请号:US17728461
申请日:2022-04-25
发明人: JI-DIH HU , WOLFGANG R. ADERHOLD , DONGMING IU
摘要: An apparatus for measuring a temperature of an assembly that is internal to a process chamber. The apparatus may include a light pipe positioned between a lamp radiation filtering window and the assembly, the light pipe has a first end with a bevel configured to redirect infrared radiation emitted from the assembly through the light pipe and has a second end distal to the first end, an optical assembly configured to collimate, filter, and focus infrared radiation from the second end of the light pipe, an optical detector configured to receive an output from the optical assembly and generate at least one signal representative of the infrared radiation, a temperature circuit that transforms the at least one signal into a temperature value, and a controller that is configured to receive the temperature value and to make adjustments to other process parameters of process chamber based on the temperature value.
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公开(公告)号:US20210175101A1
公开(公告)日:2021-06-10
申请号:US16707945
申请日:2019-12-09
发明人: JI-DIH HU , WOLFGANG R. ADERHOLD , DONGMING IU
摘要: An apparatus for measuring a temperature of an assembly that is internal to a process chamber. The apparatus may include a light pipe positioned between a lamp radiation filtering window and the assembly, the light pipe has a first end with a bevel configured to redirect infrared radiation emitted from the assembly through the light pipe and has a second end distal to the first end, an optical assembly configured to collimate, filter, and focus infrared radiation from the second end of the light pipe, an optical detector configured to receive an output from the optical assembly and generate at least one signal representative of the infrared radiation, a temperature circuit that transforms the at least one signal into a temperature value, and a controller that is configured to receive the temperature value and to make adjustments to other process parameters of process chamber based on the temperature value.
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公开(公告)号:US20130298832A1
公开(公告)日:2013-11-14
申请号:US13865672
申请日:2013-04-18
CPC分类号: C30B25/105 , F21V7/0083
摘要: Apparatus for processing a substrate are provided herein. In some embodiments, a lamphead for use in substrate processing includes a monolithic member having a contoured surface; a plurality of reflector cavities disposed in the contoured surface, wherein each reflector cavity is shaped to act as a reflector or to receive a replaceable reflector for a lamp; and a plurality of lamp passages, wherein each lamp passage extends into the monolithic member from one of the plurality of reflector cavities.
摘要翻译: 本文提供了用于处理基板的装置。 在一些实施例中,用于衬底处理的灯头包括具有轮廓表面的整体构件; 设置在轮廓表面中的多个反射器空腔,其中每个反射器腔被成形为用作反射器或接收用于灯的可更换反射器; 以及多个灯通道,其中每个灯通道从所述多个反射器腔中的一个延伸到所述整体构件中。
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