公开(公告)号：US20140014270A1

公开(公告)日：2014-01-16

申请号：US13918033

申请日：2013-06-14

Applicant: APPLIED MATERIALS, INC.

Inventor： KARTIK SHAH ,  KALYANJIT GHOSH ,  SCOTT MCCLELLAND

IPC: B01F3/02

CPC classification number: B01F3/026 ,  B01F3/02 ,  B01F5/0057 ,  B01F5/0065 ,  B01F5/0616 ,  B01F5/0618 ,  B01F2005/0636 ,  H01J37/3244 ,  H01J37/32449

Abstract: Embodiments of gas mixing apparatus are provided herein. In some embodiments, a gas mixing apparatus may include a container defining an interior volume, the container having a closed top and bottom and a sidewall having a circular cross section with respect to a central axis of the container passing through the top and bottom; a plurality of first inlets coupled to the container proximate the top of the container to provide a plurality of process gases to the interior volume of the container, the plurality of first inlets disposed such that a flow path of the plurality of process gases through the plurality of first inlets is substantially tangential to the sidewall of the container; and an outlet coupled to the container proximate the bottom of the container to allow the plurality of process gases to be removed from the interior volume of the container.

Abstract translation: 气体混合装置的实施例在此提供。 在一些实施例中，气体混合设备可以包括限定内部容积的容器，所述容器具有封闭的顶部和底部，并且具有相对于穿过顶部和底部的容器的中心轴线具有圆形横截面的侧壁; 多个第一入口，其在容器的顶部附近耦合到容器以向容器的内部空间提供多个处理气体，多个第一入口被设置成使得多个处理气体的流动通过多个 第一入口基本上与容器的侧壁相切; 以及与容器的靠近容器底部相连的出口，以允许多个处理气体从容器的内部容积中移出。

公开(公告)号：US20140216585A1

公开(公告)日：2014-08-07

申请号：US14154346

申请日：2014-01-14

Applicant: APPLIED MATERIALS, INC.

Inventor： AGUS SOFIAN TJANDRA ,  KALYANJIT GHOSH ,  CHRISTOPHER S. OLSEN ,  UMESH M. KELKAR

IPC: B01F13/02

CPC classification number: H01L21/67115 ,  H01L21/67017 ,  H01L21/6719 ,  Y10T137/87652

Abstract: Methods and apparatus for mixing and delivery of process gases are provided herein. In some embodiments, a gas injection apparatus includes an elongate top plenum comprising a first gas inlet; an elongate bottom plenum disposed beneath and supporting the top plenum, the bottom plenum comprising a second gas inlet; a plurality of first conduits disposed through the bottom plenum and having first ends fluidly coupled to the top plenum and second ends disposed beneath the bottom plenum; and a plurality of second conduits having first ends fluidly coupled to the bottom plenum and second ends disposed beneath the bottom plenum; wherein a lower end of the bottom plenum is adapted to fluidly couple the gas injection apparatus to a mixing chamber such that the second ends of the plurality of first conduits and the second ends of the plurality of second conduits are in fluid communication with the mixing chamber.

Abstract translation: 本文提供了用于混合和输送工艺气体的方法和装置。 在一些实施例中，气体注入装置包括细长顶部增压室，其包括第一气体入口; 设置在所述顶部增压室下方并支撑所述顶部增压室的细长底部增压室，所述底部增压室包括第二气体入口; 多个第一导管，其设置穿过所述底部集气室，并且具有流体耦合到所述顶部增压室的第一端和设置在所述底部增压室下方的第二端; 以及多个第二导管，其具有流体地联接到所述底部增压室的第一端和设置在所述底部增压室下方的第二端; 其中所述底部增压室的下端适于将所述气体注入装置流体地耦合到混合室，使得所述多个第一导管的第二端和所述多个第二导管的所述第二端与所述混合室流体连通 。

公开(公告)号：US20170018441A1

公开(公告)日：2017-01-19

申请号：US15264082

申请日：2016-09-13

Applicant: APPLIED MATERIALS, INC.

Inventor： JAMES MATTHEW HOLDEN ,  SONG-MOON SUH ,  TODD EGAN ,  KALYANJIT GHOSH ,  LEON VOLFOVSKI ,  MICHAEL R. RICE ,  RICHARD GILJUM

IPC: H01L21/67 ,  B01D39/12 ,  B08B5/00 ,  H01L21/02 ,  B08B7/00

CPC classification number: H01L21/67028 ,  B01D39/12 ,  B08B5/00 ,  B08B7/00 ,  H01L21/02076 ,  H01L21/02087 ,  H01L21/0209 ,  H01L21/67051

Abstract: A substrate cleaning apparatus may include a substrate support having a support surface to support a substrate to be cleaned, wherein the substrate support is rotatable about a central axis normal to the support surface; a first nozzle to provide a first cleaning gas to a region of the inner volume corresponding to the position of an edge of the substrate when the substrate is supported by the support surface of the substrate support; a first annular body disposed opposite and spaced apart from the support surface of the substrate support by a gap, the first annular body having a central opening defined by an inner wall shaped to provide a reducing size of the gap between the first annular body and the support surface in a radially outward direction; and a first gas inlet to provide a first gas to the central opening of the first annular body.

Abstract translation: 基板清洁装置可以包括具有支撑表面以支撑要清洁的基板的基板支撑件，其中基板支撑件可绕垂直于支撑表面的中心轴线旋转; 第一喷嘴，用于当所述基板由所述基板支撑件的支撑表面支撑时，将第一清洁气体提供到所述内部体积的与所述基板的边缘的位置相对应的区域; 第一环形体，其通过间隙与衬底支撑件的支撑表面相对设置并间隔开，第一环形体具有由内壁限定的中心开口，内壁被成形为提供第一环形体和第二环形体之间的间隙的减小尺寸 支撑表面沿径向向外的方向; 以及第一气体入口，用于向第一环形体的中心开口提供第一气体。