公开(公告)号：US20140251375A1

公开(公告)日：2014-09-11

申请号：US13785903

申请日：2013-03-05

Applicant: APPLIED MATERIALS, INC.

Inventor： JAMES MATTHEW HOLDEN ,  SONG-MOON SUH ,  TODD EGAN ,  Kalyanjit Ghosh ,  Leon Volfovski ,  Michael R. Rice ,  Richard Giljum

IPC: H01L21/67 ,  H01L21/02

CPC classification number: H01L21/67028 ,  B01D39/12 ,  B08B5/00 ,  B08B7/00 ,  H01L21/02076 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/67051

Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.

Abstract translation: 基板清洁装置可以包括具有支撑表面以支撑要清洁的基板的基板支撑件，其中基板支撑件可绕垂直于支撑表面的中心轴线旋转; 第一喷嘴，用于当所述基板由所述基板支撑件的支撑表面支撑时，将第一清洁气体提供到所述内部体积的与所述基板的边缘的位置相对应的区域; 第一环形体，其通过间隙与衬底支撑件的支撑表面相对设置并间隔开，第一环形体具有由内壁限定的中心开口，内壁被成形为提供第一环形体和第二环形体之间的间隙的减小尺寸 支撑表面沿径向向外的方向; 以及第一气体入口，用于向第一环形体的中心开口提供第一气体。

公开(公告)号：US20170018441A1

公开(公告)日：2017-01-19

申请号：US15264082

申请日：2016-09-13

Applicant: APPLIED MATERIALS, INC.

Inventor： JAMES MATTHEW HOLDEN ,  SONG-MOON SUH ,  TODD EGAN ,  KALYANJIT GHOSH ,  LEON VOLFOVSKI ,  MICHAEL R. RICE ,  RICHARD GILJUM

IPC: H01L21/67 ,  B01D39/12 ,  B08B5/00 ,  H01L21/02 ,  B08B7/00

CPC classification number: H01L21/67028 ,  B01D39/12 ,  B08B5/00 ,  B08B7/00 ,  H01L21/02076 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/67051

Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.

Abstract translation: 基板清洁装置可以包括具有支撑表面以支撑要清洁的基板的基板支撑件，其中基板支撑件可绕垂直于支撑表面的中心轴线旋转; 第一喷嘴，用于当所述基板由所述基板支撑件的支撑表面支撑时，将第一清洁气体提供到所述内部体积的与所述基板的边缘的位置相对应的区域; 第一环形体，其通过间隙与衬底支撑件的支撑表面相对设置并间隔开，第一环形体具有由内壁限定的中心开口，内壁被成形为提供第一环形体和第二环形体之间的间隙的减小尺寸 支撑表面沿径向向外的方向; 以及第一气体入口，用于向第一环形体的中心开口提供第一气体。

公开(公告)号：US20140251374A1

公开(公告)日：2014-09-11

申请号：US13785834

申请日：2013-03-05

Applicant: APPLIED MATERIALS, INC.

Inventor： JAMES MATTHEW HOLDEN ,  SONG-MOON SUH ,  SHALINA D. SUDHEERAN ,  GLEN T. MORI

IPC: H01L21/02

CPC classification number: H01L21/02101 ,  H01L21/02057 ,  H01L21/0209 ,  H01L21/67051

Abstract: A substrate cleaning apparatus may include a substrate support member to support a substrate having a first side and a contaminated second side; a liquid carbon dioxide source; a gaseous carbon dioxide source; and one or more nozzles coupled to the liquid carbon dioxide source and to the gaseous carbon dioxide source, wherein the one or more nozzles are configured to receive liquid carbon dioxide and to discharge a first mixture of solid and gaseous carbon dioxide from the liquid carbon dioxide source to the second side of the substrate and to receive gaseous carbon dioxide and to discharge a second mixture of solid and gaseous carbon dioxide from the gaseous carbon dioxide source to the second side of the substrate. Methods of cleaning a substrate may be performed in the substrate cleaning apparatus.

Abstract translation: 基板清洁装置可以包括用于支撑具有第一侧和受污染的第二侧的基板的基板支撑构件; 液态二氧化碳源; 气态二氧化碳源; 以及耦合到液体二氧化碳源和气态二氧化碳源的一个或多个喷嘴，其中所述一个或多个喷嘴构造成接收液态二氧化碳并且从液态二氧化碳排出固体和气态二氧化碳的第一混合物 源至衬底的第二侧并接收气态二氧化碳，并将固体和气态二氧化碳的第二混合物从气态二氧化碳源排放到衬底的第二侧。 可以在基板清洗装置中进行清洗基板的方法。